Abstract: An apparatus is disclosed for the deep cleaning of surfaces, which comprises a support for at least two reservoirs arranged side-by-side and provided with deformable walls having uniformly perforated faces essentially facing the direction of the surface to be cleaned. At least one reservoir can contain a granular material for cleaning the surface and at least one reservoir can contain a fluid substance for the flowing of the granular material onto the surface. By means of the pressure exerted by a user on a support of the reservoirs in the direction of the surface to be cleaned, the granular material and the fluid substance flow from the corresponding reservoirs and are mixed together on the surface to be cleaned. A tangential movement of the reservoirs onto the surface conveys a compound of granular material and fluid substance onto the surface with a cleaning effect.

Abstract: An apparatus is disclosed for the deep cleaning of surfaces, which comprises a support for at least two reservoirs arranged side-by-side and provided with deformable walls having uniformly perforated faces essentially facing the direction of the surface to be cleaned. At least one reservoir can contain a granular material for cleaning the surface and at least one reservoir can contain a fluid substance for the flowing of the granular material onto the surface. By means of the pressure exerted by a user on a support of the reservoirs in the direction of the surface to be cleaned, the granular material and the fluid substance flow from the corresponding reservoirs and are mixed together on the surface to be cleaned. A tangential movement of the reservoirs onto the surface conveys a compound of granular material and fluid substance onto the surface with a cleaning effect.