Patents by Inventor Pascal G. Vermont

Pascal G. Vermont has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7410355
    Abstract: A substrate undergoes a semiconductor fabrication process at different temperatures in a reactor without changing the temperature of the reactor. The substrate is held suspended by flowing gas between two heated surfaces of the reactor. Moving the two heated surfaces in close proximity with the substrate for a particular time duration heats the substrate to a desired temperature. The desired temperature is then maintained by distancing the heated surfaces from the substrate and holding the heated surface at the increased distance to minimize further substrate heating.
    Type: Grant
    Filed: February 17, 2006
    Date of Patent: August 12, 2008
    Assignee: ASM International N.V.
    Inventors: Ernst H. A. Granneman, Vladimir I. Kuznetsov, Xavier Pages, Pascal G. Vermont, Herbert Terhorst, Gert-Jan Snijders
  • Patent number: 7022627
    Abstract: A substrate undergoes a semiconductor fabrication process at different temperatures in a reactor without changing the temperature of the reactor. The substrate is held suspended by flowing gas between two heated surfaces of the reactor. Moving the two heated surfaces in close proximity with the substrate for a particular time duration heats the substrate to a desired temperature. The desired temperature is then maintained by distancing the heated surfaces from the substrate and holding the heated surface at the increased distance to minimize further substrate heating.
    Type: Grant
    Filed: October 31, 2003
    Date of Patent: April 4, 2006
    Assignee: ASM International N.V.
    Inventors: Ernst H. A. Granneman, Vladimir I. Kuznetsov, Xavier Pagès, Pascal G. Vermont