Patents by Inventor Pascal Gallo

Pascal Gallo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11512409
    Abstract: The present invention relates to a free-standing single crystalline diamond part and a single crystalline diamond part production method. The method includes the steps of: —providing a single crystalline diamond substrate or layer; —providing a first adhesion layer on the substrate or layer; —providing a second adhesion layer on the first adhesion layer: —providing a mask layer on the second adhesion layer; —forming at least one indentation or a plurality of indentations through the mask layer and the first and second adhesion layers to expose a portion or portions of the single crystalline diamond substrate or layer; and—etching the exposed portion or portions of the single crystalline diamond substrate or layer and etching entirely through the single crystalline diamond substrate or layer.
    Type: Grant
    Filed: August 30, 2017
    Date of Patent: November 29, 2022
    Assignee: ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE
    Inventors: Niels Quack, Adrien Toros, Marcell Kiss, Teodoro Graziosi, Pascal Gallo
  • Publication number: 20200199780
    Abstract: The present invention relates to a free-standing single crystalline diamond part and a single crystalline diamond part production method. The method includes the steps of: providing a single crystalline diamond substrate or layer; providing a first adhesion layer on the substrate or layer; providing a second adhesion layer on the first adhesion layer: providing a mask layer on the second adhesion layer; forming at least one indentation or a plurality of indentations through the mask layer and the first and second adhesion layers to expose a portion or portions of the single crystalline diamond substrate or layer; and etching the exposed portion or portions of the single crystalline diamond substrate or layer and etching entirely through the single crystalline diamond substrate or layer.
    Type: Application
    Filed: August 30, 2017
    Publication date: June 25, 2020
    Inventors: Niels QUACK, Adrien TOROS, Marcell KISS, Teodoro GRAZIOSI, Pascal GALLO
  • Patent number: 9337615
    Abstract: The present invention concerns new designs of VCLs with high contrast gratings (HCG) combined with diamond layer as a bottom mirror. They can be realized either with a classical V-shaped pumping scenario, or through the introduction of the pumping beam from the bottom direction, through the HCG that can be designed to be transparent at the wavelength of the pumping light. They can also be completed by a HCG combined with diamond layer as top mirror, reflecting the pump diode laser and transparent to the VCL emission in the case the pumped and emitted beams are collinear.
    Type: Grant
    Filed: July 26, 2012
    Date of Patent: May 10, 2016
    Assignee: ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL)
    Inventors: Vladimir Iakovlev, Pascal Gallo, Elyahou Kapon, Tomasz Czyszanowski, Maciej Dems, Michal Wasiak, Jaroslaw Walczak
  • Publication number: 20130028279
    Abstract: The present invention concerns new designs of VCLs with high contrast gratings (HCG) combined with diamond layer as a bottom mirror. They can be realized either with a classical V-shaped pumping scenario, or through the introduction of the pumping beam from the bottom direction, through the HCG that can be designed to be transparent at the wavelength of the pumping light. They can also be completed by a HCG combined with diamond layer as top mirror, reflecting the pump diode laser and transparent to the VCL emission in the case the pumped and emitted beams are collinear.
    Type: Application
    Filed: July 26, 2012
    Publication date: January 31, 2013
    Applicant: ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL)
    Inventors: Vladimir IAKOVLEV, Pascal GALLO, Elyahou KAPON, Tomasz CZYSZANOWSKI, Maciej DEMS, Michal WASIAK, Jaroslaw WALCZAK
  • Publication number: 20060127656
    Abstract: Assembly, characterized in that it comprises either a dense layer (CDI), consisting of a material comprising at least 75% by volume and at most 100% by volume of a compound of formula (I): M?1-x-uM??xM??uM??yM??vO3-w, a porous layer (CP1), adjacent to the said dense layer (CD1), consisting of a material comprising at least 75% by volume and at most 100% by volume of a compound of formula (II): M?1-x-uM?40 xM??uM?1-y-vM??yM??vO3-w and a catalytic layer (CC1), adjacent to the said dense layer (CD1) and consisting of a material comprising at least 75% by volume and at most 100% by volume of a compound of formula (III): M?1-x-uM??xM??uM?1-y-vM??vO3-w; or a dense layer (CD1), a porous layer (CP1), a catalytic layer (CC1), of thickness EC1, as defined above; and a second porous layer (CP2), inserted between the said catalytic layer (CC1) and the said dense layer (CD1), consisting of a material comprising at least 75% by volume and at most 100% by volume of a compound of formula (IV): M?1-x-uM??xM??uM?1-y-vM??yM??
    Type: Application
    Filed: February 2, 2005
    Publication date: June 15, 2006
    Inventors: Pascal Gallo, Gregory Etchegoyen, Thierry Chartier