Patents by Inventor Pamela Shiell Trammel

Pamela Shiell Trammel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods to reduce polarization dependent loss in planar lightwave circuits
    Patent number: 7577324
    Abstract: Polarization dependent loss may be reduced by providing at least one dummy waveguide or at least one dummy metal structure. Polarization dependent loss may also be reduced by imposing a mechanical force on the OIC to exert mechanical stress thereby changing at least one of the birefringence and the optical axes of at least one waveguide. And polarization dependent loss may be reduced by forming a metal heater using a first set of metal deposition parameters; forming a conductive metal structure contacting the metal heater using a second set of metal deposition parameters; and selecting the first set of metal deposition parameters and the second set of metal deposition parameters to reduce stress.
    Type: Grant
    Filed: July 29, 2008
    Date of Patent: August 18, 2009
    Assignee: NeoPhotonics Corporation
    Inventors: Alice Liu, Pamela Shiell Trammel
  • METHODS TO REDUCE POLARIZATION DEPENDENT LOSS IN PLANAR LIGHTWAVE CIRCUITS
    Publication number: 20080279497
    Abstract: Polarization dependent loss may be reduced by providing at least one dummy waveguide or at least one dummy metal structure. Polarization dependent loss may also be reduced by imposing a mechanical force on the OIC to exert mechanical stress thereby changing at least one of the birefringence and the optical axes of at least one waveguide. And polarization dependent loss may be reduced by forming a metal heater using a first set of metal deposition parameters; forming a conductive metal structure contacting the metal heater using a second set of metal deposition parameters; and selecting the first set of metal deposition parameters and the second set of metal deposition parameters to reduce stress.
    Type: Application
    Filed: July 29, 2008
    Publication date: November 13, 2008
    Applicant: LIGHTWAVE MICROSYSTEMS CORPORATION
    Inventors: Alice Liu, Pamela Shiell Trammel
  • Methods to reduce polarization dependent loss in planar lightwave circuits
    Patent number: 7421156
    Abstract: Polarization dependent loss may be reduced by providing at least one dummy waveguide or at least one dummy metal structure. Polarization dependent loss may also be reduced by imposing a mechanical force on the OIC to exert mechanical stress thereby changing at least one of the birefringence and the optical axes of at least one waveguide. And polarization dependent loss may be reduced by forming a metal heater using a first set of metal deposition parameters; forming a conductive metal structure contacting the metal heater using a second set of metal deposition parameters; and selecting the first set of metal deposition parameters and the second set of metal deposition parameters to reduce stress.
    Type: Grant
    Filed: February 9, 2006
    Date of Patent: September 2, 2008
    Assignee: Lightwave Microsystems Corporation
    Inventors: Alice Liu, Pamela Shiell Trammel