Patents by Inventor Osamu Yamabe

Osamu Yamabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • One-component epoxy resin composition
    Patent number: 7479534
    Abstract: The present application relates to a one-component epoxy resin composition that contains an epoxy resin containing: (1) an epoxy resin having 2 or more epoxy groups in the molecule, (2) a polythiol compound having 2 or more thiol groups in the molecule, (3) a compound that releases a basic component under a curing temperature condition and dissolves in constituent (2), and (4) a compound having Lewis acidity. The present invention also relates to a method of producing the same.
    Type: Grant
    Filed: July 24, 2006
    Date of Patent: January 20, 2009
    Assignee: Ajinomoto Co., Inc.
    Inventors: Hiroshi Amano, Osamu Yamabe, Hiroyasu Koto
  • One-component epoxy resin composition
    Publication number: 20070021582
    Abstract: The present application relates to a one-component epoxy resin composition that contains an epoxy resin containing: (1) an epoxy resin having 2 or more epoxy groups in the molecule, (2) a polythiol compound having 2 or more thiol groups in the molecule, (3) a compound that releases a basic component under a curing temperature condition and dissolves in constituent (2), and (4) a compound having Lewis acidity. The present invention also relates to a method of producing the same.
    Type: Application
    Filed: July 24, 2006
    Publication date: January 25, 2007
    Applicant: Ajinomoto Co., Inc.
    Inventors: Hiroshi Amano, Osamu Yamabe, Hiroyasu Koto
  • Photomask unit, photomask device, projection exposure device, projection exposure method and semiconductor device
    Publication number: 20040028269
    Abstract: The atmosphere surrounding a photomask provided with a pellicle (2), particularly, an organic pellicle is replaced for purging with a mixed gas prepared by mixing an inert gas and a small amount of an active gas. The atmosphere in a space (8) between a mask base (1) and a pellicle (2) in a photomask is replaced for purging with a mixed gas prepared by mixing an inert gas and a small amount of an active gas.
    Type: Application
    Filed: September 24, 2002
    Publication date: February 12, 2004
    Inventors: Osamu Yamabe, Junji Miyazaki, Takashi Kozeki, Shigeto Shigematsu, Hiroaki Nakagawa