Patents by Inventor Osamu Kakuchi
Osamu Kakuchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7995213Abstract: A measurement method of measuring a wavefront aberration of an optical system to be measured, comprising a first measurement step of measuring wavefronts of the optical system to be measured with respect to linearly polarized light beams along at least three different azimuths, a first calculation step of calculating a wavefront of the optical system to be measured with respect to non-polarized light and a birefringent characteristic of the optical system to be measured, based on the wavefronts of the optical system to be measured, which are measured in the first measurement step, and a second calculation step of calculating a wavefront of the optical system to be measured with respect to arbitrary polarized light, based on the wavefront and the birefringent characteristic of the optical system to be measured, which are calculated in the first calculation step.Type: GrantFiled: July 2, 2010Date of Patent: August 9, 2011Assignee: Canon Kabushiki KaishaInventors: Osamu Kakuchi, Yoshiyuki Kuramoto
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Patent number: 7907263Abstract: The present invention provides a method including measuring a wavefront aberration of the optical system to be measured on a measurement surface, measuring a pupil transmittance distribution of the optical system determining a pupil function of the optical system based on the wavefront aberration and the pupil transmittance distribution, and performing imaging computation using the pupil function to obtain a light intensity distribution formed on an image plane of the optical system, and calculating a flare, generated in the optical system, from the light intensity distribution.Type: GrantFiled: June 28, 2009Date of Patent: March 15, 2011Assignee: Canon Kabushiki KaishaInventors: Michiko Aizawa, Eiji Aoki, Osamu Kakuchi, Yoshiyuki Kuramoto
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Publication number: 20100265515Abstract: A measurement method of measuring a wavefront aberration of an optical system to be measured, comprising a first measurement step of measuring wavefronts of the optical system to be measured with respect to linearly polarized light beams along at least three different azimuths, a first calculation step of calculating a wavefront of the optical system to be measured with respect to non-polarized light and a birefringent characteristic of the optical system to be measured, based on the wavefronts of the optical system to be measured, which are measured in the first measurement step, and a second calculation step of calculating a wavefront of the optical system to be measured with respect to arbitrary polarized light, based on the wavefront and the birefringent characteristic of the optical system to be measured, which are calculated in the first calculation step.Type: ApplicationFiled: July 2, 2010Publication date: October 21, 2010Applicant: CANON KABUSHIKI KAISHAInventors: Osamu Kakuchi, Yoshiyuki Kuramoto
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Patent number: 7773233Abstract: A measurement method of measuring a wavefront aberration of an optical system to be measured, comprising a first measurement step of measuring wavefronts of the optical system to be measured with respect to linearly polarized light beams along at least three different azimuths, a first calculation step of calculating a wavefront of the optical system to be measured with respect to non-polarized light and a birefringent characteristic of the optical system to be measured, based on the wavefronts of the optical system to be measured, which are measured in the first measurement step, and a second calculation step of calculating a wavefront of the optical system to be measured with respect to arbitrary polarized light, based on the wavefront and the birefringent characteristic of the optical system to be measured, which are calculated in the first calculation step.Type: GrantFiled: April 30, 2008Date of Patent: August 10, 2010Assignee: Canon Kabushiki KaishaInventors: Osamu Kakuchi, Yoshiyuki Kuramoto
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Publication number: 20100002243Abstract: The present invention provides a method including measuring a wavefront aberration of the optical system to be measured on a measurement surface, measuring a pupil transmittance distribution of the optical system determining a pupil function of the optical system based on the wavefront aberration and the pupil transmittance distribution, and performing imaging computation using the pupil function to obtain a light intensity distribution formed on an image plane of the optical system, and calculating a flare, generated in the optical system, from the light intensity distribution.Type: ApplicationFiled: June 28, 2009Publication date: January 7, 2010Applicant: CANON KABUSHIKI KAISHAInventors: Michiko Aizawa, Eiji Aoki, Osamu Kakuchi, Yoshiyuki Kuramoto
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Publication number: 20090219494Abstract: An evaluation method of evaluating an optical characteristic of an optical system to be evaluated using an interferometer, comprises a first acquisition step of acquiring a first interference fringe formed by the interferometer when a location of a movable element of the interferometer in an optical axis direction of the optical system is a first location, a second acquisition step of acquiring a second interference fringe formed by the interferometer when the location of the movable element in the optical axis direction is a second location different from the first location, a determination step of determining a pupil-center coordinate of the optical system based on the acquired first interference fringe and the acquired second interference fringe, and a computation step of computing the optical characteristic of the optical system using the pupil-center coordinate determined in the determination step.Type: ApplicationFiled: February 25, 2009Publication date: September 3, 2009Applicant: CANON KABUSHIKI KAISHAInventor: Osamu Kakuchi
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Publication number: 20080273200Abstract: A measurement method of measuring a wavefront aberration of an optical system to be measured, comprising a first measurement step of measuring wavefronts of the optical system to be measured with respect to linearly polarized light beams along at least three different azimuths, a first calculation step of calculating a wavefront of the optical system to be measured with respect to non-polarized light and a birefringent characteristic of the optical system to be measured, based on the wavefronts of the optical system to be measured, which are measured in the first measurement step, and a second calculation step of calculating a wavefront of the optical system to be measured with respect to arbitrary polarized light, based on the wavefront and the birefringent characteristic of the optical system to be measured, which are calculated in the first calculation step.Type: ApplicationFiled: April 30, 2008Publication date: November 6, 2008Applicant: CANON KABUSHIKI KAISHAInventors: Osamu Kakuchi, Yoshiyuki Kuramoto
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Patent number: 7276717Abstract: A measuring apparatus for measuring optical performance of a target optical system to be measured includes an optical unit for splitting light from a light source into measuring light and reference light so that the measuring light can be introduced into the target optical system, a reflection unit for reflecting the measuring light from the target optical system toward the target optical system via a fluid, and a detector for detecting an interference fringe generated between interference between the measuring light that has emitted from the target optical system after being reflected by the reflection unit and the reference light that does not pass the target optical system.Type: GrantFiled: November 4, 2005Date of Patent: October 2, 2007Assignee: Canon Kabushiki KaishaInventors: Osamu Kakuchi, Yoshiyuki Kuramoto
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Patent number: 7236254Abstract: A projection exposure apparatus includes an exposure light source, an illumination system for illuminating a pattern, formed on a first object, with light from the exposure light source and passing through the illumination system, a projection optical system for projecting a pattern, as illuminated with the light, onto a second object for exposure of the same with the pattern, and an interferometer for use in measurement of an optical characteristic of the projection optical system, wherein the interferometer is operable to perform the measurement by use of light from the exposure light source.Type: GrantFiled: January 20, 2006Date of Patent: June 26, 2007Assignee: Canon Kabushiki KaishaInventors: Osamu Kakuchi, Eiichi Murakami
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Publication number: 20060227334Abstract: A method disclosed in this specification is an aberration measuring method in which a light flux converged by a condensing optical system is made incident on a optical system to be measured, the light flux that has passed through the optical system to be measured is reflected by a reflecting optical system having a center of curvature at a light convergence point on a light emergence side of the optical system to be measured is made incident on the optical system to be measure again, and wavefront aberration of the optical system to be measured is detected as interference fringes using the light flux that has passed through the optical system to be measured again. Measurement is carried out while changing the numerical aperture of the optical system to be measured to a numerical aperture larger than a numerical aperture in the actual use, thereby realizing highly precise measurement of the wavefront aberration all over the effective numerical aperture of the optical system to be measured.Type: ApplicationFiled: June 8, 2006Publication date: October 12, 2006Inventor: Osamu Kakuchi
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Patent number: 7095509Abstract: A method disclosed in this specification is an aberration measuring method in which a light flux converged by a condensing optical system is made incident on a optical system to be measured, the light flux that has passed through the optical system to be measured is reflected by a reflecting optical system having a center of curvature at a light convergence point on a light emergence side of the optical system to be measured is made incident on the optical system to be measure again, and wavefront aberration of the optical system to be measured is detected as interference fringes using the light flux that has passed through the optical system to be measured again. Measurement is carried out while changing the numerical aperture of the optical system to be measured to a numerical aperture larger than a numerical aperture in the actual use, thereby realizing highly precise measurement of the wavefront aberration all over the effective numerical aperture of the optical system to be measured.Type: GrantFiled: March 1, 2004Date of Patent: August 22, 2006Assignee: Canon Kabushiki KaishaInventor: Osamu Kakuchi
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Publication number: 20060114476Abstract: A projection exposure apparatus includes an exposure light source, an illumination system for illuminating a pattern, formed on a first object, with light from the exposure light source and passing through the illumination system, a projection optical system for projecting a pattern, as illuminated with the light, onto a second object for exposure of the same with the pattern, and an interferometer for use in measurement of an optical characteristic of the projection optical system, wherein the interferometer is operable to perform the measurement by use of light from the exposure light source.Type: ApplicationFiled: January 20, 2006Publication date: June 1, 2006Applicant: CANON KABUSHIKI KAISHAInventors: Osamu Kakuchi, Eiichi Murakami
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Publication number: 20060097205Abstract: A measuring apparatus for measuring optical performance of a target optical system to be measured includes an optical unit for splitting light from a light source into measuring light and reference light so that the measuring light can be introduced into the target optical system, a reflection unit for reflecting the measuring light from the target optical system toward the target optical system via a fluid, and a detector for detecting an interference fringe generated between interference between the measuring light that has emitted from the target optical system after being reflected by the reflection unit and the reference light that does not pass the target optical system.Type: ApplicationFiled: November 4, 2005Publication date: May 11, 2006Inventors: Osamu Kakuchi, Yoshiyuki Kuramoto
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Patent number: 7023561Abstract: A projection exposure apparatus includes an exposure light source, an illumination system for illuminating a pattern, formed on a first object, with light from the exposure light source, a projection optical system for projecting a pattern, as illuminated with the light, onto a second object, and an interferometer for use in measurement of an optical characteristic of the projection optical system, wherein the interferometer is operable to perform the measurement by use of light from the exposure light source.Type: GrantFiled: July 17, 2003Date of Patent: April 4, 2006Assignee: Canon Kabushiki KaishaInventors: Osamu Kakuchi, Eiichi Murakami
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Patent number: 6924881Abstract: A projection exposure apparatus includes an illumination optical system for illuminating a pattern formed on a first object, with light, a projection optical system for projecting the pattern of the first object, illuminated by the illumination optical system, onto a second object for exposure of the same with the pattern, a main system including the illumination optical system and the projection optical system, and an interferometer for use in measurement of an optical characteristic of the projection optical system and being mounted on the main system.Type: GrantFiled: August 19, 2003Date of Patent: August 2, 2005Assignee: Canon Kabushiki KaishaInventors: Eiichi Murakami, Osamu Kakuchi
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Publication number: 20050099635Abstract: A projection exposure apparatus includes an exposure light source, an illumination system for illuminating a pattern, formed on a first object, with light from the exposure light source, a projection optical system for projecting a pattern, as illuminated with the light, onto a second object and an interferometer for use in measurement of an optical characteristic of the projection optical system, wherein the interferometer is operable to perform the measurement by use of light from the exposure light source.Type: ApplicationFiled: July 17, 2003Publication date: May 12, 2005Applicant: CANON KABUSHIKI KAISHAInventors: Osamu Kakuchi, Eiichi Murakami
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Publication number: 20040223163Abstract: A method disclosed in this specification is an aberration measuring method in which a light flux converged by a condensing optical system is made incident on a optical system to be measured, the light flux that has passed through the optical system to be measured is reflected by a reflecting optical system having a center of curvature at a light convergence point on a light emergence side of the optical system to be measured is made incident on the optical system to be measure again, and wavefront aberration of the optical system to be measured is detected as interference fringes using the light flux that has passed through the optical system to be measured again. Measurement is carried out while changing the numerical aperture of the optical system to be measured to a numerical aperture larger than a numerical aperture in the actual use, thereby realizing highly precise measurement of the wavefront aberration all over the effective numerical aperture of the optical system to be measured.Type: ApplicationFiled: March 1, 2004Publication date: November 11, 2004Inventor: Osamu Kakuchi
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Publication number: 20040036883Abstract: A projection exposure apparatus includes an illumination optical system for illuminating a pattern formed on a first object, with light, a projection optical system for projecting the pattern of the first object, illuminated by the illumination optical system, onto a second object for exposure of the same with the pattern, a main system including the illumination optical system and the projection optical system, and an interferometer for use in measurement of an optical characteristic of the projection optical system and being mounted on the main system.Type: ApplicationFiled: August 19, 2003Publication date: February 26, 2004Applicant: CANON KABUSHIKI KAISHAInventors: Eiichi Murakami, Osamu Kakuchi
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Patent number: 6633362Abstract: A projection exposure apparatus includes an illumination optical system for illuminating a pattern formed on a first object, with light, a projection optical system for projecting the pattern of the first object, illuminated by the illumination optical system, onto a second object for exposure of the same with the pattern, a main system including the illumination optical system and the projection optical system, and an interferometer for use in measurement of an optical characteristic of the projection optical system and being mounted on the main system.Type: GrantFiled: March 22, 2000Date of Patent: October 14, 2003Assignee: Canon Kabushiki KaishaInventors: Eiichi Murakami, Osamu Kakuchi
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Patent number: 6614535Abstract: A projection exposure apparatus includes an exposure light source, an illumination system for illuminating a pattern, formed on a first object, with light from the exposure light source and passing through the illumination system, a projection optical system for projecting the pattern, as illuminated with the light, onto a second object for exposure of the same with the pattern and an interferometer for use in measurement of an optical characteristic of the projection optical system, wherein the interferometer is operable to perform the measurement by use of light from the exposure light source.Type: GrantFiled: March 22, 2000Date of Patent: September 2, 2003Assignee: Canon Kabushiki KaishaInventors: Osamu Kakuchi, Eiichi Murakami