Abstract: A method of detecting defects in a passivating layer includes the step of providing masks on any portions of a device intentionally exposed through the passivating layer, exposing the device to an etchant which penetrates the passivating layer through any defects therein and etches any interconnects underlying the defects, and testing to detect any portions of the interconnect which are etched.

Abstract: A method for forming vertically spaced apart regions on an integrated circuit substrate is disclosed. One or more recesses are formed in inactive regions of the substrate, while the remaining surface of the substrate remains substantially flat. When an epitaxial layer is deposited over the substrate, the recesses in the substrate causes the formation of corresponding recesses in the exposed surface of the epitaxial layer. Such recesses are useful as alignment marks in properly locating the masks used in defining active regions on the surface of the epitaxial layer.