Abstract: A communication apparatus includes a signal termination unit that includes a point data management unit and performs reception processing by receiving a signal including an address code for identifying a plurality of remote signaling points, and a plurality of call processing units that perform call processing for the plurality of the remote signaling points, the point data management unit manages call-processing point data, and wherein the signal termination unit, upon receipt of the signal, extracts a code of the non-masked range of the address code having a wild card, and recognizes the call processing unit number corresponding to the extracted code of the non-masked range by referring to the call-processing point data, and transmits to the call processing unit having the recognized call processing unit number the corresponding address code describing all the bits of the code set in the masked range and the code set in the non-masked range.

Abstract: A charged-particle beam system used to fabricate or inspect semiconductor devices comprises the charged-particle beam accurately brought into position on a workpiece. The system has a workpiece stage, a laser metrology system for measuring movement of the stage, a first calculation unit for calculating the difference between the amount of movement of the stage measured and a target amount of movement of the stage. The amount of movement of the stage produced between the instant when the difference is calculated and the instant when the beam deflection system is started is calculated. Signals indicative of the calculated amounts are supplied to the deflection system.

Abstract: A charged-particle beam system used to fabricate or inspect semiconductor devices comprises the charged-particle beam accurately brought into position on a workpiece. The system has a workpiece stage, a laser metrology system for measuring movement of the stage, a first calculation unit for calculating the difference between the amount of movement of the stage measured and a target amount of movement of the stage. The amount of movement of the stage produced between the instant when the difference is calculated and the instant when the beam deflection system is started is calculated. Signals indicative of the calculated amounts are supplied to the deflection system.

Abstract: A lithographic method by the use of a variable-area electron-beam lithography machine makes use of an electron beam having a cross section shaped into right-angled isosceles triangles. The lithography machine can shape the cross section into the right-angled isosceles triangles or a rectangle. Where a trapezoidal figure to be written has at least one leg (oblique side) making an angle of 45 degrees with the normal to the bottom base, a portion including the 45-degree leg is extracted and written by the right-angled isosceles triangles.

Abstract: A lithographic method by the use of a variable-area electron-beam lithography machine makes use of an electron beam having a cross section shaped into right-angled isosceles triangles. The lithography machine can shape the cross section into the right-angled isosceles triangles or a rectangle. Where a trapezoidal figure to be written has at least one leg (oblique side) making an angle of 45 degrees with the normal to the bottom base, a portion including the 45-degree leg is extracted and written by the right-angled isosceles triangles.