Abstract: The present invention refers to a lamp for public lighting system that works with high power LEDs, for the direct substitution of the present sodium vapour or metal halides lamps, using the same light fixtures OV type and/or similar with an integrated power supply and a standard socket Mogul-39 or Edison-39. And that improves substantially my previous invention WO2008100124 as far as the cost of manufacture and easiness of assembly, better luminance distribution; lower operating temperature and more lumens per watt, besides to be prepared for the new generations of LEDs.

Abstract: A coating method for detecting the presence of contaminants carried by a liquid that is applied as a coating on a workpiece. A tube guides the liquid along a flow path to the workpiece. A light source illuminates the liquid along the flow path with an optical fiber or other light carrier, and light is scattered by any contaminants present in the liquid. Light scattered by the contaminant particles is more intense than light scattered by the other liquid particles, and this brighter scattered light is detected by a light detector positioned adjacent to the fluid flow path. The coating system is particularly well suited for use in a spin-on coating process that applies a liquid, such as a photoresist material or a dielectric material, to a semiconductor wafer or other workpiece that is secured to a rotating turntable and rotated to receive a coating of the liquid.

Abstract: A coating system for detecting the presence of contaminants carried by a fluid that is applied as a coating on a workpiece. A tube guides the fluid along a flow path to the workpiece. A light source illuminates the fluid along at least a portion of the flow path, and this light is scattered by any contaminants present in the fluid. Light scattered by the contaminant particles is more intense than light scattered by the other fluid particles, and this brighter scattered light is detected by a light detector positioned adjacent to the fluid flow path. If one or more contaminant particles is detected in the fluid, a warning signal can be given and/or the flow of fluid can be stopped. This coating system is particularly well suited for use in a spin-on coating process that applies a liquid, such as a photoresist material or a dielectric material, to a semiconductor wafer or other workpiece that is secured to a rotating turntable.