Patents by Inventor Pankaj Raval

Pankaj Raval has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and Method to Align and Measure Alignment Patterns on Multiple Layers
    Publication number: 20080198363
    Abstract: A system and method are used to increase alignment accuracy of feature patterns through detection of alignment patterns on both a surface layer and at least one below surface layers of an object. A first frequency of light, such as visible light, is used to detect alignment patterns on the surface layer and a second frequency of light, such as infrared light, is used to detect patterns one layer below the surface. For example, reflected light of a first frequency and transmitted light of a second frequency are co-focused onto detector after impinging on respective alignment patterns. The co-focused light is then used to determine proper alignment of the object for subsequent pattern features. This substantially increases accuracy of alignment of pattern features between layers, as compared to conventional systems.
    Type: Application
    Filed: April 24, 2008
    Publication date: August 21, 2008
    Applicant: ASML Holding N.V.
    Inventors: Pankaj Raval, Walter H. Augustyn, Lev Ryzhikov
  • System and method using visible and infrared light to align and measure alignment patterns on multiple layers
    Patent number: 7365848
    Abstract: A system and method are used to increase alignment accuracy of feature patterns through detection of alignment patterns on both a surface layer and at least one below surface layers of an object. Visible light is used to detect alignment patterns on the surface layer and infrared light is used to detect patterns one layers below the surface. For example, reflected visible light and transmitted infrared light are co-focused onto detector after impinging on respective alignment patterns. The co-focused light is then used to determine proper alignment of the object for subsequent pattern features. This substantially increases accuracy of alignment of pattern features between layers, as compared to conventional systems.
    Type: Grant
    Filed: November 15, 2005
    Date of Patent: April 29, 2008
    Assignee: ASML Holding N.V.
    Inventors: Pankaj Raval, Dolores Augustyn, legal representative, Lev Ryzhikov, Walter H. Augustyn
  • System and method using visible and infrared light to align and measure alignment patterns on multiple layers
    Publication number: 20060115956
    Abstract: A system and method are used to increase alignment accuracy of feature patterns through detection of alignment patterns on both a surface layer and at least one below surface layers of an object. Visible light is used to detect alignment patterns on the surface layer and infrared light is used to detect patterns one layers below the surface. For example, reflected visible light and transmitted infrared light are co-focused onto detector after impinging on respective alignment patterns. The co-focused light is then used to determine proper alignment of the object for subsequent pattern features. This substantially increases accuracy of alignment of pattern features between layers, as compared to conventional systems.
    Type: Application
    Filed: November 15, 2005
    Publication date: June 1, 2006
    Applicant: ASML Holding N.V.
    Inventors: Pankaj Raval, Walter Augustyn