Abstract: The present invention provides a conveyance apparatus that conveys an object to a processing space in which processing is performed using the object, including a hand configured to hold the object, and a moving unit configured to freely move the hand in the processing space, wherein the hand includes a suction hole provided in a surface different from a holding surface configured to come into contact with the object and hold the object, and a first flow path configured to allow the suction hole and an exhaust source to communicate with each other, and exhaust an atmosphere around the suction hole sucked via the exhaust source and the suction hole to an outside.

Abstract: A system for forming a layer on a substrate, the system comprising a dispensing station configured to dispense formable material on the substrate, a shaping station configured to contact the dispensed formable material on the substrate with a plate, and a positioning system. The positioning system includes a hand configured to hold the substrate, a cover having an underside surface facing the hand and a topside surface opposite the underside surface, the cover being configured such that the underside surface covers the substrate and the dispensed formable material when the cover is positioned over the hand, and a plurality of support pads positioned on the topside surface of the cover, the plurality of support pads being configured to support the plate.

Abstract: A method for conveying a substrate from a first to a second apparatus is provided. Material is applied to the substrate when on the first apparatus. A substrate conveyance apparatus including first and second holding portions is used. As a first step, the substrate is transferred from a first apparatus placement surface to the substrate conveyance apparatus. The substrate is then conveyed from the first apparatus to the second apparatus. The substrate is then transferred from the first holding portion to the second apparatus. In the first step, raising the first holding portion in a state where the first holding portion is inserted in a space under the substrate causes the first holding portion to hold the substrate, and the second holding portion to hold a protection member by holding a holding and receiving portion provided on a protection member surface opposite to a protection member surface facing the substrate.

Abstract: A substrate processing apparatus that can radiate light on a composition in an optimum radiation amount based on acquired spectral sensitivity characteristics can be provided. A substrate processing apparatus configured to perform pattern formation processing on a composition on a substrate includes a first radiation unit configured to radiate first light onto the substrate, a dispenser configured to apply the composition to a first position inside the substrate processing apparatus, a template holding unit configured to hold a template to be brought in contact with the composition on the substrate, and a controller configured to control a radiation amount of the first light to be radiated by the first radiation unit based on spectral sensitivity characteristics of the composition that are measured in advance.

Abstract: A substrate transportation hand for transporting a substrate includes: at least one first holding part provided on an upper surface side of the substrate transportation hand and capable of sucking and holding the substrate; at least one second holding part provided on a lower surface side of the substrate transportation hand and capable of sucking and holding the substrate; and a drive unit for independently turning on/off sucking using the first holding part and the second holding part, in order to provide a substrate transportation hand which can efficiently transport while preventing dust in accordance with a form of a substrate.

Abstract: An imprint apparatus configured to form a pattern of an imprint material on a substrate using a mold includes a holding unit configured to hold the mold with a holding surface making contact with a first surface of the mold, a deformation unit configured to apply a force to the mold held at the holding surface to deform the mold, and a drive unit configured to move at least one of the mold held by the holding unit and the deformation unit to change a relative position between the mold held by the holding unit and the deformation unit. The drive unit changes a position where the deformation unit applies a force to the mold in a direction vertical to the first surface based on information about a position of a second surface on an opposite side of the first surface.

Abstract: A conveyance apparatus that is advantageous in terms of productivity is provided. The conveyance apparatus includes a holding unit configured to hold and convey a substrate, and an outlet unit which is disposed in the holding unit and includes a first outlet port configured to blow a gas in a first direction, which is a direction oblique to a first surface of the substrate held by the holding unit, toward the first surface.

Abstract: The present invention provides a conveyance apparatus that conveys an object to a processing space in which processing is performed using the object, including a hand configured to hold the object, and a moving unit configured to freely move the hand in the processing space, wherein the hand includes a suction hole provided in a surface different from a holding surface configured to come into contact with the object and hold the object, and a first flow path configured to allow the suction hole and an exhaust source to communicate with each other, and exhaust an atmosphere around the suction hole sucked via the exhaust source and the suction hole to an outside.

Abstract: A conveyance apparatus that is advantageous in terms of productivity is provided. The conveyance apparatus includes a holding unit configured to hold and convey a substrate, and an outlet unit which is disposed in the holding unit and includes a first outlet port configured to blow a gas in a first direction, which is a direction oblique to a first surface of the substrate held by the holding unit, toward the first surface.

Abstract: An imprint apparatus configured to form a pattern of an imprint material on a substrate using a mold includes a holding unit configured to hold the mold with a holding surface making contact with a first surface of the mold, a deformation unit configured to apply a force to the mold held at the holding surface to deform the mold, and a drive unit configured to move at least one of the mold held by the holding unit and the deformation unit to change a relative position between the mold held by the holding unit and the deformation unit. The drive unit changes a position where the deformation unit applies a force to the mold in a direction vertical to the first surface based on information about a position of a second surface on an opposite side of the first surface.

Abstract: A substrate holding apparatus that holds a substrate is provided. The apparatus comprises a rotary shaft which rotates about a vertical axis and includes a suction path leading from an upper end of the rotary shaft, and a holding unit which includes a suction hole formed in a rotation center, is fixed at the upper end of the rotary shaft such that the suction hole communicates with the suction path, and holds the substrate by sucking the substrate, wherein a plurality of vent holes for introducing an external gas into a space between the holding unit and the substrate are formed at positions rotationally symmetric with respect to the rotation center of the holding unit with an angle to face a back surface of the substrate placed on the holding unit.

Abstract: A substrate holding apparatus that holds a substrate is provided. The apparatus comprises a rotary shaft which rotates about a vertical axis and includes a suction path leading from an upper end of the rotary shaft, and a holding unit which includes a suction hole formed in a rotation center, is fixed at the upper end of the rotary shaft such that the suction hole communicates with the suction path, and holds the substrate by sucking the substrate, wherein a plurality of vent holes for introducing an external gas into a space between the holding unit and the substrate are formed at positions rotationally symmetric with respect to the rotation center of the holding unit with an angle to face a back surface of the substrate placed on the holding unit.

Abstract: A guide includes a brittle material layer and a magnetically attracting magnetic body, e.g., a metal layer. A recess and a projection are formed on the metal layer. The brittle material layer is made of, e.g., a sprayed ceramic material and covers the recess formed on the magnetically attracting metal layer. A movable body moves as it levitates above the surface of the brittle material layer.

Abstract: The exposure apparatus of the present invention is an exposure apparatus that illuminates an original with light from a light source so as to project a pattern of the original onto a substrate via a projection optical system for exposure, the exposure apparatus comprising a first shutter that shields light passing through a clearance between the light source and the projection optical system, and a control device that controls the opening and closing of the first shutter. While replacing a first original with a second original after an exposure operation has been completed by using the first original, the control device controls the first shutter such that the temperature of the projection optical system approaches closer to the projection optical system's saturation temperature that has been previously obtained via the second original.

Abstract: A guide includes a brittle material layer and a magnetically attracting magnetic body, e.g., a metal layer. A recess and a projection are formed on the metal layer. The brittle material layer is made of, e.g., a sprayed ceramic material and covers the recess formed on the magnetically attracting metal layer. A movable body moves as it levitates above the surface of the brittle material layer.

Abstract: A guide includes a brittle material layer and a magnetically attracting magnetic body, e.g., a metal layer. A recess and a projection are formed on the metal layer. The brittle material layer is made of, e.g., a sprayed ceramic material and covers the recess formed on the magnetically attracting metal layer. A movable body moves as it levitates above the surface of the brittle material layer.

Abstract: The exposure apparatus of the present invention is an exposure apparatus that illuminates an original with light from a light source so as to project a pattern of the original onto a substrate via a projection optical system for exposure, the exposure apparatus comprising a first shutter that shields light passing through a clearance between the light source and the projection optical system, and a control device that controls the opening and closing of the first shutter. While replacing a first original with a second original after an exposure operation has been completed by using the first original, the control device controls the first shutter such that the temperature of the projection optical system approaches closer to the projection optical system's saturation temperature that has been previously obtained via the second original.

Abstract: A guide includes a brittle material layer and a magnetically attracting magnetic body, e.g., a metal layer. A recess and a projection are formed on the metal layer. The brittle material layer is made of, e.g., a sprayed ceramic material and covers the recess formed on the magnetically attracting metal layer. A movable body moves as it levitates above the surface of the brittle material layer.