Patents by Inventor Owen A. Heng

Owen A. Heng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Treatment of vent gas to remove hydrogen chloride
    Patent number: 5401872
    Abstract: A process for recovering chlorine present in a gaseous vent stream. The process comprises contacting a gaseous vent gas comprising hydrogen chloride and a hydrosilane with a chlorination catalyst to form a more chlorinated silane. The chlorination of the hydrosilane captures the chlorine of the hydrogen chloride as a substituent of the resulting chlorosilane and provides for a readily condensable chlorosilane.
    Type: Grant
    Filed: March 7, 1994
    Date of Patent: March 28, 1995
    Assignee: Hemlock Semiconductor
    Inventors: Richard A. Burgie, Owen A. Heng, Tod E. Lange
  • Separation by atomization of by-product stream into particulate silicon and silanes
    Patent number: 5118486
    Abstract: The present invention is a process for separating particulate silicon from a liquid by-product stream containing silanes. The liquid by-product stream comprising silanes and particulate silicon is atomized into a heated zone to effect vaporization of the liquid silanes, thus drying the particulate silicon. The dried particulate silicon is separated from the gaseous silanes by filtration or other suitable means. The separated solid and gaseous phases may be used as feed to the process generating the by-product stream or as a feed for other processes.
    Type: Grant
    Filed: April 26, 1991
    Date of Patent: June 2, 1992
    Assignee: Hemlock Semiconductor Corporation
    Inventors: Richard A. Burgie, Owen A. Heng