Patents by Inventor Palaiyur Kalyanaraman

Palaiyur Kalyanaraman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoresist compositions based on hydroxystyrene copolymers
    Patent number: 4869994
    Abstract: Negative photoresist compositions are made from copolymers of 4-hydroxystyrene and dialkyl muconates, alkyl sorbates, alkadiene monomers or allyl esters of ethylenically unsaturated acids plus a photosensitizer.Such compositions are useful in photolithographic and photomasking operations in fabricating microelectronic devices, printed circuits, semiconductors, printing plates, dies and the like.
    Type: Grant
    Filed: January 25, 1988
    Date of Patent: September 26, 1989
    Assignee: Hoechst Celanese Corp.
    Inventors: Balaram Gupta, Palaiyur Kalyanaraman
  • Photoresist compositions based on acetoxystyrene copolymers
    Patent number: 4824758
    Abstract: Negative photoresist compositions are made from copolymers of 4-acetoxystyrene and dialkyl muconates, alkyl sorbates, alkadiene monomers or allyl esters of ethylenically unsaturated acids plus a photosensitizer.Such compositions are useful in photolithographic and photomasking operations in fabricating microelectronic devices, printed circuits, semiconductors, printing plates, dies and the like.
    Type: Grant
    Filed: January 25, 1988
    Date of Patent: April 25, 1989
    Assignee: Hoechst Celanese Corp
    Inventors: Balaram Gupta, Palaiyur Kalyanaraman