Abstract: The present invention is directed to a template that features a control surface extending from a periphery of a mold toward a recessed surface of the template forming an oblique angle between a portion of the control surface disposed proximate to the periphery.

Abstract: The present invention is directed towards a method and a system to create and maintain a desired environment in the vicinity of a nano-imprint lithography template by creation of a partial vacuum using channels or holes in the template holding the nano-imprint mold.

Abstract: The present invention is directed to a body having a first area and a second area separated by a recess. The recess is dimensioned to reduce, if not prevent, a liquid moving along a surface of the body from traveling between the first and second areas. One or more alignment marks may be positioned within one of the first and second areas. In this manner, the recess functions as a moat by reducing, if not preventing, a quantity of the liquid from being in superimposition with the alignment marks.

Abstract: A system for controlling a volume of liquid on a mold that features a body defining a volume with an aperture formed into the body and positioned proximate to the mold. A pump system is in fluid communication with the body, and the aperture and the pump system are established to create a stream of fluid moving between the mold and the volume. In this manner a quantity of fluid is removed while retained upon the mold is a desired portion of the fluid to undertake imprint lithographic processes.

Abstract: The present invention is directed toward a system for introducing a flow of a fluid between a mold, disposed on a template, and a substrate, the system including, a fluid supply system; and a chuck body having a baffle and first and second apertures, the first and second apertures disposed between the baffle and the template, with the first and second apertures in fluid communication with the fluid supply system to produce a turbulent flow of the fluid between the mold and said substrate.

Abstract: The present invention is directed toward a method for reducing pattern distortions in imprinting layers by reducing gas pockets present in a layer of viscous liquid deposited on a substrate. To that end, the method includes varying a transport of the gases disposed proximate to the viscous liquid. Specifically, the atmosphere proximate to the substrate wherein a pattern is to be recorded is saturated with gases that are either highly soluble, highly diffusive, or both with respect to the viscous liquid being deposited. Additionally, or in lieu of saturating the atmosphere, the pressure of the atmosphere may be reduced.