Abstract: A coating apparatus is revealed that is designed to coat substrates by means of a physical vacuum deposition process or a chemical vacuum deposition process or a combination thereof. Said coating apparatus is particular in that it uses a rotatable magnetron (14) that is coverable with an axially moveable shutter (18). Such an arrangement enables to keep the magnetron target clean or to clean the target in between or even during subsequent coating steps. The shutter further provides for a controllable gas atmosphere in the vicinity of the target. The arrangement wherein the magnetron is centrally placed is described. Substrates are then exposed to the sputtering source from all angles by hanging them on a planetary carousel (24) that turns around the magnetron.

Abstract: A coating apparatus (100) for batch coating of substrates is presented. In the batch coater layers of a stack can be deposited by means of physical vapor deposition, by means of chemical vapor deposition or by a mixture of both processes. When compared to previous apparatus, the mixed mode process is particularly stable. This is achieved by using a rotatable magnetron (112) rather than the prior-art planar magnetrons. The apparatus is further equipped with a rotatable shutter that allows for concurrent or alternating process steps.

Abstract: A coating apparatus (100) for batch coating of substrates is presented. In the batch coater layers of a stack can be deposited by means of physical vapour deposition, by means of chemical vapour deposition or by a mixture of both processes. When compared to previous apparatus, the mixed mode process is particularly stable. This is achieved by using a rotatable magnetron (112) rather than the prior-art planar magnetrons. The apparatus is further equipped with a rotatable shutter that allows for concurrent or alternating process steps.

Abstract: A coating apparatus is revealed that is designed to coat substrates by means of a physical vacuum deposition process or a chemical vacuum deposition process or a combination thereof. Said coating apparatus is particular in that it uses a rotatable magnetron (14) that is coverable with an axially moveable shutter (18). Such an arrangement enables to keep the magnetron target clean or to clean the target in between or even during subsequent coating steps. The shutter further provides for a controllable gas atmosphere in the vicinity of the target. The arrangement wherein the magnetron is centrally placed is described. Substrates are then exposed to the sputtering source from all angles by hanging them on a planetary carousel (24) that turns around the magnetron.

Abstract: The invention relates to a vacuum sputter reactor comprising a rotatable vacuum tight coupling. The coupling comprises a first tubular section in the form of a spindle, and a second tubular section in the form of a cylindrical target, axially slidable over the first tubular section to abut against a peripheral outer abutment ring. The coupling further comprising at least one sealing ring located between the outer diameter of the first tubular section and the inner diameter of the second tubular section in a sliding overlapping contact area of the first and second tubular sections. The outer diameter of the first tubular section is generally parallel to the opposing surface of the inner wall of the second tubular section from the sealing ring to the end of the first tubular section.

Abstract: An antipiliferage tag comprising a soft-magnetic thin film (100) for use as an active element in an electronic article surveillance (E.A.S.) system. The film (100) has an easy axis (102) with a particular direction. The tag has been folded along at least one folding line (104) so that the tag comprises at least two layers which at least partially overlap with each other. The folding line (104) forms an oblique angle different from zero with the direction of the easy axis (102) so that the direction of the easy axis (102) in one layer is different from the direction of the easy axis (106) in another layer. In this way an antipiliferage tag which is insensitive to its orientation in a detection gate of an E.A.S. system is obtained.

Abstract: The invention relates to a layered reflector (1) for light radiation comprising: a) a scratch resistant outer layer (2) transmitting this radiation, b) a first resin layer (3) bonded to it, which is provided with slip properties at least at its contact side (7) with the outer layer (2) and which layer c) is covered at its opposite side with a layer (4) reflecting said radiation and which by interposition of a bonding layer (6), d) is laminated to a second resin layer (5) which has slip properties at least at its free outer surface (8) opposite to the contact side bonding layer. The invention relates also to a process and intermediate products for manufacturing the reflector as well as a self-adhesive reflector (15) derived therefrom and a light reflecting structure (16).