Patents by Inventor P.L. Stephan Thamban

P.L. Stephan Thamban has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Electron beam exciter for use in chemical analysis in processing systems
    Patent number: 9997325
    Abstract: The present invention is directed to a gas line electron beam exciter, gas line electron beam excitation system and method for exciting a gas using an electron beam exciter. The electron beam exciter generally comprises a variable density electron source for generating a cloud of electrons in an electron chamber and a variable energy electron extractor for accelerating electrons from the electron chamber as an electron beam and into an effluent stream for fluorescing species in the effluent. The electron density of the electron beam is variably controlled by adjusting the excitation power applied to the variable density electron source. The electrons in the electron chamber reside at a reference electrical potential of the chamber, typically near ground electrical potential.
    Type: Grant
    Filed: July 16, 2009
    Date of Patent: June 12, 2018
    Assignees: Verity Instruments, Inc., Board of Regents, The University of Texas System
    Inventors: Jimmy W. Hosch, Matthew J. Goeckner, Mike Whelan, Andrew Weeks Kueny, Kenneth C. Harvey, P.L. Stephan Thamban
  • Electron beam exciter for use in chemical analysis in processing systems
    Publication number: 20100032587
    Abstract: The present invention is directed to a gas line electron beam exciter, gas line electron beam excitation system and method for exciting a gas using an electron beam exciter. The electron beam exciter generally comprises a variable density electron source for generating a cloud of electrons in an electron chamber and a variable energy electron extractor for accelerating electrons from the electron chamber as an electron beam and into an effluent stream for fluorescing species in the effluent. The electron density of the electron beam is variably controlled by adjusting the excitation power applied to the variable density electron source. The electrons in the electron chamber reside at a reference electrical potential of the chamber, typically near ground electrical potential.
    Type: Application
    Filed: July 16, 2009
    Publication date: February 11, 2010
    Inventors: Jimmy W. Hosch, Matthew J. Goeckner, Mike Whelan, Andrew Weeks Kueny, Kenneth C. Harvey, P.L. Stephan Thamban