Patents by Inventor Padmanaban Krishnaraj

Padmanaban Krishnaraj has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Cleaning residues from surfaces in a chamber by sputtering sacrificial substrates
    Patent number: 6814814
    Abstract: In a method of cleaning process residues formed on surfaces in a substrate processing chamber, a sacrificial substrate comprising a sacrificial material is placed in the chamber, a sputtering gas is introduced into the chamber, and the sputtering gas is energized to sputter the sacrificial material from the substrate. The sputtered sacrificial material reacts with residues on the chamber surfaces to clean them. In one version, the sacrificial substrate comprises a silicon-containing material that when sputtered deposits silicon on the chamber walls that reacts with and cleans fluorine-containing species that are left behind by a chamber cleaning process.
    Type: Grant
    Filed: March 29, 2002
    Date of Patent: November 9, 2004
    Assignee: Applied Materials, Inc.
    Inventors: Alan W. Collins, Feng Gao, Tetsuya Ishikawa, Padmanaban Krishnaraj, Yaxin Wang
  • Cleaning residues from surfaces in a chamber by sputtering sacrificial substrates
    Publication number: 20030183243
    Abstract: In a method of cleaning process residues formed on surfaces in a substrate processing chamber, a sacrificial substrate comprising a sacrificial material is placed in the chamber, a sputtering gas is introduced into the chamber, and the sputtering gas is energized to sputter the sacrificial material from the substrate. The sputtered sacrificial material reacts with residues on the chamber surfaces to clean them. In one version, the sacrificial substrate comprises a silicon-containing material that when sputtered deposits silicon on the chamber walls that reacts with and cleans fluorine-containing species that are left behind by a chamber cleaning process.
    Type: Application
    Filed: March 29, 2002
    Publication date: October 2, 2003
    Applicant: Applied Materials, Inc.
    Inventors: Alan W. Collins, Feng Gao, Tetsuya Ishikawa, Padmanaban Krishnaraj, Yaxin Wang
  • Directing a flow of gas in a substrate processing chamber
    Patent number: 6450117
    Abstract: A substrate processing chamber 30 comprising a first gas distributor 65 adapted to provide a process gas into the chamber 30 to process the substrate 25, a second gas distributor 215 adapted to provide a cleaning gas into the chamber 30 to clean the chamber, and an exhaust 90 to exhaust the process gas or cleaning gas from the chamber 30.
    Type: Grant
    Filed: August 7, 2000
    Date of Patent: September 17, 2002
    Assignee: Applied Materials, Inc.
    Inventors: Laxman Murugesh, Padmanaban Krishnaraj, Michael Cox, Canfeng Lai, Narendra Dubey, Tom K. Cho, Sudhir Ram Gondhalekar, Lily L. Pang