Abstract: A pressure gage detects a pressure in a vacuum-processing container as an electrical signal. A pressure detection signal from the pressure gage includes an error over time. An error detecting unit detects a signal representing the error which is output from the pressure gage while the vacuum-processing container is set at a predetermined calibration pressure. A correction value calculating unit calculates, in accordance with the signal representing the error which is detected by the error detecting unit, a signal representing a correction value used in order to cancel the signal representing the error. A correcting unit adds the pressure detection signal from the pressure gage to the signal representing the correction value which is calculated by the correction value calculating unit while an instruction for setting an interior of the vacuum-processing container at a desired pressure value is output, thereby eliminating the error over time which is included in the pressure detection signal.

Abstract: A system for measuring a temperature of a high-frequency electrode of a plasma etching apparatus has a temperature detecting element for detecting a temperature, a metal sheath member in which the temperature detecting element is provided to be insulated from it and which is kept in a DC floating state, an insulating member for insulating the sheath member from the high-frequency electrode, and a filter for removing a high-frequency component of an electrical signal sent from the temperature detecting element.