Patents by Inventor Parham Yaghoobi

Parham Yaghoobi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240160109
    Abstract: Degradation of the reflectivity of one or more reflective optical elements in a system for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.
    Type: Application
    Filed: November 14, 2023
    Publication date: May 16, 2024
    Inventors: Yue Ma, Antonius Theodorus Wilhelmus Kempen, Klaus Martin Hummler, Johannes Hubertus Josephina Moors, Jeroen Hubert Rommers, Hubertus Johannes Van De Wiel, Andrew David Laforge, Fernando Brizuela, Rob Carlo Wieggers, Umesh Prasad Gomes, Elena Nedanovska, Celal Korkmaz, Alexander Downn Kim, Rui Miguel Duarte Rodrigues Nunes, Hendrikus Alphonsus Ludovicus Van Dijck, William Peter Van Drent, Peter Gerardus Jonkers, Qiushi Zhu, Parham Yaghoobi, Jan Steven Christiaan Westerlaken, Martinus Hendrikus Antonius Leenders, Alexander Igorevich Ershov, Igor Vladimirovich Fomenkov, Fei Liu, Johannes Henricus Wilhelmus Jacobs, Alexey Sergeevich Kuznetsov
  • Patent number: 11846887
    Abstract: Degradation of the reflectivity of one or more reflective optical elements in a system for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.
    Type: Grant
    Filed: April 7, 2022
    Date of Patent: December 19, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Yue Ma, Antonius Theodorus Wilhelmus Kempen, Klaus Martin Hummler, Johannes Hubertus Josephina Moors, Jeroen Hubert Rommers, Hubertus Johannes Van De Wiel, Andrew David Laforge, Fernando Brizuela, Rob Carlo Wieggers, Umesh Prasad Gomes, Elena Nedanovska, Celal Korkmaz, Alexander Downn Kim, Rui Miguel Duarte Rodrigues Nunes, Hendrikus Alphonsus Ludovicus Van Dijck, William Peter Van Drent, Peter Gerardus Jonkers, Qiushi Zhu, Parham Yaghoobi, Jan Steven Christiaan Westerlaken, Martinus Hendrikus Antonius Leenders, Alexander Igorevich Ershov, Igor Vladimirovich Fomenkov, Fei Liu, Johannes Henricus Wilhelmus Jacobs, Alexey Sergeevich Kuznetsov
  • Publication number: 20230314930
    Abstract: An apparatus for reducing a partially oxidized reticle and pellicle assembly, the apparatus including: a support; a hydrogen supply; and an electron source. The support is for supporting a reticle and pellicle assembly. The hydrogen supply is operable to supply hydrogen in the vicinity of a pellicle of a reticle and pellicle assembly when supported by the support. The electron source is operable to direct electrons so as to be incident on a pellicle of a reticle and pellicle assembly when supported by the support.
    Type: Application
    Filed: July 29, 2021
    Publication date: October 5, 2023
    Inventors: Vadim Yevgenyevich BANINE, Paul Alexander VERMEULEN, Cornelis Adrianus DE MEIJERE, Johnnes Hubertus Josephina MOORS, Andrey NIKIPELOV, Guido SALMASO, Marcus Adrianus VAN DE KERKHOF, Parham YAGHOOBI
  • Publication number: 20230063156
    Abstract: An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.
    Type: Application
    Filed: December 24, 2020
    Publication date: March 2, 2023
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Ronald Peter ALBRIGHT, Kursat BAL, Vadim Yevgenyevich BANINE, Richard Joseph BRULS, Sjoerd Frans DE VRIES, Olav Waldemar Vladimir FRIJNS, Yang-Shan HUANG, Zhuangxiong HUANG, Johannes Henricus Wilhelmus JACOBS, Johannes Hubertus Josephina MOORS, Georgi Nanchev NENCHEV, Andrey NIKIPELOV, Thomas Maarten RAASVELD, Manish RANJAN, Edwin TE SLIGTE, Karl Robert UMSTADTER, Eray UZGÖREN, Marcus Adrianus VAN DE KERKHOF, Parham YAGHOOBI
  • Publication number: 20220291591
    Abstract: Degradation of the reflectivity of one or more reflective optical elements in a system for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.
    Type: Application
    Filed: April 7, 2022
    Publication date: September 15, 2022
    Inventors: Yue Ma, Antonius Theodorus Wilhelmus Kempen, Klaus Martin Hummler, Johannes Hubertus Josephina Moors, Jeroen Hubert Rommers, Hubertus Johannes Van De Wiel, Andrew David Laforge, Fernando Brizuela, Rob Carlo Wieggers, Umesh Prasad Gomes, Elena Nedanovska, Celal Korkmaz, Alexander Downn Kim, Rui Miguel Duarte Rodrigues Nunes, Hendrikus Alphonsus Ludovicus Van Dijck, William Peter Van Drent, Peter Gerardus Jonkers, Qiushi Zhu, Parham Yaghoobi, Jan Steven Christiaan Westerlaken, Martinus Hendrikus Antonius Leenders, Alexander Igorevich Ershov, Igor Vladimirovich Fomenkov, Fei Liu, Johannes Henricus Wilhelmus Jacobs, Alexey Sergeevich Kuznetsov
  • Patent number: 11340532
    Abstract: Degradation of the reflectivity of one or more reflective optical elements in a system (SO) for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber (26) containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.
    Type: Grant
    Filed: February 28, 2019
    Date of Patent: May 24, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Yue Ma, Antonius Theodorus Wilhelmus Kempen, Klaus Martin Hummler, Johannes Hubertus Josephina Moors, Jeroen Hubert Rommers, Hubertus Johannes Van De Wiel, Andrew David Laforge, Fernando Brizuela, Rob Carlo Wieggers, Umesh Prasad Gomes, Elena Nedanovska, Celal Korkmaz, Alexander Downn Kim, Rui Miguel Duarte Rodrigues Nunes, Hendrikus Alphonsus Ludovicus Van Dijck, William Peter Van Drent, Peter Gerardus Jonkers, Qiushi Zhu, Parham Yaghoobi, Jan Steven Christiaan Westerlaken, Martinus Hendrikus Antonius Leenders, Alexander Igorevich Ershov, Igor Vladimirovich Fomenkov, Fei Liu, Johannes Henricus Wilhelmus Jacobs, Alexey Sergeevich Kuznetsov
  • Publication number: 20210109452
    Abstract: Degradation of the reflectivity of one or more reflective optical elements in a system (SO) for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber (26) containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.
    Type: Application
    Filed: February 28, 2019
    Publication date: April 15, 2021
    Inventors: Yue Ma, Antonius Theodorus Wilhelmus Kempen, Klaus Martin Hummler, Johannes Hubertus Josephina Moors, Jeroen Hubert Rommers, Hubertus Johannes Van De Wiel, Andrew David Laforge, Fernando Brizuela, Rob Carlo Wieggers, Umesh Prasad Gomes, Elena Nedanovska, Celal Korkmaz, Alexander Downn Kim, Rui Miguel Duarte Rodrigues Nunes, Hendrikus Alphonsus Ludovicus Van Dijck, William Peter Van Drent, Peter Gerardus Jonkers, Qiushi Zhu, Parham Yaghoobi, Jan Steven Christiaan Westerlaken, Martinus Hendrikus Antonius Leenders, Alexander Igorevich Ershov, Igor Vladimirovich Fomenkov, Fei Liu, Johannes Henricus Wilhelmus Jacobs, Alexey Sergeevich Kuznetsov
  • Publication number: 20090248574
    Abstract: Peer-to-peer currency exchanges and associated systems and methods are disclosed herein. In one embodiment, a computer-implemented method of facilitating a currency exchange transaction between multiple users of a peer-to-peer currency exchange system can include receiving user instructions at the currency exchange system for a currency exchange transaction. The method can also include funding corresponding user accounts at the currency exchange system based on the respective user's selected amount of money to be converted and a current exchange rate between the first currency and the second currency. The method can further include aggregating funds from the corresponding user accounts at the system and, after aggregating the funds, matching user requests for a conversion of funds into a selected currency pairing. The matching process is based, at least in part, on one or more predetermined matching parameters.
    Type: Application
    Filed: March 28, 2008
    Publication date: October 1, 2009
    Inventors: Florence F. L. Leung, Parham Yaghoobi, Lewis John Zimmerman, Robert Geoffrey Hugh Dunlop, Grant Ringham