Patents by Inventor Pascal Boulitreau

Pascal Boulitreau has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithography method and device
    Patent number: 8680489
    Abstract: An installation and method for etching at least one wafer coated with an etch-ready, blank photosensitive layer is disclosed. In accordance with an embodiment, the wafer has thickness irregularities, wherein the wafer is arranged to be able to be submitted to irradiation-beam scanning, a sheet transparent to the radiation to which the photosensitive layer is sensitive covers the wafer, and a probe beam intended to reflect on the upper portion of the sheet perpendicularly to the irradiation beam spot on the photosensitive layer is provided.
    Type: Grant
    Filed: September 28, 2012
    Date of Patent: March 25, 2014
    Assignee: Commissariat à L'Énergie Atomique et aux Énergies Alternatives
    Inventors: Christophe Martinez, Pascal Boulitreau, Fabien Laulagnet