Abstract: An optical device has an E-mode polarizer. The optical device has an E-mode polarizer, a ¼ wave phase retardation plate, and a cholesteric reflective polarizer. The E-mode polarizer is a linear dichroic polarizer and enables extraordinary light to pass. The ¼ wave phase retardation plate is sandwiched between the E-mode polarizer and the cholesteric reflective polarizer.

Abstract: An optical device has an E-mode polarizer. The optical device has an E-mode polarizer, a ¼ wave phase retardation plate, and a cholesteric reflective polarizer. The E-mode polarizer is a linear dichroic polarizer and enables extraordinary light to pass. The ¼ wave phase retardation plate is sandwiched between the E-mode polarizer and the cholesteric reflective polarizer.

Abstract: To form a brightness enhancement film of cholesteric liquid crystal, a photopolymerizable liquid crystal is first formed on a first substrate. A second substrate then is formed on the liquid crystal substance to form a sandwich structure. The sandwich structure is subsequently submitted to a lamination process that generates shear stress thereon. Finally, an energetic irradiation including UV irradiation is performed to solidify the layer of liquid crystal into a liquid crystal polymer film. The second substrate then is selectively removed. The above steps are repeated until a desired reflected wavelength range of the liquid crystal film is obtained.

Abstract: A method for making broadband cholesteric liquid crystals with improved bandwidth. The method includes the main steps of: (a) preparing a polymerization mixture containing first and second chiral liquid crystals, wherein the first chiral liquid crystal possesses a cholesteric liquid crystal phase and the second chiral liquid crystal possesses a helix-inversion characteristic, and at least one of the first or second chiral liquid crystals contains a polymerizable functional group; and (b) subjecting the polymerization mixture to a polymerization reaction, wherein the polymerization reaction is conducted such that the first chiral liquid crystal will go through a helix-inversion phenomenon. In a preferred embodiment, the second chiral liquid crystal has a temperature-dependent helicity which exhibits a helix inversion characteristic at a helix inversion temperature.

Abstract: To form a brightness enhancement film of cholesteric liquid crystal, a photopolymerizable liquid crystal is first formed on a first substrate. A second substrate then is formed on the liquid crystal substance to form a sandwich structure. The sandwich structure is subsequently submitted to a lamination process that generates shear stress thereon. Finally, an energetic irradiation including UV irradiation is performed to solidify the layer of liquid crystal into a liquid crystal polymer film. The second substrate then is selectively removed. The above steps are repeated until a desired reflected wavelength range of the liquid crystal film is obtained.

Abstract: A method for making broadband cholesteric liquid crystals with improved bandwidth. The method includes the main steps of: (a) preparing a polymerization mixture containing first and second chiral liquid crystals, wherein the first chiral liquid crystal possesses a cholesteric liquid crystal phase and the second chiral liquid crystal possesses a helix-inversion characteristic, and at least one of the first or second chiral liquid crystals contains a polymerizable functional group; and (b) subjecting the polymerization mixture to a polymerization reaction, wherein the polymerization reaction is conducted such that the first chiral liquid crystal will go through a helix-inversion phenomenon. In a preferred embodiment, the second chiral liquid crystal has a temperature-dependent helicity which exhibits a helix inversion characteristic at a helix inversion temperature.

Abstract: A reflective-type diffraction grating structure for use in color display devices such as liquid crystal displays (LCDs). It contains: (1) a plurality of micro-lenses each having a smooth top surface and a blazed zig-zag-shaped grating surface at the bottom; (2) an optical coating formed below the zig-zag-shaped grating surface; and (3) a reflective member formed below the optical coating. With the cooperative actions of the zig-zag-shaped grating surface, the optical coating layer, and the reflective member, an incident light, when reflected, is separated into repeated sequences of red, green, and blue color components and a black matrix segregating the red, green, and blue color components. A sequence of micro-light valves are placed in the path of the reflected incident light to block the undesired color components. The reflective-type diffraction grating structure dispenses with the need for the various layers of color filters.

Abstract: The invention relates to a method for manufacturing color filters utilizing a color electrodeposition coating which contains an anionic electrodeposition resin having a low acid value.

Abstract: A positive photoresist composition is disclosed which comprises a photosensitive compound, a phenolic resin, and an organic solvent. The phenolic resin is prepared from a monomeric composition comprises formaldehyde and a mixture of phenol monomers. The mixture of phenol monomers comprises: (a) no more than 98 mole percent of a mixture of monohydroxy phenols, the mixture of monohydroxy phenols comprises: (I) about 50.about.80 mole percent of meta-methylphenol; (ii) about 10.about.30 mole percent of 2,5-dimethylphenol; and (iii) about 10.about.40 mole percent of 2,3,5-trimethylphenol; and (b) at least 2 mol percent of at least one polyhydroxybenzene which is presented by the following formula: ##STR1## wherein n is an integer of 1 or 2. Preferably, the polyhydroxybenzene is a mixture of trihydroxybenzene and dihydroxybenzene in a molar ratio of about 40 to 60.

Abstract: A method for making color filters containing a color matrix with at least three desired colored layers comprising the steps of: (a) forming a positive energy-accumulable photoresist layer on a transparent electrically conductive substrate; (b) pre-conditioning the energy-accumulable photoresist layer to form at least three regions of different initial levels of exposure energy, from a highest to a lowest; (c) using a developer solution to develop and remove the region of the photoresist layer with the highest level of initial exposure energy to thereby cause a corresponding area of the electrically conductive substrate underlying the photoresist to be uncovered; (d) electrodepositing a photo-curable resin of a desired color and a predetermined exposure energy required for curing onto the uncovered area of the substrate; (e) overall-exposing the photoresist layer to a light source so as to impart an incremental exposure energy to all regions of the photoresist layer; (f) using a developer solution to develop a

Abstract: An improved method is disclosed for making color filters via electrodeposition or lithographic electrodeposition of a plurality of colored resins onto an electrically conductive substrate. The method comprises the steps of: (a) forming a black-hued pattern on the substrate; (b) dividing the substrate into an intended zone and a conjugate zone, the intended zone being portions of the substrate to be deposited with the colored resins and the conjugate zone being portions of the substrate not to be deposited with the colored resins; (c) forming a permanent insulation film on the conjugate zone of the substrate; and (d) electrodepositing the colored resins onto the intended zone of the substrate.