Abstract: The present disclosure relates to methods for forming an antimicrobial nanostructure and antimicrobial articles. The methods may include: providing a master template of a layout of the antimicrobial nanostructure on a silicon substrate, depositing a silicon nitride layer on a top surface of the silicon substrate, forming a patterned lithographic resist mask layer on a top surface of the silicon nitride layer, generating certain silicon pillars according to the patterned lithographic resist mask using a resist and reactive ion etching, forming certain lateral silicon nanospikes on the silicon pillars by performing metal assisted chemical etching (MacEtch), and removing the silicon nitride layer and bonding a top cover glass on the silicon pillars to form the antimicrobial nanostructure having lateral silicon nanospikes.

Abstract: The present disclosure relates to methods for forming an antimicrobial nanostructure and antimicrobial articles. The methods may include: providing a master template of a layout of the antimicrobial nanostructure on a silicon substrate, depositing a silicon nitride layer on a top surface of the silicon substrate, forming a patterned lithographic resist mask layer on a top surface of the silicon nitride layer, generating certain silicon pillars according to the patterned lithographic resist mask using a resist and reactive ion etching, forming certain lateral silicon nanospikes on the silicon pillars by performing metal assisted chemical etching (MacEtch), and removing the silicon nitride layer and bonding a top cover glass on the silicon pillars to form the antimicrobial nanostructure having lateral silicon nanospikes.

Abstract: The present disclosure relates to methods for forming an antimicrobial nanostructure and antimicrobial articles. The methods may include: providing a master template of a layout of the antimicrobial nanostructure on a silicon substrate, depositing a silicon nitride layer on a top surface of the silicon substrate, forming a patterned lithographic resist mask layer on a top surface of the silicon nitride layer, generating certain silicon pillars according to the patterned lithographic resist mask using a resist and reactive ion etching, forming certain lateral silicon nanospikes on the silicon pillars by performing metal assisted chemical etching (MacEtch), and removing the silicon nitride layer and bonding a top cover glass on the silicon pillars to form the antimicrobial nanostructure having lateral silicon nanospikes.

Abstract: Various embodiments provide a customized cosmetics recommendation for a specific user. In one embodiment a method comprises capturing an image that includes the face of the specific user, producing a set of hyperspectral images from the image, analyzing the hyperspectral images to determine a set of spectral components of the face, and providing a recommendation for one or more cosmetics customized for the specific user based on the set of spectral components and cosmetician expert judgement. The image may be captured using a hyperspectral imaging camera. The set of spectral components is compared to a plurality of previous sets of spectral components to find a match and one or more cosmetics mapped to the match are provided as the recommendation. Additionally, a set of conditional options may be received and one or more cosmetics mapped to the set of conditional options and the set of spectral components are provided as the recommendation.

Abstract: A method of determining enzyme activity and identifying and classifying cellular targets, enzymatic pathways, and enzymatic agents involved in regulating metabolism in order to treat pathophysiological disorders. Monitoring enzyme activity is performed via a label-free bio cellular assay or fluorescence imaging. The identified and classified agents are used, together with a therapeutic agent, in the treatment of various metabolism-related diseases.

Abstract: A method of implementing verification of a complex workflow includes partitioning the workflow into modules, wherein the modules have inputs, processing steps and outputs; selecting, from the workflow, one of the partitioned modules for independent verification by challenge thereof; running, with a computing device, a challenge of the selected module, the challenge comprising comparing reference outputs to outputs of the selected module, wherein reference inputs are received by the selected module and the reference outputs are generated using the reference inputs and one of an ideal performing module or a well-established module; determining whether outputs of the selected module meet verification criteria with respect to the reference outputs, and based on the determining, implementing one of: declaring the selected module verified; subdividing the selected module into smaller modules and repeating the challenge on the smaller modules; or declaring the selected module not verified.

Abstract: A method of implementing verification of a complex workflow includes partitioning the workflow into modules, wherein the modules have inputs, processing steps and outputs; selecting, from the workflow, one of the partitioned modules for independent verification by challenge thereof; running, with a computing device, a challenge of the selected module, the challenge comprising comparing reference outputs to outputs of the selected module, wherein reference inputs are received by the selected module and the reference outputs are generated using the reference inputs and one of an ideal performing module or a well-established module; determining whether outputs of the selected module meet verification criteria with respect to the reference outputs, and based on the determining, implementing one of: declaring the selected module verified; subdividing the selected module into smaller modules and repeating the challenge on the smaller modules; or declaring the selected module not verified.