Patents by Inventor Pascal Marsollek

Pascal Marsollek has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11169359
    Abstract: For the purposes of positioning a component part, provision is made in an optical system for a stray magnetic field to be detected via a sensor device and for a correction signal for compensating the effect of the stray magnetic field on the positioning of the component part to be ascertained.
    Type: Grant
    Filed: June 20, 2019
    Date of Patent: November 9, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Pascal Marsollek, Stefan Hembacher
  • Publication number: 20190302402
    Abstract: For the purposes of positioning a component part, provision is made in an optical system for a stray magnetic field to be detected via a sensor device and for a correction signal for compensating the effect of the stray magnetic field on the positioning of the component part to be ascertained.
    Type: Application
    Filed: June 20, 2019
    Publication date: October 3, 2019
    Inventors: Pascal Marsollek, Stefan Hembacher
  • Patent number: 10386732
    Abstract: The disclosure relates to a bearing assembly for a lithography system, having an optical element, a base, and a bearing device that moveably supports the optical element relative to the base. The bearing device has at least one torsion decoupling element that reduces a transmission of torsional moments between the optical element and the base. The torsion decoupling element has at least two leaf springs which have respective opposing narrow sides and which bring about torsional moments about an axis perpendicular to the narrow sides. The at least two leaf springs are also positioned at an angle to one another and are coupled to one another in such a way that a force flow through the torsion decoupling element simultaneously flows through the at least two leaf springs.
    Type: Grant
    Filed: November 6, 2018
    Date of Patent: August 20, 2019
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Pascal Marsollek
  • Publication number: 20190079417
    Abstract: The disclosure relates to a bearing assembly for a lithography system, having an optical element, a base, and a bearing device that moveably supports the optical element relative to the base. The bearing device has at least one torsion decoupling element that reduces a transmission of torsional moments between the optical element and the base. The torsion decoupling element has at least two leaf springs which have respective opposing narrow sides and which bring about torsional moments about an axis perpendicular to the narrow sides. The at least two leaf springs are also positioned at an angle to one another and are coupled to one another in such a way that a force flow through the torsion decoupling element simultaneously flows through the at least two leaf springs.
    Type: Application
    Filed: November 6, 2018
    Publication date: March 14, 2019
    Inventor: Pascal Marsollek
  • Patent number: 10108094
    Abstract: A semiconductor lithography projection exposure apparatus includes a projection lens which includes a manipulator. The manipulator includes an optical element; a base frame; a sensor frame arranged on the base frame; and a sensor arranged on the sensor frame. The manipulator is configured to correct wavefront aberrations of used optical radiation that pass through the optical element during the operation of the projection lens. The manipulator is arranged directly after an object plane of the apparatus along a path of the used optical radiation. The sensor is configured to measure a deformation or a deflection of the optical element. A coefficient of thermal expansion of the sensor frame is within 16 ppm/K of a coefficient of thermal expansion of the base frame.
    Type: Grant
    Filed: November 7, 2016
    Date of Patent: October 23, 2018
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Peter Deufel, Johannes Lippert, Pascal Marsollek, Jasper Wesselingh, Yim-Bun Patrick Kwan
  • Patent number: 10025200
    Abstract: A projection exposure apparatus for semiconductor lithography includes a deformable optical element for the correction of wavefront aberrations. Actuating units for the deformation of the optical element are in mechanical contact with the optical element by way of contact regions. The contact regions are arranged in a regular or irregular arrangement outside an optically active region of the optical element. There are contact regions lying closest to the optically active region and remote contact regions.
    Type: Grant
    Filed: November 8, 2016
    Date of Patent: July 17, 2018
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Pascal Marsollek, Johannes Lippert, Jasper Wesselingh, Sascha Bleidistel
  • Publication number: 20170068165
    Abstract: A projection exposure apparatus for semiconductor lithography includes a deformable optical element for the correction of wavefront aberrations. Actuating units for the deformation of the optical element are in mechanical contact with the optical element by way of contact regions. The contact regions are arranged in a regular or irregular arrangement outside an optically active region of the optical element. There are contact regions lying closest to the optically active region and remote contact regions.
    Type: Application
    Filed: November 8, 2016
    Publication date: March 9, 2017
    Inventors: Pascal Marsollek, Johannes Lippert, Jasper Wesselingh, Sascha Bleidistel
  • Publication number: 20170052453
    Abstract: A semiconductor lithography projection exposure apparatus includes a projection lens which includes a manipulator. The manipulator includes an optical element; a base frame; a sensor frame arranged on the base frame; and a sensor arranged on the sensor frame. The manipulator is configured to correct wavefront aberrations of used optical radiation that pass through the optical element during the operation of the projection lens. The manipulator is arranged directly after an object plane of the apparatus along a path of the used optical radiation. The sensor is configured to measure a deformation or a deflection of the optical element. A coefficient of thermal expansion of the sensor frame is within 16 ppm/K of a coefficient of thermal expansion of the base frame.
    Type: Application
    Filed: November 7, 2016
    Publication date: February 23, 2017
    Inventors: Peter Deufel, Johannes Lippert, Pascal Marsollek, Jasper Wesselingh, Yim-Bun Patrick Kwan