Abstract: A method for fabricating a nanoimprint mold core is disclosed. The method includes providing a substrate; forming on the substrate an amorphous thin film, which is transformed into a crystalline thin film upon receipt of energy, the crystalline thin film having physical and chemical characteristics different from those of the amorphous thin film; applying the energy onto a predetermined region of the amorphous thin film, to transform the amorphous thin film within the predetermined region into the crystalline thin film; etching the illuminated amorphous film, which has crystalline mark on amorphous film, and at least partially removing the area of remained amorphous thin films; performing an imprinting process on the substrate, which has the etched amorphous thin films formed; and performing a molding releasing process on the substrate, so as to obtain the nanoimprint mold core.

Abstract: A fabrication method of a nanoimprint mold core includes providing a substrate having a photo phase change surface; performing a phase change on the photo phase change surface to form at least one first area and at least one second area; at least partially removing the first area to form a nano pattern; performing an imprinting process using the substrate having the nano pattern; and performing a mold release process so as to obtain the mold core. This achieves the advantages of low cost, high yield, and easy fabrication of the mold core.