Patents by Inventor Pamela Peardon Denise Ward
Pamela Peardon Denise Ward has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6769288Abstract: The present invention relates to a method and assembly for leak detection in a plasma system. The invention can accomplish not only leak detection, but also leak location while maintaining a plasma within the plasma system. Leak detection for the invention is achieved by obtaining spectral data of the plasma at one or more times while maintaining the plasma within the plasma system and comparing the same to predetermined spectral data of air. Upon a determination that air is present within the plasma system, one or more external surfaces of the plasma system are exposed to a test gas and the spectral data of the plasma is analyzed after each exposure to determine if the test gas is present in the system. If the test gas is present, a determination can be made that the particular external surface to which the test gas was applied is a leak location.Type: GrantFiled: November 1, 2002Date of Patent: August 3, 2004Assignee: Peak Sensor Systems LLCInventors: Pamela Peardon Denise Ward, Joel O'Don Stevenson, Michael Lane Smith, Jr.
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Publication number: 20040083797Abstract: The present invention relates to a method and assembly for leak detection in a plasma system. The invention can accomplish not only leak detection, but also leak location while maintaining a plasma within the plasma system. Leak detection for the invention is achieved by obtaining spectral data of the plasma at one or more times while maintaining the plasma within the plasma system and comparing the same to predetermined spectral data of air. Upon a determination that air is present within the plasma system, one or more external surfaces of the plasma system are exposed to a test gas and the spectral data of the plasma is analyzed after each exposure to determine if the test gas is present in the system. If the test gas is present, a determination can be made that the particular external surface to which the test gas was applied is a leak location.Type: ApplicationFiled: November 1, 2002Publication date: May 6, 2004Inventors: Pamela Peardon Denise Ward, Joel O?apos;Don Stevenson, Michael Lane Smith
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Publication number: 20030136663Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discernible portion thereof (e.g., a plasma step of a multiple step plasma recipe). A final aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system.Type: ApplicationFiled: June 6, 2002Publication date: July 24, 2003Inventors: Michael Lane Smith, Joel O?apos;Don Stevenson, Pamela Peardon Denise Ward
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Publication number: 20030029720Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discernible portion thereof (e.g., a plasma step of a multiple step plasma recipe). A final aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system.Type: ApplicationFiled: June 5, 2002Publication date: February 13, 2003Inventors: Michael Lane Smith, Joel O?apos;Don Stevenson, Pamela Peardon Denise Ward
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Publication number: 20030024810Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discernible portion thereof (e.g., a plasma step of a multiple step plasma recipe). A final aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system.Type: ApplicationFiled: June 6, 2002Publication date: February 6, 2003Inventors: Michael Lane Smith, Joel O?apos;Don Stevenson, Pamela Peardon Denise Ward
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Patent number: 6419801Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber.Type: GrantFiled: April 23, 1998Date of Patent: July 16, 2002Assignee: Sandia CorporationInventors: Michael Lane Smith, Jr., Joel O'Don Stevenson, Pamela Peardon Denise Ward
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Patent number: 6275740Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber.Type: GrantFiled: April 23, 1998Date of Patent: August 14, 2001Assignee: Sandia CorporationInventors: Michael Lane Smith, Jr., Joel O'Don Stevenson, Pamela Peardon Denise Ward
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Patent number: 6269278Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber.Type: GrantFiled: April 23, 1998Date of Patent: July 31, 2001Assignee: Sandia CorporationInventors: Michael Lane Smith, Jr., Joel O'Don Stevenson, Pamela Peardon Denise Ward
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Patent number: 6261470Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber.Type: GrantFiled: April 23, 1998Date of Patent: July 17, 2001Assignee: Sandia CorporationInventors: Michael Lane Smith, Jr., Joel O'Don Stevenson, Pamela Peardon Denise Ward
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Patent number: 6254717Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber.Type: GrantFiled: April 23, 1998Date of Patent: July 3, 2001Assignee: Sandia CorporationInventors: Michael Lane Smith, Jr., Joel O'Don Stevenson, Pamela Peardon Denise Ward
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Patent number: 6246473Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber.Type: GrantFiled: April 23, 1998Date of Patent: June 12, 2001Assignee: Sandia CorporationInventors: Michael Lane Smith, Jr., Joel O'Don Stevenson, Pamela Peardon Denise Ward
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Patent number: 6223755Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber.Type: GrantFiled: April 23, 1998Date of Patent: May 1, 2001Assignee: Sandia CorporationInventors: Michael Lane Smith, Jr., Joel O'Don Stevenson, Pamela Peardon Denise Ward
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Patent number: 6221679Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber.Type: GrantFiled: April 23, 1998Date of Patent: April 24, 2001Assignee: Sandia CorporationInventors: Michael Lane Smith, Jr., Joel O'Don Stevenson, Pamela Peardon Denise Ward
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Patent number: 6192826Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber.Type: GrantFiled: April 23, 1998Date of Patent: February 27, 2001Assignee: Sandia CorporationInventors: Michael Lane Smith, Jr., Joel O'Don Stevenson, Pamela Peardon Denise Ward
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Patent number: 6169933Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber.Type: GrantFiled: April 23, 1998Date of Patent: January 2, 2001Assignee: Sandia CorporationInventors: Michael Lane Smith, Jr., Joel O'Don Stevenson, Pamela Peardon Denise Ward
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Patent number: 6165312Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber.Type: GrantFiled: April 23, 1998Date of Patent: December 26, 2000Assignee: Sandia CorporationInventors: Michael Lane Smith, Jr., Joel O'Don Stevenson, Pamela Peardon Denise Ward
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Patent number: 6157447Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber.Type: GrantFiled: April 23, 1998Date of Patent: December 5, 2000Assignee: Sandia CorporationInventors: Michael Lane Smith, Jr., Joel O'Don Stevenson, Pamela Peardon Denise Ward
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Patent number: 6132577Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber.Type: GrantFiled: April 23, 1998Date of Patent: October 17, 2000Assignee: Sandia CorporationInventors: Michael Lane Smith, Jr., Joel O'Don Stevenson, Pamela Peardon Denise Ward
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Patent number: 6134005Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber.Type: GrantFiled: April 23, 1998Date of Patent: October 17, 2000Assignee: Sandia CorporationInventors: Michael Lane Smith, Jr., Joel O'Don Stevenson, Pamela Peardon Denise Ward
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Patent number: 6123983Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber.Type: GrantFiled: April 23, 1998Date of Patent: September 26, 2000Assignee: Sandia CorporationInventors: Michael Lane Smith, Jr., Joel O'Don Stevenson, Pamela Peardon Denise Ward