Patents by Inventor Pamela E. Jones

Pamela E. Jones has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mid and deep-UV antireflection coatings and methods for use thereof
    Patent number: 5554485
    Abstract: An antireflective coating composition for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.
    Type: Grant
    Filed: September 29, 1994
    Date of Patent: September 10, 1996
    Assignee: International Business Machines Corporation
    Inventors: Robert R. Dichiara, James T. Fahey, Pamela E. Jones, Christopher F. Lyons, Wayne M. Moreau, Ratnam Sooriyakumaran, Gary T. Spinillo, Kevin M. Welsh, Robert L. Wood
  • Mid and deep-UV antireflection coatings and methods for use thereof
    Patent number: 5401614
    Abstract: An antireflective coating composition for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.
    Type: Grant
    Filed: February 16, 1993
    Date of Patent: March 28, 1995
    Assignee: International Business Machines Corporation
    Inventors: Robert R. Dichiara, James T. Fahey, Pamela E. Jones, Christopher F. Lyons, Wayne M. Moreau, Ratnam Sooriyakumaran, Gary T. Spinillo, Kevin M. Welsh, Robert L. Wood
  • Radiation-sensitive resist composition and process for its use
    Patent number: 5372912
    Abstract: The present invention relates to a radiation-sensitive resist composition and the process for its use in the manufacture of integrated circuits. The composition comprises a radiation-sensitive acid generator, a binder soluble in aqueous base and an acrylate copolymer having acid labile pendant groups.
    Type: Grant
    Filed: December 31, 1992
    Date of Patent: December 13, 1994
    Assignee: International Business Machines Corporation
    Inventors: Robert D. Allen, Jr. Conley, William D. Hinsberg, III, Pamela E. Jones, Kevin M. Welsh