Patents by Inventor Pascal Verheyen

Pascal Verheyen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12123741
    Abstract: There is provided a method for identifying possible errors/inconsistencies within an electronic map representation of a network of navigable elements within a geographic area, the method comprising: obtaining at a server positional data relating to the movement over time of a plurality of devices travelling around the navigable network; processing the obtained positional data at the server with reference to the electronic map representing the navigable network in order to identify potential inconsistencies in the map in the form of one or more locations within the navigable network where an observed behaviour of devices travelling around the navigable network as indicated by the obtained positional data is not consistent with a behaviour that would be expected based on the electronic map. This information may then be relayed to navigation devices for supplementing the electronic map when generating navigation instructions.
    Type: Grant
    Filed: May 25, 2020
    Date of Patent: October 22, 2024
    Assignee: TomTom Global Content B.V.
    Inventors: Pascal Clarysse, Nick Cremelie, Tim Bekaert, Koen Verheyen, Erwin Perremans, Hans Verheyden
  • Patent number: 9082595
    Abstract: A coating apparatus is revealed that is designed to coat substrates by means of a physical vacuum deposition process or a chemical vacuum deposition process or a combination thereof. Said coating apparatus is particular in that it uses a rotatable magnetron (14) that is coverable with an axially moveable shutter (18). Such an arrangement enables to keep the magnetron target clean or to clean the target in between or even during subsequent coating steps. The shutter further provides for a controllable gas atmosphere in the vicinity of the target. The arrangement wherein the magnetron is centrally placed is described. Substrates are then exposed to the sputtering source from all angles by hanging them on a planetary carousel (24) that turns around the magnetron.
    Type: Grant
    Filed: March 14, 2007
    Date of Patent: July 14, 2015
    Assignee: SULZER METAPLAS GMBH
    Inventors: Erik Dekempeneer, Wilmert De Bosscher, Pascal Verheyen
  • Patent number: 8192597
    Abstract: A coating apparatus (100) for batch coating of substrates is presented. In the batch coater layers of a stack can be deposited by means of physical vapor deposition, by means of chemical vapor deposition or by a mixture of both processes. When compared to previous apparatus, the mixed mode process is particularly stable. This is achieved by using a rotatable magnetron (112) rather than the prior-art planar magnetrons. The apparatus is further equipped with a rotatable shutter that allows for concurrent or alternating process steps.
    Type: Grant
    Filed: March 14, 2007
    Date of Patent: June 5, 2012
    Assignee: NV Bekaert SA
    Inventors: Erik Dekempeneer, Wilmert De Bosscher, Pascal Verheyen
  • Publication number: 20090130336
    Abstract: A coating apparatus (100) for batch coating of substrates is presented. In the batch coater layers of a stack can be deposited by means of physical vapour deposition, by means of chemical vapour deposition or by a mixture of both processes. When compared to previous apparatus, the mixed mode process is particularly stable. This is achieved by using a rotatable magnetron (112) rather than the prior-art planar magnetrons. The apparatus is further equipped with a rotatable shutter that allows for concurrent or alternating process steps.
    Type: Application
    Filed: March 14, 2007
    Publication date: May 21, 2009
    Inventors: Erik Dekempeneer, Wilmert De Bosscher, Pascal Verheyen
  • Publication number: 20090114529
    Abstract: A coating apparatus is revealed that is designed to coat substrates by means of a physical vacuum deposition process or a chemical vacuum deposition process or a combination thereof. Said coating apparatus is particular in that it uses a rotatable magnetron (14) that is coverable with an axially moveable shutter (18). Such an arrangement enables to keep the magnetron target clean or to clean the target in between or even during subsequent coating steps. The shutter further provides for a controllable gas atmosphere in the vicinity of the target. The arrangement wherein the magnetron is centrally placed is described. Substrates are then exposed to the sputtering source from all angles by hanging them on a planetary carousel (24) that turns around the magnetron.
    Type: Application
    Filed: March 14, 2007
    Publication date: May 7, 2009
    Inventors: Erik Dekempeneer, Wilmert De Bosscher, Pascal Verheyen
  • Publication number: 20080012337
    Abstract: The invention relates to a vacuum sputter reactor comprising a rotatable vacuum tight coupling. The coupling comprises a first tubular section in the form of a spindle, and a second tubular section in the form of a cylindrical target, axially slidable over the first tubular section to abut against a peripheral outer abutment ring. The coupling further comprising at least one sealing ring located between the outer diameter of the first tubular section and the inner diameter of the second tubular section in a sliding overlapping contact area of the first and second tubular sections. The outer diameter of the first tubular section is generally parallel to the opposing surface of the inner wall of the second tubular section from the sealing ring to the end of the first tubular section.
    Type: Application
    Filed: December 15, 2006
    Publication date: January 17, 2008
    Inventors: Wilmert De Bosscher, Dirk Cnockaert, Erwin Lootens, Pascal Verheyen
  • Patent number: 5790030
    Abstract: An antipiliferage tag comprising a soft-magnetic thin film (100) for use as an active element in an electronic article surveillance (E.A.S.) system. The film (100) has an easy axis (102) with a particular direction. The tag has been folded along at least one folding line (104) so that the tag comprises at least two layers which at least partially overlap with each other. The folding line (104) forms an oblique angle different from zero with the direction of the easy axis (102) so that the direction of the easy axis (102) in one layer is different from the direction of the easy axis (106) in another layer. In this way an antipiliferage tag which is insensitive to its orientation in a detection gate of an E.A.S. system is obtained.
    Type: Grant
    Filed: May 8, 1996
    Date of Patent: August 4, 1998
    Assignee: Innovative Sputtering Technology
    Inventors: Hugo Lievens, Paul Lippens, Pascal Verheyen
  • Patent number: 5756186
    Abstract: The invention relates to a layered reflector (1) for light radiation comprising: a) a scratch resistant outer layer (2) transmitting this radiation, b) a first resin layer (3) bonded to it, which is provided with slip properties at least at its contact side (7) with the outer layer (2) and which layer c) is covered at its opposite side with a layer (4) reflecting said radiation and which by interposition of a bonding layer (6), d) is laminated to a second resin layer (5) which has slip properties at least at its free outer surface (8) opposite to the contact side bonding layer. The invention relates also to a process and intermediate products for manufacturing the reflector as well as a self-adhesive reflector (15) derived therefrom and a light reflecting structure (16).
    Type: Grant
    Filed: January 11, 1996
    Date of Patent: May 26, 1998
    Assignee: N.V. Bekaert S.A.
    Inventors: Hugo Lievens, Pascal Verheyen