Patents by Inventor Patricia M. Marmillion

Patricia M. Marmillion has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6924200
    Abstract: Methods are provided that use disposable and permanent films to dope underlying layers through diffusion. Additionally, methods are provided that use disposable films during implantation doping and that provide a surface from which to dope underlying materials. Some of these disposable films can be created from a traditionally non-disposable film and made disposable. In this manner, solvents may be used that do not etch underlying layers of silicon-based materials. Preferably, deep implantation is performed to form source/drain regions, then an anneal step is performed to activate the dopants. A conformal layer is deposited and implanted with dopants. One or more anneal steps are performed to create very shallow extensions in the source/drain regions.
    Type: Grant
    Filed: August 16, 2002
    Date of Patent: August 2, 2005
    Assignee: International Business Machines Corporation
    Inventors: Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, David V. Horak, William H-L Ma, Patricia M. Marmillion, Donald W. Rakowski
  • Patent number: 6506653
    Abstract: Methods are provided that use disposable and permanent films to dope underlying layers through diffusion. Additionally, methods are provided that use disposable films during implantation doping and that provide a surface from which to dope underlying materials. Some of these disposable films can be created from a traditionally non-disposable film and made disposable. In this manner, solvents may be used that do not etch underlying layers of silicon-based materials. Preferably, deep implantation is performed to form source/drain regions, then an anneal step is performed to activate the dopants. A conformal layer is deposited and implanted with dopants. One or more anneal steps are performed to create very shallow extensions in the source/drain regions.
    Type: Grant
    Filed: March 13, 2000
    Date of Patent: January 14, 2003
    Assignee: International Business Machines Corporation
    Inventors: Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, David V. Horak, William H-L Ma, Patricia M. Marmillion, Donald W. Rakowski
  • Publication number: 20020197806
    Abstract: Methods are provided that use disposable and permanent films to dope underlying layers through diffusion. Additionally, methods are provided that use disposable films during implantation doping and that provide a surface from which to dope underlying materials. Some of these disposable films can be created from a traditionally non-disposable film and made disposable. In this manner, solvents may be used that do not etch underlying layers of silicon-based materials. Preferably, deep implantation is performed to form source/drain regions, then an anneal step is performed to activate the dopants. A conformal layer is deposited and implanted with dopants. One or more anneal steps are performed to create very shallow extensions in the source/drain regions.
    Type: Application
    Filed: August 16, 2002
    Publication date: December 26, 2002
    Inventors: Toshiharu Furukawa, Mark C. Hakey, Steven J. Holmes, David V. Horak, William H-L Ma, Patricia M. Marmillion, Donald W. Rakowski
  • Publication number: 20020082890
    Abstract: An intellectual property management facility for proactively creating, developing and managing an intellectual property portfolio includes: determining available resource capacity for an intellectual property activity in a tracking system; assigning technical attributes to the activity in the tracking system; apportioning resource capacity for the activity by technical attribute based on the value assigned to each of the technical attributes and based on available resource capacity; obtaining actual resource usage by technical attribute from the tracking system; and managing resource allocation for the intellectual property activity by determining the difference between the actual resource usage and the resource allocation by technical attribute.
    Type: Application
    Filed: December 22, 2000
    Publication date: June 27, 2002
    Inventors: John A. Bracchitta, Patricia M. Marmillion, Bernadette A. Pierson, Henry C. Rickers, Howard J. Walter
  • Patent number: 5944588
    Abstract: A chemical, mechanical polisher having a plurality of cylindrical rollers rotating orthogonally to a rotating work piece that they wipe and cover that are conditioned to uniformly receive a cleaning agent for polishing the work piece.
    Type: Grant
    Filed: June 25, 1998
    Date of Patent: August 31, 1999
    Assignee: International Business Machines Corporation
    Inventors: Patricia M. Marmillion, Anthony M. Palagonia