Patents by Inventor Péter Bartus
Péter Bartus has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11994190Abstract: Linear drive with a gear housing extending along a longitudinal axis, in which a spindle is rotatably mounted with a worm wheel connected to it in a rotationally fixed manner, a spindle nut running on the spindle, which is adjustable on the spindle between a retracted position and an extended position and which acts on a lifting tube. The spindle nut is arranged in the retracted position guide tube and retracted in the region of a rear end of the guide tube, and thus the lifting tube is also retracted into the guide tube. The spindle nut is arranged at a front end of the guide tube in the extended position. An electric motor drives the screw, which extends along a transverse axis extending transversely to the longitudinal axis, wherein the electric motor is accommodated in a motor housing which is connected to the gear housing. Furthermore, a control system is arranged in a control housing.Type: GrantFiled: December 14, 2020Date of Patent: May 28, 2024Assignee: DEWERTOKIN KFTInventors: Péter Bartus, Zsolt Mojzes
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Patent number: 11994172Abstract: A linear drive having a transmission housing and an electric motor which is accommodated in the transmission housing and drives a shaft with a worm. The shaft meshes with a worm gear which is non-rotatably connectable to a clutch to a spindle holder non-rotatably connected to a spindle. The clutch is biased by a spring and is adjustable by a clutch actuation. The clutch actuation includes a slide element which bears against the clutch and which is arranged non-rotatably but axially displaceably. A rotary element which is axially fixed but rotatable about an axis of rotation engages the slide element at an outside that faces away from the clutch. Run-on bevels of complementary configuration are provided between the slide element and the rotary element. The rotary element is actuable by a pulling element, and the slide element is axially displaceably in relation to the rotary element.Type: GrantFiled: June 10, 2020Date of Patent: May 28, 2024Assignee: DEWERTOKIN KFTInventor: Péter Bartus
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Patent number: 8349238Abstract: An imprint template configured to imprint an imprintable medium by an imprint lithography process is disclosed, the imprint template having a pattern with a pattern density corresponding to a volume of imprintable medium used to substantially fill pattern features per unit area of a contact face of the imprint template, wherein adjacent regions of the pattern on the imprint template contact face, each of which will provide different functionality once imprinted onto a substrate, have substantially the same pattern density, have differences in pattern density which are minimized, or differences in pattern density which are maintained below a maximum.Type: GrantFiled: June 17, 2010Date of Patent: January 8, 2013Assignees: ASML Netherlands B.V., Koninklijke Philips Electronics N.V.Inventors: Peter Bartus Leonard Meijer, Aleksey Yurievich Kolesnychenko
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Publication number: 20110202132Abstract: A visual prosthesis implant (1) is provided which comprises an SIMD-based processor array (6) adapted for receiving image signals from an image sensor (5) and outputting processed signals, and a bio-compatible electrode implant (7) receiving the processed signals and adapted for coupling to neurons. Using the SIMD-based processor array (6) provides high performance at small power dissipation and small chip area such that a fully implantable is visual prosthesis is achieved.Type: ApplicationFiled: September 16, 2009Publication date: August 18, 2011Applicant: NXP B.V.Inventor: Peter Bartus Leonard Meijer
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Publication number: 20100251913Abstract: An imprint template configured to imprint an imprintable medium by an imprint lithography process is disclosed, the imprint template having a pattern with a pattern density corresponding to a volume of imprintable medium used to substantially fill pattern features per unit area of a contact face of the imprint template, wherein adjacent regions of the pattern on the imprint template contact face, each of which will provide different functionality once imprinted onto a substrate, have substantially the same pattern density, have differences in pattern density which are minimized, or differences in pattern density which are maintained below a maximum.Type: ApplicationFiled: June 17, 2010Publication date: October 7, 2010Applicants: ASML NETHERLANDS B.V., KONINKLIJKE PHILIPS ELECTRONICS N.V.Inventors: Peter Bartus Leonard Meijer, Aleksey Yurievich Kolesnychenko
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Patent number: 7762186Abstract: An imprint template configured to imprint an imprintable medium by an imprint lithography process is disclosed, the imprint template having a pattern with a pattern density corresponding to a volume of imprintable medium used to substantially fill pattern features per unit area of a contact face of the imprint template, wherein adjacent regions of the pattern on the imprint template contact face, each of which will provide different functionality once imprinted onto a substrate, have substantially the same pattern density, have differences in pattern density which are minimized, or differences in pattern density which are maintained below a maximum.Type: GrantFiled: April 19, 2005Date of Patent: July 27, 2010Assignees: ASML Netherlands B.V., Koninklijke Philips Electronics N.V.Inventors: Peter Bartus Leonard Meijer, Aleksey Yurievich Kolesnychenko
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Publication number: 20100052177Abstract: Method for manufacturing a crossbar circuit on a substrate (1), the crossbar circuit comprising a first grid of first wires (10) and a second grid of second wires (17), the first wires extending in a first direction, the second wires extending in a second direction, the first direction and the second direction being arranged relative to each other to form a single two-dimensional wire grid, each first wire being separated from each second wire by an intermediate layer (14) located at a location where the first and second wires overlap; the method comprising: depositing an unprintable layer (2) on the substrate, imprinting a two-dimensional grid mask (5) into the unprintable layer by a mould (3); directionally depositing a first material (8) in the first direction on the grid mask; and directionally depositing a second material (15) in the second direction on the grid mask, the grid mask acting as a shadow mask during the directional deposition of the first and second material.Type: ApplicationFiled: May 24, 2006Publication date: March 4, 2010Applicant: NXP B.V.Inventor: Peter Bartus Leonard Meijer
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Publication number: 20060230959Abstract: An imprint template configured to imprint an imprintable medium by an imprint lithography process is disclosed, the imprint template having a pattern with a pattern density corresponding to a volume of imprintable medium used to substantially fill pattern features per unit area of a contact face of the imprint template, wherein adjacent regions of the pattern on the imprint template contact face, each of which will provide different functionality once imprinted onto a substrate, have substantially the same pattern density, have differences in pattern density which are minimized, or differences in pattern density which are maintained below a maximum.Type: ApplicationFiled: April 19, 2005Publication date: October 19, 2006Applicants: ASML NETHERLANDS B.V., KONINKLIJKE PHILIPS ELECTRONICS N.V.Inventors: Peter Bartus Meijer, Aleksey Kolesnychenko
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Patent number: D956118Type: GrantFiled: May 14, 2020Date of Patent: June 28, 2022Assignee: DewertOkin KFTInventors: Christoph Porde, József Csákó, Péter Bartus