Abstract: Improved nozzle design that discharges fluid streams through a series of nozzle orifices distributed along a length of the nozzle. The present invention may be incorporated into a wide range of microelectronic device manufacturing processes and equipment types for which an array of process streams are desired for treating microelectronic workpieces. The present invention is particularly useful to cryogenically clean microelectronic workpieces.

Abstract: A nozzle having a series of orifices along a longitudinal length of the nozzle for processing a substrate and which is rotatably adjustable. By the nozzle design of the present invention, liquid is properly distributed along the longitudinal length of the nozzle independently of the angle of the aerosol spray. This allows for the generation of a uniform aerosol stream that is independent of spray angle. The nozzle design of the present invention improves the uniform distribution of liquid within the nozzle, which in addition to providing a more uniform liquid pooling, also substantially eliminates temporal non-uniformities across the nozzle length. Moreover, the present invention is also directed to a nozzle that is translatable in the direction toward or away from the substrate to be processed or parallel to the substrate surface.