Patents by Inventor Pasi KIVINEN

Pasi KIVINEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Microelectromechanical device with stopper
    Patent number: 11685644
    Abstract: This disclosure describes a microelectromechanical device comprising at least one mobile rotor. The rotor comprises a rotor measurement region and a rotor stopper region and a rotor isolation region which connects the rotor measurement region mechanically to the rotor stopper region and isolates the rotor measurement region electrically from the rotor stopper region.
    Type: Grant
    Filed: December 17, 2020
    Date of Patent: June 27, 2023
    Assignee: MURATA MANUFACTURING CO., LTD.
    Inventors: Marko Peussa, Pasi Kivinen
  • MICROELECTROMECHANICAL DEVICE WITH STOPPER
    Publication number: 20210188621
    Abstract: This disclosure describes a microelectromechanical device comprising at least one mobile rotor. The rotor comprises a rotor measurement region and a rotor stopper region and a rotor isolation region which connects the rotor measurement region mechanically to the rotor stopper region and isolates the rotor measurement region electrically from the rotor stopper region.
    Type: Application
    Filed: December 17, 2020
    Publication date: June 24, 2021
    Inventors: Marko PEUSSA, Pasi KIVINEN
  • Microelectromechanical resonator
    Patent number: 9412934
    Abstract: A method for manufacturing microelectromechanical flexural resonators with a deforming element that has an elongate body extending along a spring axis. A deforming element is positioned on the semiconductor wafer with a defined nominal n-type doping concentration such that a crystal orientation angle is formed between the spring axis of the deforming element and a crystal axis of the silicon semiconductor wafer. The combination of the crystal orientation angle and the nominal n-type doping concentration is adjusted to a specific range, based on total frequency error of the deforming element in a broad temperature range. The combination is optimized to a range where also sensitivity to variations in the material properties is minimized.
    Type: Grant
    Filed: May 20, 2013
    Date of Patent: August 9, 2016
    Assignee: MURATA MANUFACTURING CO., LTD.
    Inventors: Antti Iihola, Ville Kaajakari, Jarmo Kemppainen, Pasi Kivinen, Risto Mourujärvi, Marcus Rinkiö
  • MICROELECTROMECHANICAL RESONATOR
    Publication number: 20140339963
    Abstract: A method for manufacturing microelectromechanical flexural resonators with a deforming element that has an elongate body extending along a spring axis. A deforming element is positioned on the semiconductor wafer with a defined nominal n-type doping concentration such that a crystal orientation angle is formed between the spring axis of the deforming element and a crystal axis of the silicon semiconductor wafer. The combination of the crystal orientation angle and the nominal n-type doping concentration is adjusted to a specific range, based on total frequency error of the deforming element in a broad temperature range. The combination is optimized to a range where also sensitivity to variations in the material properties is minimized.
    Type: Application
    Filed: May 20, 2013
    Publication date: November 20, 2014
    Applicant: MURATA ELECTRONICS OY
    Inventors: Antti IIHOLA, Ville KAAJAKARI, Jarmo KEMPPAINEN, Pasi KIVINEN, Risto MOURUJÄRVI, Marcus RINKIÖ