Patents by Inventor Paolo Alagna

Paolo Alagna has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Wafer-based light source parameter control
    Patent number: 10036960
    Abstract: A photolithography method includes instructing an optical source to produce a pulsed light beam; scanning the pulsed light beam across a wafer of a lithography exposure apparatus to expose the wafer with the pulsed light beam; during scanning of the pulsed light beam across the wafer, receiving a characteristic of the pulsed light beam at the wafer; receiving a determined value of a physical property of a wafer for a particular pulsed light beam characteristic; and based on the pulsed light beam characteristic that is received during scanning and the received determined value of the physical property, modifying a performance parameter of the pulsed light beam during scanning across the wafer.
    Type: Grant
    Filed: June 20, 2017
    Date of Patent: July 31, 2018
    Assignee: Cymer, LLC
    Inventors: Ivan Lalovic, Omar Zurita, Gregory Allen Rechtsteiner, Paolo Alagna, Simon Hsieh, Jason J. Lee, Rostislav Rokitski, Rui Jiang
  • WAFER-BASED LIGHT SOURCE PARAMETER CONTROL
    Publication number: 20180011409
    Abstract: A photolithography method includes instructing an optical source to produce a pulsed light beam; scanning the pulsed light beam across a wafer of a lithography exposure apparatus to expose the wafer with the pulsed light beam; during scanning of the pulsed light beam across the wafer, receiving a characteristic of the pulsed light beam at the wafer; receiving a determined value of a physical property of a wafer for a particular pulsed light beam characteristic; and based on the pulsed light beam characteristic that is received during scanning and the received determined value of the physical property, modifying a performance parameter of the pulsed light beam during scanning across the wafer.
    Type: Application
    Filed: June 20, 2017
    Publication date: January 11, 2018
    Inventors: Ivan Lalovic, Omar Zurita, Gregory Allen Rechtsteiner, Paolo Alagna, Simon Hsieh, Jason J. Lee, Rostislav Rokitski, Rui Jiang
  • Wafer-based light source parameter control
    Patent number: 9715180
    Abstract: A photolithography method includes instructing an optical source to produce a pulsed light beam; scanning the pulsed light beam across a wafer of a lithography exposure apparatus to expose the wafer with the pulsed light beam; during scanning of the pulsed light beam across the wafer, receiving a characteristic of the pulsed light beam at the wafer; receiving a determined value of a physical property of a wafer for a particular pulsed light beam characteristic; and based on the pulsed light beam characteristic that is received during scanning and the received determined value of the physical property, modifying a performance parameter of the pulsed light beam during scanning across the wafer.
    Type: Grant
    Filed: June 4, 2014
    Date of Patent: July 25, 2017
    Assignee: Cymer, LLC
    Inventors: Ivan Lalovic, Omar Zurita, Gregory Allen Rechtsteiner, Paolo Alagna, Simon Hsieh, Jason J. Lee, Rostislav Rokitski, Rui Jiang
  • WAFER-BASED LIGHT SOURCE PARAMETER CONTROL
    Publication number: 20150070673
    Abstract: A photolithography method includes instructing an optical source to produce a pulsed light beam; scanning the pulsed light beam across a wafer of a lithography exposure apparatus to expose the wafer with the pulsed light beam; during scanning of the pulsed light beam across the wafer, receiving a characteristic of the pulsed light beam at the wafer; receiving a determined value of a physical property of a wafer for a particular pulsed light beam characteristic; and based on the pulsed light beam characteristic that is received during scanning and the received determined value of the physical property, modifying a performance parameter of the pulsed light beam during scanning across the wafer.
    Type: Application
    Filed: June 4, 2014
    Publication date: March 12, 2015
    Inventors: Ivan Lalovic, Omar Zurita, Gregory Allen Rechtsteiner, Paolo Alagna, Simon Hsieh, Jason J. Lee, Rostislav Rokitski, Rui Jiang