Patents by Inventor Pascal Van Der Voort

Pascal Van Der Voort has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220212174
    Abstract: A process prepares an oxygen carrier for a chemical looping process including providing a material A having a first transition metal and/or an oxide of the first transition metal. The first transition metal is selected from chemical element groups 6-11 of the Periodic System. Material A is subjected to a reaction with H2 to reduce the first transition metal and/or oxide to form a reduced material B. Material B is treated with a salt solution of a second transition metal selected to have a standard reduction potential larger than the first transition metal. A portion of the first transition metal in the reduced material B is replaced by the second transition metal. A molar ratio of the first transition metal with respect to the second transition metal in material B ranges between 2:1 and 100:1. An oxygen carrier is obtained with the method and is regenerated using steam.
    Type: Application
    Filed: April 8, 2020
    Publication date: July 7, 2022
    Applicant: VITO NV
    Inventors: Yoran DE VOS, Marijke JACOBS, An VERBERCKMOES, Pascal VAN DER VOORT, Isabel VAN DRIESSCHE
  • Patent number: 9181282
    Abstract: The present invention relates to novel silica materials, precursors thereof and the preparation thereof. The compounds may be used for a variety of applications, including chromatography and catalysis.
    Type: Grant
    Filed: December 21, 2012
    Date of Patent: November 10, 2015
    Assignee: UNIVERSITEIT GENT
    Inventors: Matthias Ide, Pascal Van Der Voort, Patrick Sandra, Frederic Lynen
  • Patent number: 8968864
    Abstract: A method for at least partially sealing a porous material is provided, comprising forming a sealing layer onto the porous material by applying a sealing compound comprising oligomers wherein the oligomers are formed by ageing a precursor solution comprising cyclic carbon bridged organosilica and/or bridged organosilanes. The method is especially designed for low k dielectric porous materials to be incorporated into semiconductor devices.
    Type: Grant
    Filed: September 18, 2012
    Date of Patent: March 3, 2015
    Assignees: IMEC, Universiteit Gent
    Inventors: Frederik Goethals, Pascal Van Der Voort, Isabel Van Driessche, Mikhail Baklanov
  • Publication number: 20150005525
    Abstract: The present invention relates to novel silica materials, precursors thereof and the preparation thereof. The compounds may be used for a variety of applications, including chromatography and catalysis.
    Type: Application
    Filed: December 21, 2012
    Publication date: January 1, 2015
    Applicant: UNIVERSITEIT GENT
    Inventors: Matthias Ide, Pascal Van Der Voort, Patrick Sandra, Frederic Lynen