Patents by Inventor Oswald Gromer
Oswald Gromer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20190129318Abstract: A projection exposure system (10) includes: a mask holding device (14), a substrate holding device (36), projection optics (26) imaging the mask structures (20) onto the substrate (30) during an exposure process, and a measurement structure (48) disposed in a defined position with respect to a reference element (16) of the projection exposure system, which defined position is mechanically uncoupled from the position of the mask holding device. The projection exposure system also includes a detector (52) arranged to record an image of the measurement structure imaged by the projection optics. During operation of the system, the imaging of the mask structures and of the measurement structure takes place at the same time by the projection optics. An evaluation device (54) establishes a lateral position of the image of the measurement structure in the area of the detector during the exposure process.Type: ApplicationFiled: August 3, 2018Publication date: May 2, 2019Inventors: Ulrich Mueller, Joachim Stuehler, Oswald Gromer, Rolf Freimann, Paul Kaufmann, Bernhard Geuppert
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Patent number: 10114293Abstract: An illumination system and a projection objective of a mask inspection apparatus are provided. During operation of the mask inspection apparatus, the illumination system illuminates a mask with an illumination bundle of rays having a centroid ray that has a direction dependent on the location of the incidence of the illumination bundle of rays on the mask.Type: GrantFiled: August 16, 2012Date of Patent: October 30, 2018Assignee: Carl Zeiss SMT GmbHInventors: Heiko Feldmann, Erik Matthias Sohmen, Joachim Stuehler, Oswald Gromer, Ulrich Mueller, Michael Layh, Markus Schwab
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Patent number: 10042271Abstract: A projection exposure system (10) for microlithography which includes: a mask holding device (14) holding a mask (18) with mask structures (20) disposed on the mask, a substrate holding device (36) holding a substrate (30), projection optics (26) imaging the mask structures (20) onto the substrate (30) during an exposure process, and a measurement structure (48) disposed in a defined position with respect to a reference element (16) of the projection exposure system (10), which defined position is mechanically uncoupled from the position of the mask holding to device (14). The projection exposure system (10) also includes a detector (52) arranged to record an image of the measurement structure (48) imaged by the projection optics (26). The projection exposure system (10) is configured such that during operation of the projection exposure system (10) the imaging of the mask structures (20) and the imaging of the measurement structure (48) take place at the same time by the projection optics (26.Type: GrantFiled: June 30, 2017Date of Patent: August 7, 2018Assignee: Carl Zeiss SMT GmbHInventors: Ulrich Mueller, Joachim Stuehler, Oswald Gromer, Rolf Freimann, Paul Kaufmann, Bernhard Geuppert
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Publication number: 20180024445Abstract: A projection exposure system (10) for microlithography which includes: a mask holding device (14) holding a mask (18) with mask structures (20) disposed on the mask, a substrate holding device (36) holding a substrate (30), projection optics (26) imaging the mask structures (20) onto the substrate (30) during an exposure process, and a measurement structure (48) disposed in a defined position with respect to a reference element (16) of the projection exposure system (10), which defined position is mechanically uncoupled from the position of the mask holding to device (14). The projection exposure system (10) also includes a detector (52) arranged to record an image of the measurement structure (48) imaged by the projection optics (26). The projection exposure system (10) is configured such that during operation of the projection exposure system (10) the imaging of the mask structures (20) and the imaging of the measurement structure (48) take place at the same time by the projection optics (26.Type: ApplicationFiled: June 30, 2017Publication date: January 25, 2018Inventors: Ulrich Mueller, Joachim Stuehler, Oswald Gromer, Rolf Freimann, Paul Kaufmann, Bernhard Geuppert
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Patent number: 9696639Abstract: A projection exposure system (10) for microlithography which includes: a mask holding device (14) holding a mask (18) with mask structures (20) disposed on the mask, a substrate holding device (36) holding a substrate (30), projection optics (26) imaging the mask structures (20) onto the substrate (30) during an exposure process, and a measurement structure (48) disposed in a defined position with respect to a reference element (16) of the projection exposure system (10), which defined position is mechanically uncoupled from the position of the mask holding device (14). The projection exposure system (10) also includes a detector (52) arranged to record an image of the measurement structure (48) imaged by the projection optics (26). The projection exposure system (10) is configured such that during operation of the projection exposure system (10) the imaging of the mask structures (20) and the imaging of the measurement structure (48) take place at the same time by the projection optics (26.Type: GrantFiled: April 6, 2015Date of Patent: July 4, 2017Assignee: Carl Zeiss SMT GmbHInventors: Ulrich Mueller, Joachim Stuehler, Oswald Gromer, Rolf Freimann, Paul Kaufmann, Bernhard Geuppert
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Publication number: 20150212431Abstract: A projection exposure system (10) for microlithography which includes: a mask holding device (14) holding a mask (18) with mask structures (20) disposed on the mask, a substrate holding device (36) holding a substrate (30), projection optics (26) imaging the mask structures (20) onto the substrate (30) during an exposure process, and a measurement structure (48) disposed in a defined position with respect to a reference element (16) of the projection exposure system (10), which defined position is mechanically uncoupled from the position of the mask holding device (14). The projection exposure system (10) also includes a detector (52) arranged to record an image of the measurement structure (48) imaged by the projection optics (26). The projection exposure system (10) is configured such that during operation of the projection exposure system (10) the imaging of the mask structures (20) and the imaging of the measurement structure (48) take place at the same time by the projection optics (26.Type: ApplicationFiled: April 6, 2015Publication date: July 30, 2015Inventors: Ulrich Mueller, Joachim Stuehler, Oswald Gromer, Rolf Freimann, Paul Kaufmann, Bernhard Geuppert
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Patent number: 9001304Abstract: A projection exposure system (10) for microlithography which includes: a mask holding device (14) holding a mask (18) with mask structures (20) disposed on the mask, a substrate holding device (36) holding a substrate (30), projection optics (26) imaging the mask structures (20) onto the substrate (30) during an exposure process, and a measurement structure (48) disposed in a defined position with respect to a reference element (16) of the projection exposure system (10), which defined position is mechanically uncoupled from the position of the mask holding device (14). The projection exposure system (10) also includes a detector (52) arranged to record an image of the measurement structure (48) imaged by the projection optics (26). The projection exposure system (10) is configured such that during operation of the projection exposure system (10) the imaging of the mask structures (20) and the imaging of the measurement structure (48) take place at the same time by the projection optics (26.Type: GrantFiled: July 16, 2010Date of Patent: April 7, 2015Assignee: Carl Zeiss SMT GmbHInventors: Ulrich Mueller, Joachim Stuehler, Oswald Gromer, Rolf Freimann, Paul Kaufmann, Bernhard Geuppert
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Publication number: 20130038850Abstract: An illumination system and a projection objective of a mask inspection apparatus are provided. During operation of the mask inspection apparatus, the illumination system illuminates a mask with an illumination bundle of rays having a centroid ray that has a direction dependent on the location of the incidence of the illumination bundle of rays on the mask.Type: ApplicationFiled: August 16, 2012Publication date: February 14, 2013Inventors: Heiko Feldmann, Erik Matthias Sohmen, Joachim Stuehler, Oswald Gromer, Ulrich Mueller, Michael Layh, Markus Schwab
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Publication number: 20120021371Abstract: A dental cleaning system for providing a liquid jet for a mouth rinse includes a nozzle member, a nozzle attachment coupled to the nozzle member to define an axially extending chamber, a liquid duct configured to supply pressurized liquid to the chamber, a pressure piece disposed within the chamber, and a nozzle outlet extending out of the chamber and configured to discharge a cleaning jet.Type: ApplicationFiled: September 30, 2011Publication date: January 26, 2012Inventors: Oswald Gromer, Andreas Kramp, Michael Sauer, Michael Stolper, Norbert Schaefer, Karl Herzog
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Patent number: 8052627Abstract: A dental cleaning system for providing a liquid jet for a mouth rinse includes a nozzle member, a nozzle attachment coupled to the nozzle member to define an axially extending chamber, a liquid duct configured to supply pressurized liquid to the chamber, a pressure piece disposed within the chamber, and a nozzle outlet extending out of the chamber and configured to discharge a cleaning jet.Type: GrantFiled: October 15, 2003Date of Patent: November 8, 2011Assignee: The Procter & Gamble CompanyInventors: Oswald Gromer, Andreas Kramp, Michael Sauer, Michael Stolper, Norbert Schaefer, Karl Herzog
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Publication number: 20110013171Abstract: A projection exposure system (10) for microlithography which includes: a mask holding device (14) holding a mask (18) with mask structures (20) disposed on the mask, a substrate holding device (36) holding a substrate (30), projection optics (26) imaging the mask structures (20) onto the substrate (30) during an exposure process, and a measurement structure (48) disposed in a defined position with respect to a reference element (16) of the projection exposure system (10), which defined position is mechanically uncoupled from the position of the mask holding device (14). The projection exposure system (10) also includes a detector (52) arranged to record an image of the measurement structure (48) imaged by the projection optics (26). The projection exposure system (10) is configured such that during operation of the projection exposure system (10) the imaging of the mask structures (20) and the imaging of the measurement structure (48) take place at the same time by the projection optics (26.Type: ApplicationFiled: July 16, 2010Publication date: January 20, 2011Applicant: Carl Zeiss SMT AGInventors: Ulrich Mueller, Joachim Stuehler, Oswald Gromer, Rolf Freimann, Paul Kaufmann, Bernhard Geuppert
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Patent number: 7755748Abstract: A scattered light measurement device includes an illumination mask providing measuring radiation on an entrance side (1a) of a test component (1) and a detection part (3-6) for detection of light scattered by the test component and disposed on an exit side (1b) of the test component. The illumination mask includes at least one scattered light measurement structure, wherein the scattered light measurement structure has a scattered light marker zone and wherein the scattered light marker zone has a rotationally non-symmetric shape.Type: GrantFiled: July 29, 2008Date of Patent: July 13, 2010Assignee: Carl Zeiss SMT AGInventors: Michael Arnz, Oswald Gromer, Gerd Klose, Joachim Stuehler, Matthias Manger
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Publication number: 20080285018Abstract: An illumination mask (10a) for a device for the range-resolved determination of scattered light, having one or more scattered-light measuring structures (11a) which respectively include an inner dark-field zone which defines a minimum scattering range, to an associated image-field mask and a corresponding device is provided. Also provided is an associated operating method and a microlithography projection-exposure system having such a device. The scattered-lighter measuring structure in the illumination mask has a scattered-light marker zone (20a) in the form of a bright-field zone, which on the one hand borders the inner dark-field zone and on the other hand borders an outer dark-field zone, which defines a maximum scattering range. The device may optionally be designed for the multi-channel measuring of scattered light by using a suitable image-field mask and also for multi-channel wavefront measurement, and the detection part may contain an immersion medium.Type: ApplicationFiled: July 29, 2008Publication date: November 20, 2008Applicant: Carl Zeiss SMT AGInventors: Michael Arnz, Oswald Gromer, Gerd Klose, Joachim Stuehler, Matthias Manger
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Patent number: 7408631Abstract: An illumination mask (10a) for a device for the range-resolved determination of scattered light, having one or more scattered-light measuring structures (11a) which respectively include an inner dark-field zone which defines a minimum scattering range, to an associated image-field mask and a corresponding device is provided. Also provided is an associated operating method and a microlithography projection-exposure system having such a device. The scattered-lighter measuring structure in the illumination mask has a scattered-light marker zone (20a) in the form of a bright-field zone, which on the one hand borders the inner dark-field zone and on the other hand borders an outer dark-field zone, which defines a maximum scattering range. The device may optionally be designed for the multi-channel measuring of scattered light by using a suitable image-field mask and also for multi-channel wavefront measurement, and the detection part may contain an immersion medium.Type: GrantFiled: October 8, 2004Date of Patent: August 5, 2008Assignee: Carl Zeiss SMT AGInventors: Michael Arnz, Oswald Gromer, Gerd Klose, Joachim Stuehler, Matthias Manger
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Publication number: 20060097084Abstract: A dental cleaning system for providing a liquid jet for a mouth rinse includes a nozzle member, a nozzle attachment coupled to the nozzle member to define an axially extending chamber, a liquid duct configured to supply pressurized liquid to the chamber, a pressure piece disposed within the chamber, and a nozzle outlet extending out of the chamber and configured to discharge a cleaning jet.Type: ApplicationFiled: October 15, 2003Publication date: May 11, 2006Inventors: Oswald Gromer, Andreas Kramp, Michael Sauer, Michael Stolper, Norbert Schaefer, Karl Herzog
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Publication number: 20050264819Abstract: An illumination mask (10a) for a device for the range-resolved determination of scattered light, having one or more scattered-light measuring structures (11a) which respectively include an inner dark-field zone which defines a minimum scattering range, to an associated image-field mask and a corresponding device is provided. Also provided is an associated operating method and a microlithography projection-exposure system having such a device. The scattered-lighter measuring structure in the illumination mask has a scattered-light marker zone (20a) in the form of a bright-field zone, which on the one hand borders the inner dark-field zone and on the other hand borders an outer dark-field zone, which defines a maximum scattering range. The device may optionally be designed for the multi-channel measuring of scattered light by using a suitable image-field mask and also for multi-channel wavefront measurement, and the detection part may contain an immersion medium.Type: ApplicationFiled: October 8, 2004Publication date: December 1, 2005Inventors: Michael Arnz, Oswald Gromer, Gerd Klose, Joachim Stuehler, Matthias Manger