Patents by Inventor Pablo Bravo

Pablo Bravo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230270237
    Abstract: Bladders/containers designed to hold a meaningful amount of material (in any state: solid, liquid or gas) to conductively absorb heat from the human body. In addition, the material may be consumed by the user wearing the bladder/container, thus providing a source of hydration for the user. The bladders/containers would also enhance impact and/or ballistic protection of the user.
    Type: Application
    Filed: April 18, 2023
    Publication date: August 31, 2023
    Applicant: Qore Performance, Inc.
    Inventors: Justin B. LI, J.D. WILLCOX, Doug C. BURR, Pablo BRAVO
  • Patent number: 11653745
    Abstract: Bladders/containers designed to hold a meaningful amount of material (in any state: solid, liquid or gas) to conductively absorb heat from the human body. In addition, the material may be consumed by the user wearing the bladder/container, thus providing a source of hydration for the user. The bladders/containers would also enhance impact and/or ballistic protection of the user.
    Type: Grant
    Filed: February 10, 2017
    Date of Patent: May 23, 2023
    Assignee: QORE PERFORMANCE, INC.
    Inventors: Justin B. Li, J. D. Willcox, Doug C. Burr, Pablo Bravo
  • Publication number: 20170231371
    Abstract: Bladders/containers designed to hold a meaningful amount of material (in any state: solid, liquid or gas) to conductively absorb heat from the human body. In addition, the material may be consumed by the user wearing the bladder/container, thus providing a source of hydration for the user. The bladders/containers would also enhance impact and/or ballistic protection of the user.
    Type: Application
    Filed: February 10, 2017
    Publication date: August 17, 2017
    Applicant: Qore Performance, Inc.
    Inventors: Justin B. LI, J.D. WILLCOX, Doug C. BURR, Pablo BRAVO
  • Patent number: 9296622
    Abstract: Disclosed herein are indium-tin-oxide nanoparticles and a method for continuously producing precipitated indium-tin nanoparticles having a particle size range of substantially from about 10 nm to about 200 nm and a substantially consistent ratio of indium to tin in the resultant nanoparticles across the duration of the continuous process, based on the ratio of indium to tin in a seeding solution. The method comprises preparing intermediate indium and tin compounds of the general formula [M(OH)xCy], where M represents the indium or tin ionic component of indium or tin salts, C represents the cationic component of indium or tin salt(s), x is a number greater than 0 and y=[M*valance?x]/C* valance in the seeding solution. The intermediate compounds are continuously precipitated with a base solution in a reaction vessel initially having a solvent contained therein. The method also provides a means for controlling the shape of the resultant nanoparticles.
    Type: Grant
    Filed: November 7, 2012
    Date of Patent: March 29, 2016
    Assignee: HY-POWER COATINGS LIMITED
    Inventors: Hadi K Mahabadi, Juan-Pablo Bravo-Vasquez, Sinoj Abraham, Guibun Ma, Nathan Gerein
  • Publication number: 20140054521
    Abstract: Disclosed herein are indium-tin-oxide nanoparticles and a method for continuously producing precipitated indium-tin nanoparticles having a particle size range of substantially from about 10 nm to about 200 nm and a substantially consistent ratio of indium to tin in the resultant nanoparticles across the duration of the continuous process, based on the ratio of indium to tin in a seeding solution. The method comprises preparing intermediate indium and tin compounds of the general formula [M(OH)xCy], where M represents the indium or tin ionic component of indium or tin salts, C represents the cationic component of indium or tin salt(s), x is a number greater than 0 and y=[M*valance?x]/C* valance in the seeding solution. The intermediate compounds are continuously precipitated with a base solution in a reaction vessel initially having a solvent contained therein. The method also provides a means for controlling the shape of the resultant nanoparticles.
    Type: Application
    Filed: November 7, 2012
    Publication date: February 27, 2014
    Applicant: HY-POWER NANO INC.
    Inventors: Hadi K. Mahabadi, Juan-Pablo Bravo-Vasquez, Sinoj Abraham, Guibin Ma, Nathan Gerein
  • Publication number: 20070201189
    Abstract: An emergency power supply for an electrical device that provides power sufficient to operate the emergency flotation system for a predetermined period of time after a malfunction of a primary power source. The emergency power supply includes at least one capacitor and a control circuit that are disposed in a housing that is sealed to prevent ingress of liquids. The emergency power supply remains functional even when it is partially submerged.
    Type: Application
    Filed: February 24, 2006
    Publication date: August 30, 2007
    Inventors: Pablo Bravo, Clayton Haney, Sunny Huff, Luigi Ricci Moretti
  • Patent number: 6849305
    Abstract: The invention is directed to a photoresist-free method for depositing films composed of metals, such as copper or silica, or their oxides from metal complexes. More specifically, the method involves applying an amorphous film of a metal complex to a substrate. The metal complexes have a metal and a photo-degradable ligand. A preferred ligand is acac or alkyl-acac, expecially in combination with acetate ligands. These films, upon, for example, thermal, photochemical or electron beam irradiation may be converted to the metal or its oxides. By using either directed light or electron beams, this may lead to a patterned metal or metal oxide film in a single step. Low temperature baking may be used to remove residual organics from the deposited film. If silica is the metal, the deposited film has excellent smoothness and dielectric properties.
    Type: Grant
    Filed: October 4, 2002
    Date of Patent: February 1, 2005
    Assignee: EKC Technology, Inc.
    Inventors: Juan-Pablo Bravo-Vasquez, Ross H. Hill
  • Publication number: 20040191423
    Abstract: A photoresist-free method for depositing films composed of metal and metal oxide from metal complexes. More specifically, the method involves the deposition of silver and silver oxide films by applying the amorphous film of a silver complex to a substrate. The silver complexes have the formula AgaLc, wherein L is preferentially a ligand selected from the group consisting of acac, carboxylato, alkoxy, azide, carbonyl, nitrato, amine, halide, nitro, and mixtures thereof, and a and c are greater than one. These films, upon, for example, thermal, photochemical or electron beam irradiation may be converted to the metal or its oxides. By using either directed light or electron beams, this may lead to a patterned metal or metal oxide film in a single step.
    Type: Application
    Filed: November 18, 2003
    Publication date: September 30, 2004
    Inventors: Hai Xiong Ruan, Juan Pablo Bravo-Vasquez, Ross Henry Hill
  • Patent number: 6777036
    Abstract: A photoresist-free method for making patterned films of metal oxides, metals, or other metal containing compounds is described. The method involves applying a thin film coating of a metal complex, resulting in the formation of a liquid crystal film. This film can be photolyzed resulting in a chemical reaction which deposits a metal or metal oxide film. The metal complex used is photoreactive and undergoes a chemical reaction in the presence of light of a suitable wavelength. The end product of the reactions depends upon the atmosphere in which the reactions take place. Metal oxide films may be made in air. Patterned films may be made by exposing only selected portions of the film to light. Patterns of two or more materials may be laid down from the same film by exposing different parts of the film to light in different atmospheres.
    Type: Grant
    Filed: June 8, 2001
    Date of Patent: August 17, 2004
    Assignee: Simon Fraser University
    Inventors: Juan Pablo Bravo Vasquez, Ross H. Hill
  • Publication number: 20030059544
    Abstract: The invention is directed to a photoresist-free method for depositing films composed of metals, such as copper or silica, or their oxides from metal complexes. More specifically, the method involves applying an amorphous film of a metal complex to a substrate. The metal complexes have a metal and a photo-degradable ligand. A preferred ligand is acac or alkyl-acac, expecially in combination with acetate ligands. These films, upon, for example, thermal, photochemical or electron beam irradiation may be converted to the metal or its oxides. By using either directed light or electron beams, this may lead to a patterned metal or metal oxide film in a single step. Low temperature baking may be used to remove residual organics from the deposited film. If silica is the metal, the deposited film has excellent smoothness and dielectric properties.
    Type: Application
    Filed: October 4, 2002
    Publication date: March 27, 2003
    Inventors: Juan-Pablo Bravo-Vasquez, Ross H. Hill
  • Publication number: 20020197415
    Abstract: A photoresist-free method for making patterned films of metal oxides, metals, or other metal containing compounds is described. The method involves applying a thin film coating of a metal complex, resulting in the formation of a liquid crystal film. This film can be photolyzed resulting in a chemical reaction which deposits a metal or metal oxide film.. The metal complex used is photoreactive and undergoes a chemical reaction in the presence of light of a suitable wavelength. The end product of the reactions depends upon the atmosphere in which the reactions take place. Metal oxide films may be made in air. Patterned films may be made by exposing only selected portions of the film to light. Patterns of two or more materials may be laid down from the same film by exposing different parts of the film to light in different atmospheres.
    Type: Application
    Filed: June 8, 2001
    Publication date: December 26, 2002
    Inventors: Juan Pablo Bravo Vasquez, Ross H. Hill
  • Patent number: 6458431
    Abstract: A method for depositing nanoparticles in a thin film through the dispersion of such nanoparticles in a precursor solution which is deposited on a substrate and converted into a metal or metal oxide film. The resulting metal or metal oxide film will contain embedded nanoparticles. Such films can be used in a variety of applications such as diffusion barriers, electrodes for capacitors, conductors, resistors, inductors, dielectrics, or magnetic materials. The nanoparticle material may be selected by one skilled in the art based on the particular application.
    Type: Grant
    Filed: July 30, 2001
    Date of Patent: October 1, 2002
    Assignee: EKC Technology, Inc.
    Inventors: Ross H. Hill, Juan Pablo Bravo-Vasquez
  • Publication number: 20020018861
    Abstract: A method for depositing nanoparticles in a thin film through the dispersion of such nanoparticles in a precursor solution which is deposited on a substrate and converted into a metal or metal oxide film. The resulting metal or metal oxide film will contain embedded nanoparticles. Such films can be used in a variety of applications such as diffusion barriers, electrodes for capacitors, conductors, resistors, inductors, dielectrics, or magnetic materials. The nanoparticle material may be selected by one skilled in the art based on the particular application.
    Type: Application
    Filed: July 30, 2001
    Publication date: February 14, 2002
    Inventors: Ross H. Hill, Juan Pablo Bravo-Vasquez