Abstract: A method to stabilize position and shape of a plasma beam established between a cathode and an anode, where an electrical field is established between the cathode and the anode and where the shortest electrical field line between the cathode and the anode defines a reference line, wherein at least one oriented electromagnetic coil is provided and the at least one oriented electromagnetic coil has its coil axis oriented in a non-colinear manner to the reference line in such a way that at least one of the straight lines which are intersecting both of the coil openings and which are parallel to the coil axis intersects with the reference line and where a current is sent through the at least one oriented electromagnetic coil in order to establish a magnetic field which is used to deflect or attract the plasma beam.

Abstract: Magnetron sputtering source (1) for coating of a substrate (2), the sputtering source (1) comprising: a target (5) having a target surface at a front side a magnetron arrangement (511, 512) at a backside of the target (5) for creating a magnetic field near the target surface, to define a loop shaped erosion zone (20) at the target surface between an inner magnet assembly (512) and an outer magnet assembly (511), wherein the erosion zone (20) comprises a middle section with two parallel tracks (26) having a distance (d) and two curved end loop sections (27) each of which connects adjoining ends of the parallel tracks (26) and has a loop width (w) in the direction of the distance (d) which is greater than the distance (d) resulting in a double-T-shaped primary geometry of the erosion zone to provide an increased coating material flux from the end loop sections (27) to the substrate.

Abstract: The invention relates to a method of forming a coating for deposition to non-metallic surfaces, comprising the steps of applying (120) a semiconductor material to a substrate to form a semiconductor material layer and simultaneously or subsequently applying (140) metallic material or additional semiconductor material, wherein the metallic material or additional semiconductor material is introduced into the semiconductor material layer in a targeted manner to tailor the optical properties of the coating.

Abstract: The present invention provides a solution for coating substrates which are moved on a carrier that can move from painting, coating or treatment modules in a continuous inline production facility having a system which allows to easily switch between a back and forth limited rotational movement, called rocking mode, for critical processes such as physical vapor deposition (PVD) coating, UV hardening and IR flashing, and a continuous rotational movement of the substrates when the substrates are in a painting or drying process module.

Abstract: The present invention relates to a curing device for applying UV radiation to substrates, comprising at least one radiation source, at least one reflector member surrounding the radiation source, at least two divided dichroic mirror members opposite to the radiation source, which largely transmit the VIS & IR content of the radiation source and keep it away from the processing zone and at the same time largely reflect the UV content of the radiation source in the direction of the processing zone, at least one optical disk member that separates the cooling gas flow in the exposure device from the processing zone, and which is characterized in that the at least two divided dichroic mirror members are arranged in such a manner that they are separate from one another and offset from one another in the direction of the main beam and are displaced parallel to the main beam and thus opaque to the main beam, so that cooling gas can flow out through the openings created, but intensity loss of the UV radiation does

Abstract: Magnetron sputtering source (1) for coating of a substrate (2), the sputtering source (1) comprising: a target (5) having a target surface at a front side a magnetron arrangement (511, 512) at a backside of the target (5) for creating a magnetic field near the target surface, to define a loop shaped erosion zone (20) at the target surface between an inner magnet assembly (512) and an outer magnet assembly (511), wherein the erosion zone (20) comprises a middle section with two parallel tracks (26) having a distance (d) and two curved end loop sections (27) each of which connects adjoining ends of the parallel tracks (26) and has a loop width (w) in the direction of the distance (d) which is greater than the distance (d) resulting in a double-T-shaped primary geometry of the erosion zone to provide an increased coating material flux from the end loop sections (27) to the substrate.

Abstract: Component surfaces are coated with thermally stable layers. In particular infrared mirror surfaces or surfaces of combustion chambers are coated with at least one layer consisting of thermally stable Al—Cr—O in such a manner that the absorption, reflection or transmission of infrared radiations (hereinafter also called thermal radiations) is influenced.

Abstract: The present invention relates to a curing device for applying UV radiation to substrates, comprising at least one radiation source, at least one reflector member surrounding the radiation source, at least two divided dichroic mirror members opposite to the radiation source, which largely transmit the VIS & IR content of the radiation source and keep it away from the processing zone and at the same time largely reflect the UV content of the radiation source in the direction of the processing zone, at least one optical disk member that separates the cooling gas flow in the exposure device from the processing zone, and which is characterized in that the at least two divided dichroic mirror members are arranged in such a manner that they are separate from one another and offset from one another in the direction of the main beam and are displaced parallel to the main beam and thus opaque to the main beam, so that cooling gas can flow out through the openings created, but intensity loss of the UV radiation does

Abstract: An in-situ process-monitoring device for measuring a curing state of components coated with a UV-curable lacquer. The device includes at least one radiation source for curing the lacquer, as well as at least one signal source and at least one spectrometer for measuring radiation of the signal source reflected from the components, in order to determine the curing state. The measuring is carried out in a contactless manner, and the at least one signal source for the measuring is identical to the at least one radiation source for the curing.

Abstract: Component surfaces are coated with thermally stable layers. In particular infrared mirror surfaces or surfaces of combustion chambers are coated with at least one layer consisting of thermally stable Al—Cr—O in such a manner that the absorption, reflection or transmission of infrared radiations (hereinafter also called thermal radiations) is influenced.

Abstract: The magnetron sputtering source comprises a target mount for mounting a target arrangement comprising a sputtering target having a sputtering surface; a primary magnet arrangement for generating close to said sputtering surface a magnetron magnetic field describing one tunnel-like closed loop having an arc-shaped cross-section; a secondary magnet arrangement for generating close to said sputtering surface an auxiliary magnetic field having a substantially arc-shaped cross-section, said auxiliary magnetic field superposing with said magnetron magnetic field and being substantially inversely polarized with respect to said magnetron magnetic field; and an adjustment unit for adjusting said auxiliary magnetic field. The vacuum treatment apparatus comprises such a magnetron sputtering source.

Abstract: An in-situ process-monitoring device for measuring a curing state of components coated with a UV-curable lacquer. The device includes at least one radiation source for curing the lacquer, as well as at least one signal source and at least one spectrometer for measuring radiation of the signal source reflected from the components, in order to determine the curing state. The measuring is carried out in a contactless manner, and the at least one signal source for the measuring is identical to the at least one radiation source for the curing.

Abstract: The present invention relates to a pharmaceutical composition, in particular to a composition for administering active agents which are poorly soluble in aqueous media, and/or which are acid sensitive.

Abstract: A method for dividing substantially nonpolarized white light into three substantially nonpolarized fractions includes splitting the substantially nonpolarized white light into a first fraction and a second fraction, the first fraction being substantially nonpolarized light of a first wavelength interval and the second fraction of substantially nonpolarized light of a second and a third wavelength interval, the first wavelength interval being located between the second and the third wavelength interval and splitting the second fraction into a third fraction with substantially nonpolarized light of the second wavelength interval and into a fourth fraction with substantially nonpolarized light of the third wavelength interval.

Abstract: The magnetron sputtering source comprises a target mount for mounting a target arrangement comprising a sputtering target having a sputtering surface; a primary magnet arrangement for generating close to said sputtering surface a magnetron magnetic field describing one tunnel-like closed loop having an arc-shaped cross-section; a secondary magnet arrangement for generating close to said sputtering surface an auxiliary magnetic field having a substantially arc-shaped cross-section, said auxiliary magnetic field superposing with said magnetron magnetic field and being substantially inversely polarized with respect to said magnetron magnetic field; and an adjustment unit for adjusting said auxiliary magnetic field. The vacuum treatment apparatus comprises such a magnetron sputtering source.

Abstract: An optical element structured in accordance with the invention comprises a substrate with at least two zones with different optical functions. The coating systems in the two zones can in each case be subdivided into a zone-specific internal partial coating system and a complementary partial coating system that is common to all the zones, where the complementary partial coating system comprises at least one layer and in the zones in which the internal partial coating systems comprises at least one layer said coating system is arranged between the substrate and the complementary partial coating system.

Abstract: Methods for filtering particles from a fluid are disclosed, wherein an array of microstructures defining respective microchannels having respective minimum widths are used to separate the fluid from particles to be filtered. The fluid flows through the minimum widths into the microchannels defined between adjacent microstructures. The particles to be filtered are prevented from passing through the respective minimum widths, resulting in filtration of those particles from the fluid. The microchannels can be provided with gradient characteristics to separate particles in the fluid according to size.

Abstract: A method for dividing substantially nonpolarized white light into three substantially nonpolarized fractions includes splitting the substantially nonpolarized white light into a first fraction and a second fraction, the first fraction being substantially nonpolarized light of a first wavelength interval and the second fraction of substantially nonpolarized light of a second and a third wavelength interval, the first wavelength interval being located between the second and the third wavelength interval and splitting the second fraction into a third fraction with substantially nonpolarized light of the second wavelength interval and into a fourth fraction with substantially nonpolarized light of the third wavelength interval.

Abstract: The present invention relates to a method for combining or for splitting the beam paths of substantially nonpolarized light of at least three different wavelength intervals. The splitting or the combining of the beam path of light of those wavelength intervals located between the other wavelength intervals takes place when the beam paths of the light of the two other wavelength intervals are already or still combined. The present invention also relates to an illumination unit comprising a white light source and utilizing this method by means of interference filters for splitting the white light into red, blue and green light beams. The invention also relates to an illumination unit comprising a red, green and blue light source and utilizing these methods by means of interference filters for the combination of the beam paths of the light sources.

Abstract: A process is disclosed for manufacturing coated substantially plane workpieces, in which the workpieces are guided to a vacuum treatment area guided by a control. The treatment atmosphere is modulated in the treatment area as a function of workpiece position with the defined profile. The system and process can be used to deposit defined layer thickness distribution profiles on substrates in a reactive coating.