Abstract: A multibeam scanning apparatus of an embodiment is a multibeam scanning apparatus configured to emit a plurality of electron beams to a plurality of scan regions set in a matrix on an object and obtain an observation image by detecting secondary beams, the apparatus including a control circuit. Each of the scan regions includes a plurality of separated scan regions obtained by separating the each of the scan regions in a direction orthogonal to a scanning direction of the electron beams. The control circuit controls the irradiation positions of the electron beams, in two of the scan regions adjacent to each other in the scanning direction of the electron beams, such that the separated scan regions to be scanned at a same time are displaced from each other by a predetermined distance in the direction orthogonal to the scanning direction of the electron beams.

Abstract: [Problem] To provide novel anti-tumor agents and combination drugs. [Means to solve] To provide an anti-tumor agent containing, as an active ingredient, a glutathione level reducer or a glutathione S-transferase inhibitor, the anti-tumor agent being adapted to be administered simultaneously with an effective amount of a compound (II); an anti-tumor agent including a compound (II) as an active ingredient, the anti-tumor agent being adapted to be administered simultaneously with an effective amount of a glutathione level reducer or a glutathione S-transferase inhibitor; or an anti-tumor agent containing, as active ingredients, a compound (II) and a glutathione level reducer or a glutathione S-transferase inhibitor, where R5 is a linear or branched C1-6 alkyl group, R6 is hydrogen or halogen, R7 is a linear or branched C1-6 alkyl group optionally substituted with a substituent, the substituent being hydroxy or phenyl, and R8 is hydrogen or halogen.

Abstract: A multibeam scanning apparatus of an embodiment is a multibeam scanning apparatus configured to emit a plurality of electron beams to a plurality of scan regions set in a matrix on an object and obtain an observation image by detecting secondary beams, the apparatus including a control circuit. Each of the scan regions includes a plurality of separated scan regions obtained by separating the each of the scan regions in a direction orthogonal to a scanning direction of the electron beams. The control circuit controls the irradiation positions of the electron beams, in two of the scan regions adjacent to each other in the scanning direction of the electron beams, such that the separated scan regions to be scanned at a same time are displaced from each other by a predetermined distance in the direction orthogonal to the scanning direction of the electron beams.

Abstract: The present invention is directed to provide antitumor agent including water-soluble sulfasalazine as an active ingredient. Antitumor agents were obtained with, as the water-soluble sulfasalazine, a PEG-modified sulfasalazine represented by the following formula: wherein an average value of n is 4 or larger and 1136 or smaller.

Abstract: An inspection method of an embodiment includes: positively charging a substrate on which a pattern is formed by irradiating the substrate with a first electron beam; generating a secondary electron on a surface of the substrate by irradiating the substrate with a second electron beam; detecting the generated secondary electron; and inspecting the pattern based on the detected secondary electron, in which when the substrate is irradiated with the first electron beam, the first electron beam is made incident on the substrate at an incident angle different from an incident angle of the second electron beam with respect to the substrate, while positions of an emission source of the first electron beam and the substrate are being moved relatively.

Abstract: An imaging portion acquires first sample-images of a first sample under optical-conditions, the first sample having a defect, and acquires second sample-images of a second sample under optical-conditions, the second sample having no defects. An arithmetic portion calculates a first difference between a first sample-image taken under a first optical-condition and the first sample-image taken under a second optical-condition, calculates a second difference between a second sample-image taken under the first optical-condition and a second sample-image taken under the second optical-condition, and selects the first and second optical-conditions under which a difference between the first and second differences becomes largest, as a first and a second inspection-condition. The imaging portion takes images of the target to be inspected under the first and second inspection-conditions to acquire a first and second inspection-images.

Abstract: The present invention is directed to provide antitumor agent including water-soluble sulfasalazine as an active ingredient. Antitumor agents were obtained with, as the water-soluble sulfasalazine, a PEG-modified sulfasalazine represented by the following formula: wherein an average value of n is 4 or larger and 1136 or smaller.

Abstract: According to an embodiment, an inspection apparatus includes an irradiation mechanism, an imaging device, a movable mechanism, and a control processor. The irradiation mechanism irradiates an inspection target with light. The imaging device captures an image of the inspection target through a lens. The movable mechanism changes, with respect to an axis extending in an inspection direction for the inspection target, an angle between the lens and a horizontal plane or an angle between the imaging device and the horizontal plane such that a sample surface of the inspection target, a principal face of the lens, and an imaging face of the imaging device conform to the Scheimpflug principle. The control processor adjusts sensitivities in an image of the sample surface captured by the imaging device at different levels in the image depending on a position in a perpendicular direction to the inspection direction.

Abstract: An imaging portion acquires first sample-images of a first sample under optical-conditions, the first sample having a defect, and acquires second sample-images of a second sample under optical-conditions, the second sample having no defects. An arithmetic portion calculates a first difference between a first sample-image taken under a first optical-condition and the first sample-image taken under a second optical-condition, calculates a second difference between a second sample-image taken under the first optical-condition and a second sample-image taken under the second optical-condition, and selects the first and second optical-conditions under which a difference between the first and second differences becomes largest, as a first and a second inspection-condition. The imaging portion takes images of the target to be inspected under the first and second inspection-conditions to acquire a first and second inspection-images.

Abstract: A pattern inspection method includes scanning a plurality of patterns on a substrate with N charged particle beams and detecting secondary electrons respectively generated from each of the plurality of patterns to acquire N SEM images, determining a distribution of gray level values for each of the acquired N SEM images, selecting M gray levels from the distributions of the N gray levels, selecting a first gray level value from a first one of the M distributions, and comparing it to the corresponding first gray level value of the of the other M?1 distributions, and determining that an abnormality has occurred in the charged particle beam corresponding to the first one of the M distributions when the difference between the first value of the first one of the M distributions and the other M?1 distributions is greater than a predetermined threshold value.

Abstract: A pattern inspection method includes scanning a plurality of patterns on a substrate with N charged particle beams and detecting secondary electrons respectively generated from each of the plurality of patterns to acquire N SEM images, determining a distribution of gray level values for each of the acquired N SEM images, selecting M gray levels from the distributions of the N gray levels, selecting a first gray level value from a first one of the M distributions, and comparing it to the corresponding first gray level value of the of the other M?1 distributions, and determining that an abnormality has occurred in the charged particle beam corresponding to the first one of the M distributions when the difference between the first value of the first one of the M distributions and the other M?1 distributions is greater than a predetermined threshold value.

Abstract: In accordance with an embodiment, a signal processing method includes scanning a pattern on a substrate with a charged particle beam, detecting secondary charged particles emitted from the substrate by using a detector, outputting a signal, and filtering the signal. The detector is separated or divided into a plurality of regions, and the secondary charged particles are detected separately in each region of the detector. Intensity of the filtering is defined in dependence on a function f(?) of an angle ? between a reference axis and a direction along which the secondary charged particles enter a detector plane. The reference axis is an arbitrary direction in a plane parallel to a surface of the substrate.

Abstract: The present invention is directed to provide cancer stem cell proliferation inhibitors and inducers of intracellular accumulation of reactive oxygen species. To this end, provided are cancer stem cell proliferation inhibitors and inducers of intracellular accumulation of reactive oxygen species in a cancer stem cell each containing pimozide or sertindole as an active ingredient.

Abstract: The present invention is directed to provide cancer stem cell proliferation inhibitors and inducers of intracellular accumulation of reactive oxygen species. To this end, provided are cancer stem cell proliferation inhibitors and inducers of intracellular accumulation of reactive oxygen species in a cancer stem cell each containing pimozide or sertindole as an active ingredient.

Abstract: In accordance with an embodiment, a defect inspection method includes: generating first and second images regarding a subject with first and second patterns, extracting first coordinates of the first pattern from the first image, setting a mask region in which a predetermined margin is provided in the first coordinates, taking a difference between the second image and a reference image, and checking the difference against the mask region to detect a defect in the second pattern. The first image is generated from a signal obtained by generating a charged particle beam under a first charged particle irradiation condition and irradiating the charged particle beam to a subject. The second image is generated from a signal obtained by generating a charged particle beam under a second charged particle irradiation condition, irradiating the charged particle beam to a subject region of the subject, and detecting second charged particles generated from the subject.

Abstract: In accordance with an embodiment, a charged particle beam apparatus includes a charged particle source to generate a charged particle beam and irradiates a substrate with it, a detector to detect secondary charged particles from the substrate and output a signal, a deflector, a signal processing unit, a scanning procedure determination unit and a deflector control unit. The substrate has an inspection region where patterns are arranged and a non-inspection region. The signal processing unit processes the signal from the detector by scanning with a first beam for position detection to output positional information. The scanning procedure determination unit determines a procedure of scanning with a second beam for inspection on the basis of the positional information. The deflector control unit controls the deflector in such a manner that the inspection region is scanned with the second beam in a second direction in accordance with the determined scanning procedure.

Abstract: In accordance with an embodiment, a signal processing method includes scanning a pattern on a substrate with a charged particle beam, detecting secondary charged particles emitted from the substrate by using a detector, outputting a signal, and filtering the signal. The detector is separated or divided into a plurality of regions, and the secondary charged particles are detected separately in each region of the detector. Intensity of the filtering is defined in dependence on a function f(?) of an angle ? between a reference axis and a direction along which the secondary charged particles enter a detector plane. The reference axis is an arbitrary direction in a plane parallel to a surface of the substrate.

Abstract: A defect inspection method includes generating and applies a charged beam to a sample with patterns; controlling a shape of the charged beam so that a beam width in a first direction perpendicular to an optical axis differs from a beam width in a second direction perpendicular to the optical axis and the first direction, while substantially maintaining a cross-sectional area of the beam; scanning the sample with the charged beam having the controlled shape; and detecting charged particles from the sample by irradiation of the charged beam and detects a defect of the patterns. Assuming that the beam width of the charged beam in the first direction is smaller than that in the second direction, the first direction is set to a direction in which an interval between adjacent patterns becomes a minimum value and the sample is scanned in the second direction.

Abstract: A pattern inspection method includes scanning a substrate on which patterns are formed with a charged beam, detecting a charged particle generated from the surface of the substrate, and then acquiring an image of the patterns; comparing the image of the patterns with CAD data for the patterns to inspect the patterns; measuring the dimensions of an arbitrary pattern using the image; calculating a statistic of a dimensional value of the arbitrary pattern obtained by the measurement; judging the necessity of a correction on the basis of the calculated statistic; and performing correction processing when the correction is judged to be necessary.

Abstract: A pattern inspection method includes: acquiring an image of a pattern; performing matching of CAD data for the pattern and the image; extracting coordinates of a plurality of points on a line segment constituting a polygon figure in the CAD data, to be defined as a first coordinate group; specifying coordinates of edge points in the image corresponding to the plurality of points to be defined as a second coordinate group; calculating differences between the coordinates corresponding to each other from the first and second coordinate group, and calculating statistics each representing a degree of deviation in the matching based on the differences; correct the polygon figure when it is determined that a correction is required as a result of judgment based on the statistics; and inspecting the pattern by comparing the corrected polygon figure with the image.