Patents by Inventor Osamu Nishio

Osamu Nishio has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11958950
    Abstract: An ion exchange membrane containing a fluorinated polymer, wherein in a case where by Raman spectroscopy, polarized light orthogonal to the thickness direction of the ion exchange membrane is irradiated to obtain a spectrum chart, whereby the ratio of the peak area a2 of Raman shift 680 to 760 cm?1 to the peak area al of Raman shift 1,025 to 1,095 cm?1 is taken as A1, and by Raman spectroscopy, to a cross section in the thickness direction of the ion exchange membrane, polarized light parallel with the thickness direction is irradiated to obtain a spectrum chart, whereby the ratio of the peak area b2 of Raman shift 920 to 1,025 cm?1 to the peak area b1 of Raman shift 1,025 to 1,095 cm?1 is taken as B1, B1/A1 is at least 1.05.
    Type: Grant
    Filed: October 5, 2020
    Date of Patent: April 16, 2024
    Assignee: AGC Inc.
    Inventors: Shintaro Hayabe, Osamu Homma, Yasushi Yamaki, Tatsuya Miyajima, Takuo Nishio
  • Patent number: 7208768
    Abstract: A method is provided for forming an electroluminescent device. The method comprises: providing a type IV semiconductor material substrate; forming a p+/n+ junction in the substrate, typically a plurality of interleaved p+/n+ junctions are formed; and, forming an electroluminescent layer overlying the p+/n+ junction(s) in the substrate. The type IV semiconductor material substrate can be Si, C, Ge, SiGe, or SiC. For example, the substrate can be Si on insulator (SOI), bulk Si, Si on glass, or Si on plastic. The electroluminescent layer can be a material such as nanocrystalline Si, nanocrystalline Ge, fluorescent polymers, or type II–VI materials such as ZnO, ZnS, ZnSe, CdSe, and CdS. In some aspect, the method further comprises forming an insulator film interposed between the substrate and the electroluminescent layer. In another aspect, the method comprises forming a conductive electrode overlying the electroluminescent layer.
    Type: Grant
    Filed: April 30, 2004
    Date of Patent: April 24, 2007
    Assignee: Sharp Laboratories of America, Inc.
    Inventors: Yoshi Ono, Wei Gao, John F. Conley, Jr., Osamu Nishio, Keizo Sakiyama
  • Publication number: 20060071349
    Abstract: A semiconductor device, comprising: a flexible substrate; at least one semiconductor element; at least one electrode for external connection, the element and the electrode being formed on a front surface of the flexible substrate; and at least one wire formed on the front surface to electrically connect the element to the electrode, wherein at least a part of the flexible substrate has a curved form.
    Type: Application
    Filed: October 5, 2005
    Publication date: April 6, 2006
    Inventors: Nobuaki Tokushige, Osamu Nishio, Nobuyoshi Awaya
  • Publication number: 20050253136
    Abstract: A method is provided for forming an electroluminescent device. The method comprises: providing a type IV semiconductor material substrate; forming a p+/n+ junction in the substrate, typically a plurality of interleaved p+/n+ junctions are formed; and, forming an electroluminescent layer overlying the p+/n+ junction(s) in the substrate. The type IV semiconductor material substrate can be Si, C, Ge, SiGe, or SiC. For example, the substrate can be Si on insulator (SOI), bulk Si, Si on glass, or Si on plastic. The electroluminescent layer can be a material such as nanocrystalline Si, nanocrystalline Ge, fluorescent polymers, or type II-VI materials such as ZnO, ZnS, ZnSe, CdSe, and CdS. In some aspect, the method further comprises forming an insulator film interposed between the substrate and the electroluminescent layer. In another aspect, the method comprises forming a conductive electrode overlying the electroluminescent layer.
    Type: Application
    Filed: April 30, 2004
    Publication date: November 17, 2005
    Inventors: Yoshi Ono, Wei Gao, John Conley, Osamu Nishio, Keizo Sakiyama
  • Patent number: 5655423
    Abstract: A machine tool is provided having a spindle mounted for movement in a direction parallel to the spindle axis, the Z direction, and a direction perpendicular to the spindle axis, the X direction. The machine tool includes a machine bed and has means mounted to the machine bed for supporting at least one tool. At least one spindle is rotatably supported on the machine bed and includes a chuck for supporting a workpiece. The machine tool includes means mounting the spindle to the machine bed for movement in the Z direction and for independent movement in the X direction. Accordingly, the workpiece supporting means may be moved proximate to the tool supporting means and the workpiece may be engaged by a tool. The machine tool may further include feeder means for feeding bar stock to the workpiece supporting means so that the bar stock may be engaged by a tool. The machine tool may also include workpiece transfer means for facilitating the transfer of workpieces to and from the workpiece supporting means.
    Type: Grant
    Filed: January 26, 1996
    Date of Patent: August 12, 1997
    Assignee: Okuma America Corporation
    Inventors: Osamu Nishio, Norio Tanaka, Takayasu Asano, Eddie M. Godwin
  • Patent number: 5644961
    Abstract: A machine tool is provided having a spindle mounted for movement in a direction parallel to the spindle axis, the Z direction, and a direction perpendicular to the spindle axis, the X direction. The machine tool includes a machine bed and has means mounted to the machine bed for supporting at least one tool. At least one spindle is rotatably supported on the machine bed and includes a chuck for supporting a workpiece. The machine tool includes means mounting the spindle to the machine bed for movement in the Z direction and for independent movement in the X direction. Accordingly, the workpiece supporting means may be moved proximate to the tool supporting means and the workpiece may be engaged by a tool. The machine tool may further include feeder means for feeding bar stock to the workpiece supporting means so that the bar stock may be engaged by a tool. The machine tool may also include workpiece transfer means for facilitating the transfer of workpieces to and from the workpiece supporting means.
    Type: Grant
    Filed: November 9, 1994
    Date of Patent: July 8, 1997
    Assignee: Okuma America Corporation
    Inventors: Osamu Nishio, Norio Tanaka, Takayasu Asano, Eddie M. Godwin
  • Patent number: 3964276
    Abstract: A circular knitting machine having a device for electronically issuing a pattern-forming command is provided with a needle selection verification pulse detector. The needle selection verification pulse detector produces a needle selection verification pulse B.sub.1 in response to a needle-selecting coil exciting-voltage B affected by a pulse induced in a needle-selecting coil and to a needle-selecting coil command voltage A not affected by the pulse thus induced when a needle selector in a needle-selecting system moves. When the presence or absence of the command voltage A does not coincide with the presence or absence of the verification pulse B.sub.1 respectively, occurrence of a knitting error is immediately detected.
    Type: Grant
    Filed: September 3, 1975
    Date of Patent: June 22, 1976
    Assignee: Okuma Machinery Works, Ltd.
    Inventors: Osamu Nishio, Nokihisa Adachi