Abstract: Crosslinked polymeric particles obtainable by copolymerization, in the presence of a chain transfer reagent, of at least one difunctional radically polymerizable monomer, optionally at least one monofunctional radically polymerizable monomer and at least one thiourea derivative according to the following Formula (I): in which R is an (n+1)-valent, aromatic, aliphatic, linear or branched C1-C50 hydrocarbon radical, which can be interrupted by one or more, preferably 1 to 8, particularly preferably 1 to 6, ether, thioether, ester, amide or urethane groups; PG is a radically polymerizable (meth)acrylate, (meth)acrylamide or vinyl group and n is 1 or 2. In combination with a hydroperoxide, the crosslinked polymeric particles are suitable as redox initiator system for the free-radical polymerization of compositions comprising at least one radically polymerizable monomer. These compositions are particularly suitable as dental materials.

Abstract: A radically polymerizable composition including at least one urethane group-containing (meth) acrylate monomer, at least one fracture toughness modifier and at least one transfer reagent of the general formula I The composition is particularly suitable as dental materials, for example for the production of dental moldings by generative processes, and is characterised by a high fracture toughness.

Abstract: Acylthiourea oligomers according to the formula The acylthiourea oligomers, in combination with a hydroperoxide compound, are active as initiators for the radical polymerization. Radically polymerizable compositions comprising at least one acylthiourea, at least one hydroperoxide and at least one radically polymerizable monomer are particularly suitable as dental materials.

Abstract: Radically polymerizable dental material, which includes a catalyst paste and a base paste, wherein the catalyst pastes includes an oxidizing agent, preferably a peroxide or hydroperoxide, a radically polymerizable monomer and/or oligomer with acid group and a polyfunctional radically polymerizable monomer, and the base paste comprises a polyfunctional radically polymerizable monomer without an acid group and a dihydropyridine derivative of Formula (1) The material has good mechanical properties and does not exhibit a bitter taste.

Abstract: Compounds according to general formula (I) in which M is Ge or Sn, RAr is R1, R2, R3, R4, R5, independently of one another in each case, are —H, —F, —Cl, —OR6, —SR6, —N(R6)2, —CF3, —CN, —NO2, —COOR6, —CONHR6, a branched, cyclic or preferably linear C1-20 alkyl, C2-20 alkenyl, C1-20 alkyloxy or a C2-20 alkenoxy radical, which can be interrupted one or more times by O, S or —NR6— and substituted by one or more polymerizable groups and/or radicals R6, R6 is H, a branched, cyclic or preferably linear C1-20 alkyl or C2-20 alkenyl radical, R7 is a chemical bond, an n-valent aromatic radical or a branched, cyclic or preferably linear C1-20 alkylene radical, which can be interrupted one or more times by O, S or —NR6— and substituted by one or more polymerizable groups, ?O and/or radicals R6, n is 2 or 3 and m is 0 or 1. The compounds are particularly suitable as photoinitiators for radical polymerization and in particular for the production of dental materials.

Abstract: Radically polymerizable, difunctional phenylene sulfide according to Formula I in which X, Y independently of each other in each case are absent or are O or NR6, R1, R2 independently of each other in each case are H, a linear or branched C1 to C10 alkyl radical, —OR7, —SR8, Cl or Br, R3 is absent or is a C1-C10 alkylene radical which can be interrupted by O or S, R4 is absent or is a C1-C10 alkylene radical which can be interrupted by O or S, wherein R3 and R4 cannot be absent at the same time, R5 is H or a C1-C5 alkyl radical, R6, R7, R8 independently of each other in each case are H or a linear or branched C1 to C10 alkyl radical, a, b, c, d independently of each other in each case are 0 or 1 and e is 1 or 2.

Abstract: Radically polymerizable, difunctional phenylene sulfide according to Formula I in which X, Y independently of each other in each case are absent or are O or NR6, R1, R2 independently of each other in each case are H, a linear or branched C1 to C10 alkyl radical, —OR7, —SR8, Cl or Br, R3 is absent or is a C1-C10 alkylene radical which can be interrupted by O or S, R4 is absent or is a C1-C10 alkylene radical which can be interrupted by O or S, wherein R3 and R4 cannot be absent at the same time, R5 is H or a C1-C5 alkyl radical, R6, R7, R8 independently of each other in each case are H or a linear or branched C1 to C10 alkyl radical, a, b, c, d independently of each other in each case are 0 or 1 and e is 1 or 2.