Patents by Inventor Parag Upadhyahya

Parag Upadhyahya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8427266
    Abstract: An inductor structure can be implemented within a semiconductor integrated circuit (IC). The inductor structure can include a coil of conductive material having a first terminal and a second terminal each located at an opposing end of the coil. The inductor structure can include a patterned ground shield including a plurality of fingers implemented within an IC process layer located between the coil of conductive material and a substrate of the IC. The inductor structure also can include an isolation wall formed to encompass the coil and the patterned ground shield. The isolation wall can be coupled to one end of each finger.
    Type: Grant
    Filed: March 21, 2011
    Date of Patent: April 23, 2013
    Assignee: Xilinx, Inc.
    Inventors: Zhaoyin D. Wu, Parag Upadhyahya, Xuewen Jiang, Jing Jing, Shuxian Wu
  • Publication number: 20120242446
    Abstract: An inductor structure can be implemented within a semiconductor integrated circuit (IC). The inductor structure can include a coil of conductive material having a first terminal and a second terminal each located at an opposing end of the coil. The inductor structure can include a patterned ground shield including a plurality of fingers implemented within an IC process layer located between the coil of conductive material and a substrate of the IC. The inductor structure also can include an isolation wall formed to encompass the coil and the patterned ground shield. The isolation wall can be coupled to one end of each finger.
    Type: Application
    Filed: March 21, 2011
    Publication date: September 27, 2012
    Applicant: XILINX, INC.
    Inventors: Zhaoyin D. Wu, Parag Upadhyahya, Xuewen Jiang, Jing Jing, Shuxian Wu