Patents by Inventor Pascal Heller

Pascal Heller has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Optical apparatus, method for setting a target deformation, and lithography system
    Patent number: 12656690
    Abstract: An optical apparatus for a lithography system has at least one optical element comprising an optical surface. The optical apparatus also has one or more actuators for deforming the optical surface. The optical element comprises a strain gauge device for determining the deformation of the optical surface. The gauge device comprises: a) at least one path length device for generating a measurement spectrum of a measurement radiation, wherein the path length device comprises a grating device for the measurement radiation and/or a resonator device for the measurement radiation; and/or b) at least one waveguide, wherein the at least one waveguide and/or the at least one grating device and/or the at least one resonator device are formed by the substrate element.
    Type: Grant
    Filed: November 17, 2023
    Date of Patent: June 16, 2026
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Klaus Gwosch, Pascal Heller, Matthias Manger, Andreas Koeniger
  • OPTICAL APPARATUS, METHOD FOR SETTING A TARGET DEFORMATION, AND LITHOGRAPHY SYSTEM
    Publication number: 20240103381
    Abstract: An optical apparatus for a lithography system has at least one optical element comprising an optical surface. The optical apparatus also has one or more actuators for deforming the optical surface. The optical element comprises a strain gauge device for determining the deformation of the optical surface. The gauge device comprises: a) at least one path length device for generating a measurement spectrum of a measurement radiation, wherein the path length device comprises a grating device for the measurement radiation and/or a resonator device for the measurement radiation; and/or b) at least one waveguide, wherein the at least one waveguide and/or the at least one grating device and/or the at least one resonator device are formed by the substrate element.
    Type: Application
    Filed: November 17, 2023
    Publication date: March 28, 2024
    Inventors: Klaus Gwosch, Pascal Heller, Matthias Manger, Andreas Koeniger