Patents by Inventor Paneendra Prakash Bhat

Paneendra Prakash Bhat has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Systems and methods for pedestal configuration
    Patent number: 10672642
    Abstract: Exemplary apparatuses for centering and/or leveling a pedestal of a processing chamber may include a mounting block having a central axis, a set of first gauges mounted on the mounting block, and a set of second gauges mounted on the mounting block. The set of second gauges may be mounted substantially perpendicular to the set of first gauges. The plurality of first gauges may be configured to obtain measurements indicative of a degree of parallelism between a gas distribution plate of the processing chamber and the pedestal. The plurality of second gauges may be configured to obtain measurements indicative of a degree of axial alignment of a ring member of the processing chamber and the pedestal. The exemplary apparatuses may be used for centering and/or leveling the pedestal under vacuum.
    Type: Grant
    Filed: July 30, 2018
    Date of Patent: June 2, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Paneendra Prakash Bhat, Mehmet Samir, Nikolai Kalnin
  • SYSTEMS AND METHODS FOR PEDESTAL CONFIGURATION
    Publication number: 20200035540
    Abstract: Exemplary apparatuses for centering and/or leveling a pedestal of a processing chamber may include a mounting block having a central axis, a set of first gauges mounted on the mounting block, and a set of second gauges mounted on the mounting block. The set of second gauges may be mounted substantially perpendicular to the set of first gauges. The plurality of first gauges may be configured to obtain measurements indicative of a degree of parallelism between a gas distribution plate of the processing chamber and the pedestal. The plurality of second gauges may be configured to obtain measurements indicative of a degree of axial alignment of a ring member of the processing chamber and the pedestal. The exemplary apparatuses may be used for centering and/or leveling the pedestal under vacuum.
    Type: Application
    Filed: July 30, 2018
    Publication date: January 30, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Paneendra Prakash Bhat, Mehmet Samir, Nikolai Kalnin