Patents by Inventor Oscar Fransiscus Jozephus Noordman

Oscar Fransiscus Jozephus Noordman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic projection apparatus and device manufacturing method
    Patent number: 6597431
    Abstract: A lithographic projection apparatus includes a radiation system for supplying a projection beam of radiation having a propagation direction, a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern, a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate, wherein the lithographic projection apparatus further includes a sensor for measuring a movement of the projection beam perpendicular to its propagation direction and a controller to control a received dose of the projection beam on a target portion of the substrate in response to an output from the sensor.
    Type: Grant
    Filed: July 6, 2001
    Date of Patent: July 22, 2003
    Assignee: ASML Netherlands B.V.
    Inventors: Jozef Petrus Henricus Benschop, Oscar Fransiscus Jozephus Noordman, Michael Jozefa Mathijs Renkens, Erik Roelof Loopstra, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Antonius Johannes Josephus van Dijsseldonk
  • Lithographic projection apparatus and device manufacturing method
    Publication number: 20020018194
    Abstract: A lithographic projection apparatus includes a radiation system for supplying a projection beam PB of radiation having a propagation direction, a support structure MT for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern MA, a substrate table WT for holding a substrate and a projection system PL for projecting the patterned beam PB onto a target portion C of the substrate W, wherein the lithographic projection apparatus further comprises a sensor MM for measuring a movement of the projection beam PB perpendicular to its propagation direction and a controller CM to control a received dose of said projection beam PM on a target portion C of the substrate W in response to an output from said sensor MM.
    Type: Application
    Filed: July 6, 2001
    Publication date: February 14, 2002
    Inventors: Jozef Petrus Henricus Benschop, Oscar Fransiscus Jozephus Noordman, Michael Jozefa Mathijs Renkens, Erik Roelof Loopstra, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Antonius Johannes Josephus Van Van Dijsseldonk