Patents by Inventor Osamu Yoshino

Osamu Yoshino has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250018425
    Abstract: A composite material structure includes a composite material including a carbon fiber and a resin; a conductive primer including a carbon nanofiber and applied at least on a surface of the edge of the composite material; and a conductive sealant including a conductive material and applied on the surface of the conductive primer.
    Type: Application
    Filed: November 14, 2022
    Publication date: January 16, 2025
    Inventors: Shunsuke YOSHINO, Masao TOMIYAMA, Noriyuki KATO, Osamu YOSHIDA, Kotaro TSUJI, Chiaki ITO
  • Publication number: 20090142388
    Abstract: The present invention aims at provision of a patch preparation having a small area and permitting adhesion for a long time. The present invention provides a patch preparation having an adhesive layer on at least one surface of a support, wherein the adhesive layer contains an adhesive, a poorly soluble drug, a first organic liquid component, a second organic liquid component, a third organic liquid component and crosslinked polyvinylpyrrolidone, the solubility of the poorly soluble drug in the first organic liquid component is not less than the solubility of the poorly soluble drug in the second organic liquid component, and the solubility of the poorly soluble drug in the second organic liquid component is not less than the solubility of the poorly soluble drug in the third organic liquid component.
    Type: Application
    Filed: October 17, 2008
    Publication date: June 4, 2009
    Inventors: Keigo Inosaka, Kei Tamura, Osamu Yoshino
  • Patent number: 5300497
    Abstract: A penam derivative represented by the following general formula or a salt thereof: ##STR1## wherein R.sup.1 represents a hydrogen atom, an amino-protecting group or an acyl group; R.sup.2 represents a hydrogen atom or a lower alkyl group; R.sup.3 represents a hydrogen atom, a lower alkoxy group, a lower alkylthio group or a formamido group; R.sup.4 represents an protected or unprotected carboxyl group or a carboxylato group; R represents a group of the formula, --NHR.sup.5 or --NR.sup.5 R.sup.6 (in which R.sup.5 and R.sup.6, which may be the same or different, represent protected or unprotected hydroxyl groups, cyano groups, sulfo groups, or unsubstituted or substituted lower alkyl, aryl, acyl, carbamoyl, sulfamoyl, lower alkylsulfonyl or heterocyclic groups) or a group of the formula, --N.dbd.CR.sup.7 R.sup.8 (in which R.sup.7 and R.sup.
    Type: Grant
    Filed: October 7, 1992
    Date of Patent: April 5, 1994
    Assignee: Toyama Chemical Co., Ltd.
    Inventors: Hirokazu Ochiai, Yasuo Watanabe, Yoshiharu Murotani, Hirohiko Fukuda, Osamu Yoshino, Shinzaburo Minami, Toshio Hayashi, Kaishu Momonoi
  • Patent number: 5185330
    Abstract: A penam derivative represented by the following general formula or a salt thereof: ##STR1## wherein R.sup.1 represents a hydrogen atom, an amino-protecting group or an acyl group; R.sup.2 represents a hydrogen atom or a lower alkyl group; R.sup.3 represents a hydrogen atom, a lower alkoxy group, a lower alkylthio group or a formamido group; R.sup.4 represents a protected or unprotected carboxy group or a craboxylato group; R represents a group of the formula, --NHR.sup.5 or --NR.sup.5 R.sup.6 (in which R.sup.5 and R.sup.6, which may be the same or different, represent protected or unprotected hydroxyl groups, cyano groups, sulfo groups, or unsubstituted or substituted lower alkyl, aryl, acyl, carbamoyl, sulfamoyl, lower alkylsulfonyl or heterocyclic groups) or a group of the formula, --N.dbd.CR.sup.7 R.sup.8 (in which R.sup.7 and R.sup.
    Type: Grant
    Filed: June 20, 1990
    Date of Patent: February 9, 1993
    Assignee: Toyama Chemical Co., Ltd.
    Inventors: Hirokazu Ochiai, Yasuo Watanabe, Yoshiharu Murotani, Hirohiko Fukuda, Osamu Yoshino, Shinzaburo Minami, Toshio Hayashi, Kaishu Momonoi