Abstract: The instant invention relates to oligo- and poly-carbonates terminated with silicon containing groups which are useful as reducers of surface energy for organic materials such as polycarbonates, polyesters or polyketones or their mixtures, blends or alloys. Polymers with such reduced surface energy possess self-cleaning, anti-soiling, anti-graffiti, oil resistance, solvent resistance, chemical resistance, self-lubricating, scratch resistance, low moisture absorption, dirt pickup resistance, slip properties and a hydrophobic surface; and display anti-adhesion properties against proteins and against microorganisms such as for example, bacteria, fungi and algae.

Abstract: The instant invention relates to new compounds of the formula I R1 and R2 are each independently of the other a fluorine containing group, R3 and R4 are each independently of the other hydrogen, a fluorine containing group, C1-C12alkyl, phenyl or R4, together with the carbon atom to which they are bonded, form a C5-C8-cycloalkylidene ring that is unsubstituted or substituted by from 1 to 3 C1-C4alkyl groups; R5, R6, R7 and R8 are each independently of the other hydrogen, C1-C12alkyl or C3-C12alkenyl, X1 and X2 are each independently of the other a direct bond or C1-C12alkylene, m is 1 to 10,000, and n is 0 to 10,000. These new compounds of the formula I are useful as reducers of surface energy for organic materials such as polycarbonates, polyesters or polyketones or their mixtures, blends or alloys.

Abstract: The instant invention relates to new compounds of the formula I wherein the general symbols are as defined in claim 1 and R1 and R2 are each independently of the other a silicon containing group. These new compounds of the formula I are useful as reducers of surface energy for organic materials such as polycarbonates, polyesters or polyketones or their mixtures, blends or alloys. Polymers with such a reduced surface energy possess an “easy to clean”, “self-cleaning” “antisoiling”, “soil-release” “antigraffiti”, “oil resistance”, “solvent resistance”, “chemical resistance”, “self lubricating”, “scratch resistance”, “low moisture absorption”, “dirt pickup resistance”, “slip properties” and “hydrophobic surface”; and antiadhesion properties against proteins and against microorganism such as for example bacteria, fungi and algae.

Abstract: The invention pertains to a process for the preparation of a novel UV absorbing diol of the general formula: wherein R1 is hydrogen, tert-butyl; X1 is selected the group consisting of hydrogen, halogen, tert-butyl and C1 to C12 alkoxy; R2 is C1 to C8 linear or branched alkyl.

Abstract: The invention pertains to a process for the preparation of a novel UV absorbing diol of the general formula: 1

Abstract: The invention also pertains to a process for their preparation of bromo functionalised benzotriazole UV absorber of the general formula 1 wherein R1 is hydrogen, tert-butyl; X1 is selected the group consisting of hydrogen, halogen, tert-butyl and C1 to C12 alkoxy by reacting a benzotriazole having formula 2 wherein R1 is hydrogen, tert-butyl; X1 is selected the group consisting of hydrogen, halogen, tert-butyl and C1 to C12 alkoxy with bromine in the presence of a free radical initiator in a non-polar solvent to produce a bromo functionialized benzotriazole.

Abstract: The invention pertains to novel UV absorbing diol of the general formula: wherein R1 is hydrogen, tert-butyl; X1 is selected the group consisting of hydrogen, halogen, tert-butyl and C1 to C12 alkoxy; R2 is C1 to C8 linear or branched alkyl, and to a process for the preparation thereof.

Abstract: The invention pertains to bromo functionalized benzotriazole UV absorber of the general formula 1 wherein R1 is hydrogen, tert-butyl; X1 is selected the group consisting of hydrogen, halogen, tert-butyl and C1 to C12 alkoxy.