Patents by Inventor Partick Helly

Partick Helly has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • RAPID SUPPLY OF FLUORINE SOURCE GAS TO REMOTE PLASMA FOR CHAMBER CLEANING
    Publication number: 20110041872
    Abstract: A system and method for performing rapid chamber cleaning is described. The use of F2 as the source gas for an RPS to form fluorine radicals used in the chamber cleaning operation allows chamber cleaning to proceed at an initial rapid rate without requiring ramp up of the cleaning gas flow. This results in more rapid cleaning and significantly shorter cleaning cycles. This is useful in semiconductor manufacturing, particular, for flat panel displays and solar photo voltaic devices.
    Type: Application
    Filed: February 19, 2009
    Publication date: February 24, 2011
    Inventors: Richard Allen Hogle, Paul Alan Stockman, Partick Helly