Patents by Inventor Paolo Canestrari

Paolo Canestrari has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic mask for semiconductor devices with a polygonal-section etch window, in particular having a section of at least six sides
    Publication number: 20040086792
    Abstract: Using an attenuated phase shifting mask (Att.PSM) with square-section etch window there is the advantage of permitting good resolution and simultaneously increasing the depth of focus and the exposure latitude (the range of energy), improving the lithographic process itself compared to the traditional masks, called binary. The Att.PSM masks introduce the problem of the side lobe effects which is solved with the present invention adopting a polygonal etch window with at least six sides, preferably with an octagonal shape.
    Type: Application
    Filed: October 24, 2003
    Publication date: May 6, 2004
    Inventors: Carmelo Romeo, Paolo Canestrari, Antonio Fiorino
  • Method for improving the performance of photolithographic equipment and for increasing the lifetime of the optics thereof
    Publication number: 20020068226
    Abstract: In a photolithographic process using a photolithographic mask having opaque mask areas and transparent mask areas, the opaque mask areas corresponding to a pattern to be transferred onto a semiconductor wafer to form on the wafer a pattern of active structures, a method for improving the performance of the photolithographic equipment and for increasing the lifetime of the optics including providing auxiliary opaque mask areas in areas of the mask not covered by active opaque mask areas, so as to reduce a transmission factor of the mask.
    Type: Application
    Filed: March 29, 2000
    Publication date: June 6, 2002
    Inventors: Carmelo Romeo, Paolo Canestrari, Roberto Ruffoni
  • Metrological structures particularly for direct measurement of errors introduced by alignment systems
    Patent number: 5985494
    Abstract: Process for producing metrological structures particularly for direct measurement of errors introduced by alignment systems, whose peculiarity consists in performing, on a same substrate, metrological alignment markings and processed alignment markings according to arrays of preset numerical size.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: November 16, 1999
    Assignee: SGS-Thomson Microelectronics S.r.l.
    Inventors: Paolo Canestrari, Samuele Carrera, Giovanni Rivera
  • Process for producing metrological structures particularly for direct measurement of errors introduced by alignment systems
    Patent number: 5622796
    Abstract: Process for producing metrological structures particularly for direct measurement of errors introduced by alignment systems, whose peculiarity consists in performing, on a same substrate, metrological alignment markings and processed alignment markings according to arrays of preset numerical size.
    Type: Grant
    Filed: December 22, 1994
    Date of Patent: April 22, 1997
    Assignee: SGS-Thomson Microelectronics S.r.l.
    Inventors: Paolo Canestrari, Samuele Carrera, Giovanni Rivera
  • Process for producing metrological structures particularly useful for analyzing the accuracy of instruments for measuring alignment on processed substrates
    Patent number: 5246539
    Abstract: Process for producing metrological structures particularly useful for analyzing the accuracy of instruments for measuring alignment on processed substrates. The process produces metrological structures which have measurement profiles defined on substrate regions and on industrially-processed regions on a single wafer. The measurement profiles define statistical distributions which can be detected by measurement machines in order to analyze the measurement accuracy of the machines themselves.
    Type: Grant
    Filed: September 1, 1992
    Date of Patent: September 21, 1993
    Assignee: SGS-Thomson Microelectronics S.r.l.
    Inventors: Paolo Canestrari, Carlo Lietti, Giovanni Rivera