Patents by Inventor Parson Sheng

Parson Sheng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6489627
    Abstract: Within each of: (1) a method for inspecting a reticle; (2) an apparatus for inspecting the reticle; and (3) a method for forming a microelectronic layer while employing the method for inspecting the reticle and the apparatus for inspecting the reticle, there is employed a pair of wedges whose inclined surfaces are counter-opposed and separated by a gap. The pair of wedges whose inclined surfaces are counter-opposed and separated by the gap is employed in conjunction with an inspection light source and detector for determining an optimizing an optical characteristic of the reticle, such as an optimized optical interference characteristic of the reticle, such that the reticle may be optimally aligned within a photoexposure apparatus and there may be formed with optimal registration while employing the reticle and the photoexposure apparatus a microelectronic layer within a microelectronic fabrication.
    Type: Grant
    Filed: September 29, 2000
    Date of Patent: December 3, 2002
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd
    Inventors: Parson Sheng, Cheng-Hsun Lin, Joseph Guo