Abstract: A semiconductor die includes: a semiconductor substrate having an active region and an edge termination region that separates the active region from an edge of the semiconductor substrate; a plurality of transistor cells formed in the active region; a structured power metallization above the semiconductor substrate and including a gate pad and a gate runner that extends from the gate pad along one or more but not all sides of the semiconductor die above the edge termination region, the gate runner electrically connecting the gate pad to gate electrodes of the transistor cells; and a tungsten runner that follows the gate runner and contacts an underside of the gate runner. The tungsten runner is present above the edge termination region along each side of the semiconductor die that is at least partly devoid of the gate runner. A Method of producing the semiconductor die is also described.

Abstract: A semiconductor die includes: a semiconductor substrate having an active region and an edge termination region that separates the active region from an edge of the semiconductor substrate; a plurality of transistor cells formed in the active region; a structured power metallization above the semiconductor substrate and including a gate pad and a gate runner that extends from the gate pad along one or more but not all sides of the semiconductor die above the edge termination region, the gate runner electrically connecting the gate pad to gate electrodes of the transistor cells; and a tungsten runner that follows the gate runner and contacts an underside of the gate runner. The tungsten runner is present above the edge termination region along each side of the semiconductor die that is at least partly devoid of the gate runner. A Method of producing the semiconductor die is also described.