Abstract: The present invention is an adjustment means for a mandibular advancement device. The mandibular advancement device being of the type having both intraoral and extraoral portions, including a body portion that is at the interface between the intraoral and extraoral portions and thereby is part intraoral and part extraoral. The extraoral portion includes a lower arm that is substantially straight and extends directly outwardly from the extraoral part of the body portion, and a curved upper arm that curves upwardly from the lower arm and back towards the face of a person using the device. The posterior end of the upper arm includes a pad assembly that is adapted to make contact with, and apply pressure to, the subnasal maxillary bone of the wearer. A substantial portion of the lower arm is engageable with motorised means that are encapsulated within the body portion and are adapted to engage with the lower arm and cause it to slide further out of, or slidably retract further into, the body portion.

Abstract: The present invention is an adjustment means for a mandibular advancement device, having both intraoral and extraoral portions, including a body portion at the interface. The extraoral portion includes a lower arm and a curved upper arm. The posterior end of the upper arm includes a pad assembly that is adapted to make contact with and apply pressure to the subnasal maxillary bone. The lower arm includes a thread that is adapted to be threaded into an adjustment wheel so that turning in one direction causes the extraoral portion to retract into the body portion, causing the upper pad to apply greater pressure to the subnasal maxillary bone. Turning the adjustment wheel in the opposite direction causes the upper pad to apply decreased pressure. One complete revolution of the adjustment wheel in a first or second direction causes the extraoral portion to extend or retract by one millimetre in length.

Abstract: The present invention is an adjustment means for a mandibular advancement device. The mandibular advancement device being of the type having both intraoral and extraoral portions, including a body portion that is at the interface between the intraoral and extraoral portions and thereby is part intraoral and part extraoral. The extraoral portion includes a lower arm that is substantially straight and extends directly outwardly from the extraoral part of the body portion, and a curved upper arm that curves upwardly from the lower arm and back towards the face of a person using the device. The posterior end of the upper arm includes a pad assembly that is adapted to make contact with, and apply pressure to, the subnasal maxillary bone of the wearer. A substantial portion of the lower arm is engageable with motorised means that are encapsulated within the body portion and are adapted to engage with the lower arm and cause it to slide further out of, or slidably retract further into, the body portion.

Abstract: The present invention provides adjustment means for a mandibular advancement device. The device includes both intraoral and extraoral portions. The intraoral portion includes a body portion. The body portion includes lower and upper plates. The lower plate is adapted to accommodate a pair of opposed arms that extend rearwardly and outwardly from the plate into the oral cavity when the device is worn. Each arm includes a posterior intraoral maxillary abutment surface. The lower plate includes a threaded hole on each side, adjacent a respective arm so that the threaded hole extends from the respective arm towards the edge of the plate.

Abstract: The present invention is an adjustment means for a mandibular advancement device, having both intraoral and extraoral portions, including a body portion at the interface. The extraoral portion includes a lower arm and a curved upper arm. The posterior end of the upper arm includes a pad assembly that is adapted to make contact with and apply pressure to the subnasal maxillary bone. The lower arm includes a thread that is adapted to be threaded into an adjustment wheel so that turning in one direction causes the extraoral portion to retract into the body portion, causing the upper pad to apply greater pressure to the subnasal maxillary bone. Turning the adjustment wheel in the opposite direction causes the upper pad to apply decreased pressure. One complete revolution of the adjustment wheel in a first or second direction causes the extraoral portion to extend or retract by one millimetre in length.

Abstract: An optoelectronic device includes an Sb-based metamorphic photodetector grown over a silicon substrate via a buffer layer. The device includes a layered structure. The layered structure can include a silicon substrate, a buffer layer formed over the Si substrate, and an infrared photodetector formed over the buffer layer. In some embodiments, the buffer layer includes a composite buffer layer having sublayers. For example, the composite buffer layer includes a Ge-based sublayer formed over the substrate, a III-As sublayer grown over the Ge-based sublayer, and a III-Sb sublayer formed over the III-As sublayer.

Abstract: A method of monitoring the status of a body of a person during sleep, said method comprising:—retaining in or adjacent the mouth or nose of said person an electronic detector which detects indications of the state of said body,—wirelessly transmitting a first data stream representing said indications to a data receiving means,—transmitting said first data stream from said data receiving means to a data processing means,—processing said first data stream within said data processing means to produce a second data stream representing said indications, or conclusion drawn from said indications, and—displaying a visual representation of said indications or conclusions.

Abstract: An optoelectronic device includes an Sb-based metamorphic photodetector grown over a silicon substrate via a buffer layer. The device includes a layered structure. The layered structure can include a silicon substrate, a buffer layer formed over the Si substrate, and an infrared photodetector formed over the buffer layer. In some embodiments, the buffer layer includes a composite buffer layer having sublayers. For example, the composite buffer layer includes a Ge-based sublayer formed over the substrate, a III-As sublayer grown over the Ge-based sublayer, and a III-Sb sublayer formed over the III-As sublayer.

Abstract: A method, system and apparatus for providing notifications for different workspaces is provided. The device comprises a processor, a memory, and a notification device, the processor enabled to: manage a first workspace and a second workspace distinguished from each other by one or more of: data stored at the memory being associated with one or another of the first workspace and the second workspace; and accounts being associated with the one or the another of the first workspace and the second workspace; and, when a current workspace comprises the first workspace, control the notification device to present first notifications associated only with the first workspace, while second notifications associated with the second workspace are not presented.

Abstract: A method, system and apparatus for providing notifications for different workspaces is provided. The device comprises a processor, a memory, and a notification device, the processor enabled to: manage a first workspace and a second workspace distinguished from each other by one or more of: data stored at the memory being associated with one or another of the first workspace and the second workspace; and accounts being associated with the one or the another of the first workspace and the second workspace; and, when a current workspace comprises the first workspace, control the notification device to present first notifications associated only with the first workspace, while second notifications associated with the second workspace are not presented.

Abstract: Provided are systems and methods for a wind-powered electrical generation and fluid pumping device, including: a drive shaft; a generator comprising a rotor, wherein the generator may be coupled to the drive shaft by means of the rotor; and at least one vane pair, the vane pair comprising ribs and a structural twist, wherein the at least one vane pair is attached to the drive shaft by screws and square washers and further wherein vane extensions may be attached to the at least one vane pair with rivets. The vertical wind-powered electrical generation device is also described. It utilizes unique improvements of shaft coupling (to generator and rotor), the strengthening of complete Savonius rotor system, and ease of assembly. The vane pairs may be a segmented Savonius rotor. They may also create a helix pattern as they are installed.

Abstract: The disclosure is directed at the use of an energy generator system, containing a thermal electric generator (TEG), within a portable device, such as a mobile communication device, to recover waste heat within the device. This waste heat may then be recovered in the form of electricity that can then be use for various applications such as for powering the portable device or recharging a power source.

Abstract: A semiconductor device comprises an Si substrate 10 and a compound layer 11 of Si1-XGeX disposed on the substrate 10. X is varied from 0 to 0.2 away from the substrate 10 towards the upper surface of the compound layer 11, with the rate of change of X increasing through the layer. The increasing rate of change of X significantly improves the defectivity levels and the surface roughness at the surface of layer 11.

Abstract: Detection of the endpoint for removal of a target film overlying a stopping film by removing the target film with a process that selectively generates a chemical reaction product (for example ammonia when polishing a wafer with a nitride film in a slurry containing KOH) with one of the stopping film and the target film, converting the chemical reaction product to a separate product, producing excited molecules from the separate product, and monitoring the level of light emitted from the excited molecules as the target film is removed.

Abstract: Detection of the endpoint for removal of a target film overlying a stopping film by removing the target film with a process that selectively generates a chemical reaction product (for example, ammonia when polishing a wafer with a nitride film in a slurry containing KOH) with either the target or stopping film, and monitoring the level of chemical reaction product as the target film is removed. The reaction product is extracted as a gas from the slurry and monitored using a threshold photoionization mass spectrometer.

Abstract: A method and apparatus are described for detecting an endpoint of a film removal process in which a target film overlying a stopping film is removed. A chemical reaction product is generated from at least one of the target film and the stopping film; this chemical reaction product is converted to a separate product. The separate product is exposed to ionizing radiation. The ionization current generated by the radiation is monitored as the target film is removed. A change in the ionization current corresponds to a change in concentration of the separate product, thereby indicating the endpoint of the film removal process. In the particular case of removal of a silicon dioxide film overlying a silicon nitride film by chemical-mechanical polishing, the reaction product is ammonia extracted from the polishing slurry. The ammonia is converted to ammonium chloride by a reaction with hydrogen chloride vapor.

Abstract: Detection of the endpoint for removal of a target film overlying a stopping film by removing the target film with a process that selectively generates a chemical reaction product (for example ammonia when polishing a wafer with a nitride film in a slurry containing KOH) with either the target or stopping film, and monitoring the level of chemical reaction product by threshold photoionization mass spectroscopy as the target film is removed.

Abstract: A method for detecting the endpoint for removal of a target film overlying a stopping film by chemical-mechanical polishing using a slurry, by removing the target film with a polishing process that generates a chemical reaction product (for example ammonia when polishing a wafer with a nitride film in a slurry containing KOH) in the slurry, adding to the slurry a reagent which produces a characteristic result upon reacting with the chemical reaction product, and monitoring the slurry for the characteristic result as the target film is removed.

Abstract: Detection of the endpoint for removal of a target film overlying a stopping film by removing the target film with a process that selectively produces a gaseous chemical reaction product (for example ammonia when polishing a wafer with a nitride film in a slurry containing KOH) with one of the stopping film and the target film, mixing the gaseous chemical reaction product present with a separate gas to form solid particles, and monitoring the amount of the solid particles as the target film is removed. Also, detection of a substance at very low concentrations in a liquid, by extracting the substance present as a gas from the liquid, mixing the gas with another substance to form solid particles, and monitoring the amount of the solid particles to detect the substance.

Abstract: Detection of the endpoint for removal of a target film overlying a stopping film by removing the target film with a process that selectively generates a chemical reaction product (for example ammonia when polishing a wafer with a nitride film in a slurry containing KOH) with either the target or stopping film, and monitoring the level of chemical reaction product as the target film is removed. Also, detection of a substance at very low concentrations in a liquid, by extracting the substance present as a gas from the liquid and monitoring the gas to detect the substance.