Abstract: An optical two-dimensional position sensor including a selective optical unit which faces, and is displaceable relative to, an integrated device. The selective optical unit is formed by a polarized light source and a filter with four quadrants which permits passage of light through two quadrants only. The selective optical unit is attached to a control lever such as to translate in a plane along a first direction and a second direction, and to pivot around an axis which is orthogonal to the preceding directions. In a transparent package, the integrated device comprises a first group of sensor elements which are spaced along the first direction, a second group of sensor elements which are spaced along the second direction and a third group of sensor elements which detect an angular position of the selective optical unit.

Abstract: An electromagnetic head for a storage device comprises a magnetic core forming a magnetic circuit, and a magnetoresistive means. The magnetic core is interrupted by an air-gap, thereby separating a first pole and second pole of the magnetic core. The magnetoresistive means is disposed in the region of the air-gap, and is connected to the magnetic core so as to be connected in the magnetic circuit.

Abstract: The pressure sensor is integrated in an SOI (Silicon-on-Insulator) substrate using the insulating layer as a sacrificial layer, which is partly removed by chemical etching to form the diaphragm. To fabricate the sensor, after forming the piezoresistive elements and the electronic components integrated in the same chip, trenches are formed in the upper wafer of the substrate and extending from the surface to the layer of insulating material; the layer of insulating material is chemically etched through the trenches to form an opening beneath the diaphragm; and a dielectric layer is deposited to outwardly close the trenches and the opening. Thus, the process is greatly simplified, and numerous packaging problems eliminated.

Abstract: A movable mass forming a seismic mass is formed starting from an epitaxial layer and is covered by a weighting region of tungsten which has high density. To manufacture the mass, buried conductive regions are formed in the substrate. Then, at the same time, a sacrificial region is formed in the zone where the movable mass is to be formed and oxide insulating regions are formed on the buried conductive regions so as to partially cover them. An epitaxial layer is then grown, using a nucleus region. A tungsten layer is deposited and defined and, using a silicon carbide layer as mask, the suspended structure is defined. Finally, the sacrificial region is removed, forming an air gap.

Abstract: The acceleration sensor is formed in a monocrystalline silicon wafer forming part of a dedicated SOI substrate presenting a first and second monocrystalline silicon wafer separated by an insulting layer having an air gap. A well is formed in the second wafer over the air gap and is subsequently trenched up to the air gap to release the monocrystalline silicon mass forming the movable mass of the sensor; the movable mass has two numbers of movable electrodes facing respective pluralities of fixed electrodes. In the idle condition, each movable electrode is separated by different distances from the two fixed electrodes facing the movable electrode.

Abstract: A sensor having high sensitivity is formed using a suspended structure with a high-density tungsten core. To manufacture it, a sacrificial layer of silicon oxide, a polycrystal silicon layer, a tungsten layer and a silicon carbide layer are deposited in succession over a single crystal silicon body. The suspended structure is defined by selectively removing the silicon carbide, tungsten and polycrystal silicon layers. Then spacers of silicon carbide are formed which cover the uncovered ends of the tungsten layer, and the sacrificial layer is then removed.

Abstract: A suspension arm (125) for a head (120) of a disk storage device comprises at least one wall (225, 230) substantially perpendicular to the disk (105) and having a portion (238, 239) which is deformable parallel to a plane extending through a longitudinal axis (235) of the suspension arm (125) and perpendicular to the at least one wall (225, 230), and piezoelectric member (240, 255) which can deform the portion (238, 239) in order correspondingly to move the head (120), the piezoelectric member (240-255) being fixed to the portion (238, 239) of the at least one wall (225, 230).

Abstract: The present invention relates to an apparatus for developing and digitizing an image-wise exposed silver halide radiographic film comprising: an automatic radiographic film processing unit having an output, wherein the processing unit develops the image-wise exposed silver halide radiographic film to create a visible image on the radiographic film; a radiographic film digitizer having an input, wherein the radiographic film digitizer is vertically positioned in relation to a lateral side of the radiographic film processing unit, and photoelectrically reads the visible image on the radiographic film; and an integrated docking unit having a connecting means which connects the radiographic film processing unit to the film digitizer and transports the radiographic film from the output of the radiographic film processing unit to the radiographic film digitizer. A method for the automatic processing and digitizing of an image-wise exposed radiographic film is also described.

Abstract: An integrated semiconductor device comprises, reciprocally superimposed, a thermally insulating region; a thermal conduction region of a high thermal conductivity material; a passivation oxide layer; and a gas sensitive element. The thermal conduction region defines a preferential path towards the gas sensitive element for the heat generated by the heater element, thereby the heat dispersed towards the substrate is negligible during the operation of the device.

Abstract: An acceleration sensor is described which is formed by planar technology on a substrate. It includes a core of ferromagnetic material and, coupled conductively together by the core, a first winding adapted to be connected to a power supply and a second winding adapted to be connected to circuit means for measuring an electrical magnitude induced therein. The core has two suspended portions which are free to bend as a result of an inertial force due to an accelerative movement of the sensor itself. The bending causes lengthening of the core and hence a variation in the reluctance of the magnetic circuit. If a constant current is supplied to the first winding, a voltage is induced in the second winding as a result of the variation in the magnetic flux caused by the variation in reluctance.

Abstract: A semiconductor circuit includes a semiconductor layer having a surface and a monolithic output stage formed in the semiconductor layer. The monolithic output stage extends to the surface of the semiconductor layer and has a periphery within the semiconductor layer, an output terminal, and a supply terminal. A barrier well is formed in the semiconductor layer and adjacent to at least a portion of the periphery of the monolithic output stage. The barrier well extends to the surface of the semiconductor layer and has a first conductivity. A diode having first and second diode regions is disposed in the semiconductor layer. The first diode region is coupled to the supply terminal. The diode is operable to prevent current flow from the barrier well to the supply terminal when the voltage between the supply and output terminals has a first polarity.

Abstract: The chemoresistive gas sensor comprises a heating element integrated in a dedicated SOI substrate having an air gap in the intermediate oxide layer between two wafers of monocrystalline silicon. A sensitive element of tin oxide is formed over the heating element and separated from it by a dielectric insulating and protective layer. A trench formed at the end of the fabrication of the device, extends from the surface of the wafer in which the heating element is integrated, up to the air gap to mechanically separate and insulate the sensitive element from the rest of the chip, thereby improving the mechanical characteristics sensitivity and response of the sensor.

Abstract: Zener diode with high stability in time and low noise for integrated circuits and provided in an epitaxial pocket insulated from the rest of a type N epitaxial layer grown on a substrate of type P semiconductor material.In said pocket are included a type N+ cathode region and a type P anode region enclosing it.The cathode region has a peripheral part surrounding a central part extending in the anode region less deeply than the peripheral part.

Abstract: A transistor in an output stage has an emitter connected to a supply rail and a collector connected to an output node. The transistor is protected against the effects of accidental shortcircuiting of the output node of the output stage with a positive pole of a battery while the circuit is unpowered, by a protection transistor of the same type as the transistor to be protected. The protection transistor has an emitter connected to the base of the output transistor, a collector connected to the output node of the output stage, and a base connected through a biasing resistance to the supply rail on the output stage. The protection transistor and an interdigitated structure of the transistor may be formed within the same pocket, thus reducing the required area.

Abstract: A circuital arrangement which comprises a vertical PNP transistor with insulated collector, which has a P-type collector structure surrounded by an N-type well and forms a junction therewith.

Abstract: The device for shielding the electrons injected towards the substrate by an epitaxial pocket which reaches a negative voltage with respect to said substrate, comprises a debiasing transistor arranged in reverse configuration (with collector and emitter swapped) in the same epitaxial pocket reaching a negative voltage. The transistor is connected with its emitter and its collector between the buried layer of the pocket reaching a negative voltage and the substrate, so as to debias the junction formed by the buried layer and the substrate.

Abstract: A device for minimizing parasitic junction capacitances in an isolated collector vertical PNP transistor, having a terminal N connected to an epitaxial n layer, comprises a bootstrap circuit including an emitter follower vertical PNP transistor having its emitter and base respectively connected to the terminal of the epitaxial n layer and the collector of the isolated collector transistor; further, a bias resistance is connected between the emitter and one pole of a voltage supply to the emitter follower.

Abstract: The collector area of a lateral PNP transistor may be incrementally increased during an electic testing step on wafer of an integrated circuit by purposely forming an auxiliary p-type diffused collector region having fractional dimensions near the primary collector region of the transistor and by permanently shorcircuiting the two regions by means of a "Zener zapping" technique, by forcing a current through the inversely biased base-collector junction utilizing a suitable contact pad connected to the auxiliary collector region to create localized power dissipation conditions sufficient to melt the metal of the respective metal at the adjacent contacts and to form a permanent connection between the two metals. The technique is very useful for adjusting the value of the output current(s) in precision current generating circuits.

Abstract: A circuital arrangement which comprises a vertical PNP transistor with insulated collector, which has a P-type collector structure surrounded by an N-type well and forms a junction therewith.